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US4743750A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for forming photosensor from SI(X) precursor and activated hydrogen

Assignee: Canon Inc
•
Filing: 1986-04-09
•
Granted: 1988-05-10
•
Expires: 2006-04-09
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Abstract

Abstract A photosensor having a substrate, a photoconductive layer formed on the substrate and containing amorphous silicon, a pair of electrodes electrically connected to the photoconductive layer and a light receiving section having a predetermined area for applying light to the photoconductive layer, wherein the photoconductive layer is formed by producing a precursor (SiX) including at least silicon atoms and halogen atoms and an active seed (H) including hydrogen atoms, at the region outside of a layer forming spatial region where the photoconductive layer is formed, and by introducing the precursor and the active seed into the layer forming spatial region to deposit amorphous silicon on the surface of the substrate.

Inventors

  • 👤 Toshiyuki Komatsu
  • 👤 Masaki Fukaya
  • 👤 Satoshi Itabashi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 00:27
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/10; H10F30/15; H10F71/00; H10F71/10; H10F71/103; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02P; Y02P70/00; Y02P70/50

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 105 words
A method of manufacturing a photosensor having a substrate, a photoconductive layer formed on said substrate and containing amorphous silicon, a pair of electrodes electrically connected to said photoconductive layer and a light receiving section having a predetermined area for applying light to said photoconductive layer, wherein said photoconductive layer is formed by producing a precursor (SiX) including at least silicon atoms and halogen atoms and an active seed (H) including hydrogen atoms, at the region outside of a layer forming spatial region where said photoconductive layer is formed, and next by introducing said precursor and said active seed into said layer forming spatial region.
Claim 2
Independent Claim 105 words
A method of manufacturing a photosensor having a substrate, a photoconductive layer formed on said substrate and containing amorphous silicon, a pair of electrodes electrically connected to said photoconductive layer and a light receiving section having a predetermined area for applying light to said photoconductive layer, wherein said photoconductive layer is formed by producing a precursor (SiX) including at least silicon atoms and halogen atoms and an active seed (H) including hydrogen atoms, at the region outside of a layer forming spatial region where said photoconductive layer is formed, and next by introducing said precursor and said active seed into said layer forming spatial region.
Claim 3
Dependent Claim 69 words
A manufacturing method according to claim 1, wherein said precursor (Si,X) is produced by applying excitation energy to at least one compound selected from the compounds shown by the following general formulas (1) to (4): SinX.sub.2n+2 ( 1) (SiX.sub.2).sub.m ( 2) SinHX.sub.2n+1 ( 3) SinH.sub.2 X.sub.2n ( 4) wherein n is a positive integer, m is a positive integer of 3 or greater, and X is a halogen atom.
Claim 4
Dependent Claim 44 words
A manufacturing method according to claim 1, wherein said active seed is produced by applying excitation energy to at least one selected from H 2 , SiH 4 , SiH 3 F, SiH 3 Cl, SiH 3 Br, SiH 3 I, He and Ar.
Claim 5
Dependent Claim 34 words
A manufacturing method according to claim 1, wherein the ratio of said precursor to said active seed to be introduced into said layer forming spatial region is 10:1 to 1:10 in terms of flow.

References Cited (Backward Citations)

US4307372A Cited
US4365015A Cited
US4361638A Cited
US4394426A Cited
US4450185A Cited
US4546243A Cited
US4439463A Cited
US4664937A Cited
US4532199A Cited
US4592983A Cited
US4600801A Cited
US4634648A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-05-10 1991-11-09 1992-05-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-05-10 1995-11-09 1996-05-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-05-10 1999-11-09 2000-05-10 $7700.00 Window Closed / Lapsed

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