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Patent US4743565A successfully refreshed from Google Patents.
US4743565A
Expired / Lapsed
US
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Lateral device structures using self-aligned fabrication techniques
Assignee: International Business Machines Corp
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Filing: 1986-03-10
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Granted: 1988-05-10
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Expires: 2006-03-10
Abstract
Abstract Submicron lateral device structures, such as bipolar transistors, Schottky Barrier diodes and resistors, are made using self-aligned fabrication techniques and conventional photolithography. The devices are made using individual submicron silicon protrusions which extend outwardly from and are integral with a silicon pedestal therefor. Both PNP and NPN transistors may be made by diffusing appropriate dopant material into opposing vertical walls of a protrusion so as to form the emitter and collector regions. The protrusions themselves are formed by anisotropically etching the silicon using submicron insulating studs as a mask. The studs are formed using sidewall technology where a vertical sidewall section of as layer of insulating material is residual to a reactive ion etching process employed to remove the layer of insulating material.
Inventors
- 👤 George R. Goth
- 👤 Shashi D. Malaviya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 22:04
CPC Classifications
H; H10; H10D; H10D8/00; H10D8/60; C; C08; C08G; C08G12/00; C08G12/02; C08G12/26; C08G12/34; C08G12/40; H10D1/00; H10D1/40; H10D1/43; H10D10/00; H10D10/60; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/693; H10P50/695; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/012; H10W10/10; H10W10/13; H10W20/00; H10W20/01; H10W20/031; H10W20/063
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
270 words
A process for forming a semiconductor device of tightly controlled width, comprising the steps of: providing a body of a first conductivity type semiconductive material; providing a first insulating layer on said semiconductive material; providing a first layer of material over one portion of said insulating layer leaving another portion of said insulation layer exposed said first layer having a substantially vertical surface extending between said one and another portions; providing a second layer of material conformally over said first layer of material and said exposed insulating layer; anisotropically etching said conformal second layer of material forming a stud of said second material abutting said vertical surface of said first layer of material with the width of said stud defined by the thickness of said conformal second layer of material; removing said first layer of material; forming a protrusion of said semiconductive material on a pedestal thereof with the width of said protrusion defined by the width of said stud and said protrusion having opposing vertical sidewalls by anisotropically etching said first insulating layer and said body of semiconductive material surrounding said stud using said stud as a mask; forming an oxidation-resistant insulator layer on said vertical sidewalls and on the semiconductor material surrounding said protrusion; etching to recess said semiconductor material not masked by said oxidation-resistant layer; forming dielectric isolation in said recess by thermal oxidation thereof; selectively etching said oxidation-resistant layer to form localized contact openings therein; and making electrical contact via said openings to opposing vertical sidewalls of said protrusion of semiconductive material; whereby a semiconductor device of tightly controlled width protruding from said body is formed.
Claim 2
Dependent Claim
270 words
A process for forming a semiconductor device of tightly controlled width, comprising the steps of: providing a body of a first conductivity type semiconductive material; providing a first insulating layer on said semiconductive material; providing a first layer of material over one portion of said insulating layer leaving another portion of said insulation layer exposed said first layer having a substantially vertical surface extending between said one and another portions; providing a second layer of material conformally over said first layer of material and said exposed insulating layer; anisotropically etching said conformal second layer of material forming a stud of said second material abutting said vertical surface of said first layer of material with the width of said stud defined by the thickness of said conformal second layer of material; removing said first layer of material; forming a protrusion of said semiconductive material on a pedestal thereof with the width of said protrusion defined by the width of said stud and said protrusion having opposing vertical sidewalls by anisotropically etching said first insulating layer and said body of semiconductive material surrounding said stud using said stud as a mask; forming an oxidation-resistant insulator layer on said vertical sidewalls and on the semiconductor material surrounding said protrusion; etching to recess said semiconductor material not masked by said oxidation-resistant layer; forming dielectric isolation in said recess by thermal oxidation thereof; selectively etching said oxidation-resistant layer to form localized contact openings therein; and making electrical contact via said openings to opposing vertical sidewalls of said protrusion of semiconductive material; whereby a semiconductor device of tightly controlled width protruding from said body is formed.
Claim 3
Dependent Claim
19 words
The process as set forth in claim 1 wherein a plurality of protrusions are formed in said semiconductive material.
Claim 4
Dependent Claim
20 words
The process as set forth in claim 2 wherein both PNP and NPN lateral transistors are formed in said protrusions.
Claim 5
Dependent Claim
38 words
The process as set forth in claim 1 wherein prior to said step of making electrical contact, a dopant material is diffused into said vertical sidewalls to form a region of conductivity opposite to that of said protrusion.
Claim 6
Dependent Claim
44 words
The process as set forth in claim 4 wherein said dopant material is diffused simultaneously into said opposing vertical sidewalls to form the emitter and collector regions of a lateral transistor device with said electrical contact being made at said emitter and collector regions.
Claim 7
Dependent Claim
45 words
The process as set forth in claim 5 wherein electrical contact to the base region between said emitter and collector regions is made to opposing surfaces of said protrusion of semiconductive material outside the regions of diffusion employed to form said emitter and collector regions.
Claim 8
Dependent Claim
29 words
The process as set forth in claim 5 wherein electrical connection to the base region between said emitter and collector regions is made by electrical contact to said pedestal.
Claim 9
Dependent Claim
31 words
The process as set forth in claim 1 wherein said layer of semiconductive material is of N-type conductivity with a region of N + -type conductivity buried therein beneath said protrusion.
Claim 10
Dependent Claim
33 words
The process as set forth in claim 8 wherein said protrusion of semiconductive material comprises the anode and said region of N + -type conductivity comprises the cathode of a Schottky Barrier diode.
Claim 11
Dependent Claim
30 words
The process as set forth in claim 8 wherein a dopant material is diffused into said vertical sidewalls to form a region of conductivity opposite to that of said protrusion.
Claim 12
Dependent Claim
31 words
The process as set forth in claim 10 wherein said dopant material is diffused simultaneously into opposing vertical sidewalls to form the emitter and collector regions of a lateral transistor device.
Claim 13
Dependent Claim
42 words
The process as set forth in claim 11 wherein the step of making electrical contact to said protrusion of semiconductive material comprises making electrical contact to said opposing vertical sidewalls of said protrusion of semiconductive material at said emitter and collector regions.
Claim 14
Dependent Claim
45 words
The process as set forth in claim 12 wherein electrical contact to the base region between said emitter and collector regions is made to opposing surfaces of said protrusion of semiconductor material outside the regions of diffusion employed to form said emitter and collector regions.
Claim 15
Dependent Claim
29 words
The process as set forth in claim 12 wherein electrical connection to the base region between said emitter and collector regions is made by electrical contact to said pedestal.
Claim 16
Dependent Claim
18 words
The process as set forth in claim 1 wherein said protrusion of semiconductive material forms a resistive device.
References Cited (Backward Citations)
US4005451A
Cited
US4047975A
Cited
US4209349A
Cited
US4339767A
Cited
US4359816A
Cited
US4358340A
Cited
US4508579A
Cited
US4645563A
Cited
US4648937A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-10 | 1991-11-09 | 1992-05-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-10 | 1995-11-09 | 1996-05-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-10 | 1999-11-09 | 2000-05-10 | $7700.00 | Window Closed / Lapsed |