Abstract According to the present invention, a method for forming a metal silicide electrode in contact with a doped region of a silicon substrate through a contact hole which is opened through an insulator film over said substrate, comprises the steps of: covering not only the contact hole area but also the insulator film with a metal film; injecting silicon ions into a predetermined area of the metal film covering the insulator portion adjacent the contact hole area; forming a continuous metal siliside film by annealing only on both the hole area and the ion-injected area; removing the metal film to leave the metal silicide film as an electrode which extends laterally to cover the hole area and the adjacent insulator portion. According to another aspect of the present invention, silicon ions are implanted into the area of the indulating film adjacent the contact hole area prior to a conformal deposition of metal. An annealing hep is carried out to form silicide. Unreacted metal is then removed to leave a metal silicide electrode extending laterally to cover both the hole area and the adjacent area of the insulator film.
A method for forming a metal silicide electrode in contact with a doped region of a silicon substrate through a contact hole which is opened through an insulator film over said substrate, comprising the steps of: covering said contact hole area and said insulator film with a metal film; injecting silicon ions into the area of said metal film covering said insulator film portion adjacent said contact hole area; forming a continuous metal silicide film by annealing only said metal film covering said hole area and said ion-injected metal film area; removing the remaining non-silicide metal film to leave said metal silicide film as an electrode which extends laterally to cover said hole area and said adjacent portion of said insulator film.
Claim 2
Independent Claim
122 words
A method for forming a metal silicide electrode in contact with a doped region of a silicon substrate through a contact hole which is opened through an insulator film over said substrate, comprising the steps of: covering said contact hole area and said insulator film with a metal film; injecting silicon ions into the area of said metal film covering said insulator film portion adjacent said contact hole area; forming a continuous metal silicide film by annealing only said metal film covering said hole area and said ion-injected metal film area; removing the remaining non-silicide metal film to leave said metal silicide film as an electrode which extends laterally to cover said hole area and said adjacent portion of said insulator film.
Claim 3
Independent Claim
114 words
A method for forming a metal silicide electrode in contact with a doped region of a silicon substrate through a contact hole which is opened through an insulator film over said substrate, comprising the steps of: injecting silicon ions into the area of said insulator film adjacent said contact hole area; covering said contact hole area and said insulator film with a metal film; forming a continuous metal silicide film by annealing said metal film covering said hole area and said ion-injected area; removing the remaining non-silicide metal film to leave said metal silicide film as an electrode which extends laterally to cover said hole area and said adjacent area of said insulator film.
Claim 4
Independent Claim
114 words
A method for forming a metal silicide electrode in contact with a doped region of a silicon substrate through a contact hole which is opened through an insulator film over said substrate, comprising the steps of: injecting silicon ions into the area of said insulator film adjacent said contact hole area; covering said contact hole area and said insulator film with a metal film; forming a continuous metal silicide film by annealing said metal film covering said hole area and said ion-injected area; removing the remaining non-silicide metal film to leave said metal silicide film as an electrode which extends laterally to cover said hole area and said adjacent area of said insulator film.