US4723508A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma CVD apparatus
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1986-04-08
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Granted: 1988-02-09
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Expires: 2006-04-08
Abstract
Abstract A plasma CVD apparatus including a reaction chamber; a pair of electrodes disposed in the reaction chamber between which plasma discharge occurs; a substrate support maintained at a reference voltage; a vacuum pump for evacuating the reaction chamber; a first voltage supply for supplying a first alternating voltage to one of the electrodes; and a second voltage supply for supplying a second alternating voltage to the other of the electrodes where the second alternating voltage is out-of-phase with respect to the first alternating voltage.
Inventors
- 👤 Shunpei Yamazaki
- 👤 Takashi Inushima
- 👤 Minoru Miyazaki
- 👤 Mitsunori Sakama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 21:06
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/517; H01J37/32137; H01J37/32155; H01J37/32165; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/332; H01J2237/3321; H01J2237/3322; H01J2237/3323
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
97 words
A plasma CVD apparatus comprising: a reaction chamber in which substrates, each having a surface to be deposited with a film, are placed; a means for introducing a reactive gas into the reaction chamber; a means for evacuating the reaction chamber; first and second electrodes disposed in the reaction chamber; and a power supply means for supplying the first and second electrodes with power for a plasma discharge; wherein the power supply means has a means generating first and second 180 out-of-phase frequencies and applying them as the plasma discharge power to the first and second electrodes.
Claim 2
Dependent Claim
97 words
A plasma CVD apparatus comprising: a reaction chamber in which substrates, each having a surface to be deposited with a film, are placed; a means for introducing a reactive gas into the reaction chamber; a means for evacuating the reaction chamber; first and second electrodes disposed in the reaction chamber; and a power supply means for supplying the first and second electrodes with power for a plasma discharge; wherein the power supply means has a means generating first and second 180 out-of-phase frequencies and applying them as the plasma discharge power to the first and second electrodes.
Claim 3
Dependent Claim
25 words
Apparatus according to claim 1 wherein the first and second electrodes are made of aluminum or an aluminum alloy, or covered with such a material.
Claim 4
Dependent Claim
88 words
A plasma CVD apparatus comprising: a reaction chamber; a pair of electrodes disposed in said reaction chamber between which plasma discharge is to take place; means for supporting a substrate at a reference voltage; a vacuum pump for evacuating said reaction chamber; a first voltage supply for supplying a first alternating voltage to one of said electrodes; and a second voltage supply for supplying a second alternating voltage to the other of said electrodes where the second alternating voltage is out-of-phase with respect to said first alternating voltage.
Claim 5
Dependent Claim
88 words
A plasma CVD apparatus comprising: a reaction chamber; a pair of electrodes disposed in said reaction chamber between which plasma discharge is to take place; means for supporting a substrate at a reference voltage; a vacuum pump for evacuating said reaction chamber; a first voltage supply for supplying a first alternating voltage to one of said electrodes; and a second voltage supply for supplying a second alternating voltage to the other of said electrodes where the second alternating voltage is out-of-phase with respect to said first alternating voltage.
Claim 6
Dependent Claim
21 words
An apparatus as in claim 3 where said first and second alternating voltages are 180° out-of-phase with respect to one another.
Claim 7
Dependent Claim
20 words
An apparatus as in claim 3 where the absolute magnitudes of said first and second alternating voltages are substantially equal.
Claim 8
Dependent Claim
21 words
An apparatus as in claim 5 where said first and second alternating voltages are 180° out-of-phase with respect to one another.
Claim 9
Dependent Claim
127 words
A plasma CVD apparatus comprising: a reaction chamber; a pair of electrodes disposed in said reaction chamber between which plasma discharge is to take place; means for supporting a substrate at a reference voltage; a vacuum pump for evacuating said reaction chamber; a voltage supply including a transformer having a secondary winding and a tap disposed at an intermediate position on said secondary winding where said tap is also at said reference voltage, a first alternating voltage being supplied from one side of the secondary winding tap to one of said electrodes, and a second alternating voltage being supplied from the other side of the secondary winding tap to the other of said electrodes where said first and second voltages are out-of-phase with respect to one another.
Claim 10
Dependent Claim
127 words
A plasma CVD apparatus comprising: a reaction chamber; a pair of electrodes disposed in said reaction chamber between which plasma discharge is to take place; means for supporting a substrate at a reference voltage; a vacuum pump for evacuating said reaction chamber; a voltage supply including a transformer having a secondary winding and a tap disposed at an intermediate position on said secondary winding where said tap is also at said reference voltage, a first alternating voltage being supplied from one side of the secondary winding tap to one of said electrodes, and a second alternating voltage being supplied from the other side of the secondary winding tap to the other of said electrodes where said first and second voltages are out-of-phase with respect to one another.
Claim 11
Dependent Claim
21 words
An apparatus as in claim 7 where said first and second alternating voltages are 180° out-of-phase with respect to one another.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-02-08 | 1991-08-10 | 1992-02-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-02-08 | 1995-08-10 | 1996-02-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-02-08 | 1999-08-10 | 2000-02-09 | $7700.00 | Window Closed / Lapsed |