Patent US4722764A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4722764A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for the manufacture of dislocation-free monocrystalline silicon rods

Assignee: Siltronic AG
•
Filing: 1986-05-01
•
Granted: 1988-02-02
•
Expires: 2006-05-01
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A method for crucible-free zone pulling of silicon monocrystalline rods is described. According to the invention, a polycrystalline silicon rod obtained by crucible pulling according to the Czochralski procedure is used in lieu of the polycrystalline silicon rod produced by vapor deposition.

Inventors

  • 👤 Heinz Herzer
  • 👤 Wolfgang Hensel
  • 👤 Gunter Matuszak

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 12:45
CPC Classifications
C; C30; C30B; C30B29/00; C30B29/02; C30B29/06; C30B13/00

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 80 words
In a method for the manufacture of a dislocation-free monocrystalline silicon rod by a crucible-free float zoning of a polycrystalline silicon supply rod, the improvement comprising the step of using a Czochralski grown polycrystalline silicon rod as the supply rod, subjecting it to a single floating zone pass, whereby a dislocation-free monocrystalline rod is obtained, and wherein the cross-sectional surface of the polycrystalline rod is substantially composed of monocrystalline regions comprising less than about 1/3 of the entire cross-sectional surface.
Claim 2
Dependent Claim 80 words
In a method for the manufacture of a dislocation-free monocrystalline silicon rod by a crucible-free float zoning of a polycrystalline silicon supply rod, the improvement comprising the step of using a Czochralski grown polycrystalline silicon rod as the supply rod, subjecting it to a single floating zone pass, whereby a dislocation-free monocrystalline rod is obtained, and wherein the cross-sectional surface of the polycrystalline rod is substantially composed of monocrystalline regions comprising less than about 1/3 of the entire cross-sectional surface.
Claim 3
Dependent Claim 29 words
The method of claim 1, wherein the diameter of said supply rod is so selected that it differs by at most 20% from that of the desired monocrystalline rod.
Claim 4
Dependent Claim 21 words
The method of claim 1, additionally including the step of forming a bulge on one end of said polycrystalline supply rod.
Claim 5
Dependent Claim 17 words
The method of claim 1, wherein said supply rod has a diameter of at least 100 mm.
Claim 6
Dependent Claim 19 words
The method of claim 1, wherein said supply rod was pulled at a speed of 1.5 to 2.5 mm/min.
Claim 7
Dependent Claim 39 words
The method according to claim 1, wherein said polycrystalline silicon rod is produced from polycrystalline silicon obtained by vapor deposition of trichlorosilane on a heated carrier element, waste pieces of floating zone produced silicon rods, and a combination thereof.

References Cited (Backward Citations)

US3442823A Cited
US3416898A Cited
US4239585A Cited
US4436578A Cited
US4200621A Cited
US4270972A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-02-01 1991-08-03 1992-02-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-02-01 1995-08-03 1996-02-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-02-01 1999-08-03 2000-02-02 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag