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Temperature compensation for a semiconductor light source used for exposure of light sensitive material

Assignee: Fujifilm Holdings Corp
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Filing: 1985-08-27
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Granted: 1987-12-01
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Expires: 2005-08-27
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Abstract

Abstract An image forming method for exposing a light-sensitive material with a semiconductor light source whereby temperature-dependent variations in the radiation intensity and spectral characteristics of the light source are fully compensated for so as to maintain constant exposure conditions. For this purpose, correction coefficients for ambient temperature dependent variations in the radiation intensity and spectral characteristics of the semiconductor light source are stored in a memory as tabulated data. In response to the measured ambient temperature, a correction coefficient is read from the memory and applied to compensate for any variations in the radiation intensity and spectral characteristics of the semiconductor light source. Also, the correction can be effected in accordance with the measured temperature of the light source, that measurement being performed by detecting a change in the forward bias supplied to the semiconductor light source.

Inventors

  • 👤 Yasuo Aotsuka
  • 👤 Masahiro Konishi
  • 👤 Koji Takahashi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 14:41
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/06; H01S5/068; G; G03; G03C; G03C5/00; G03C5/16; G03C5/164; H01S5/0607; H01S5/0612; H01S5/0617

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 72 words
In an image forming method wherein a light-sensitive material having spectral sensitivity characteristics with a peak value is exposed under a semiconductor light source, the improvement comprising: rendering a center wavelength of variations in peak spectral radiation due to variation of temperature from said light source substantially equal to a wavelength for peak spectral sensitivity of said light-sensitive material, and compensating any temperature-dependent variations in said radiation intensity of said light source.
Claim 2
Dependent Claim 72 words
In an image forming method wherein a light-sensitive material having spectral sensitivity characteristics with a peak value is exposed under a semiconductor light source, the improvement comprising: rendering a center wavelength of variations in peak spectral radiation due to variation of temperature from said light source substantially equal to a wavelength for peak spectral sensitivity of said light-sensitive material, and compensating any temperature-dependent variations in said radiation intensity of said light source.
Claim 3
Dependent Claim 32 words
The image forming method according to claim 1, wherein said radiation intensity of said light source is corrected in response to a signal of ambient temperature as measured by a temperature sensor.
Claim 4
Dependent Claim 67 words
An image forming method according to claim 1, wherein the step of compensating any temperature-dependent variations in said radiation intensity of said semiconductor light source comprises: detecting temperature variations of a temperature of said light source by measurement of change in a forward bias applied to said light source; and compensating for any variation in said temperature of said light source in response to thus-detected temperature variations.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-11-30 1991-06-01 1991-12-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-11-30 1995-06-01 1995-12-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-11-30 1999-06-01 1999-12-01 $7700.00 Window Closed / Lapsed

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