Mask washing apparatus for production of integrated circuit

Claim 1

A mask washing apparatus for fabricating semiconductor devices comprising: a vertical, airtight chamber comprising a washing space for washing the mask and a drying space for drying said mask, wherein said drying space is positioned at an upper part of said chamber, and said washing space is positioned at a lower part of said chamber; a first shutter means located on the top of said chamber, wherein said first shutter means is closed during the washing process and the drying process and is opened during the loading or unloading of said mask; a second shutter means located between said drying space and said washing space, wherein said second shutter means is closed during said washing process, and is opened during said drying process; a drain and exhaust duct means, positioned at the bottom of said chamber, for exhausting gas and water from said chamber; a gas jet type drying means for drying said mask, said drying means being positioned below said first shutter means, and emitting a flat jet flow of gas downward on both sides of the substrate to be dried, wherein said gas jet type drying means includes at least two flat nozzles positioned on either side of the substrate to be dried, wherein the upper sides of said flat nozzles are provided with cover plates extending downward close to the surface of said substrate, and is inclined to the surface of said substrate at an angle of 50° to 60°, the lower sides of said flat nozzles and said cover plates providing an orifice therebetween to provide the flat gas flow; air flow means positioned underneath said gas jet type drying means for providing clean air flow beneath said drying means and towards the surface of the substrate to be dried, said air flow means including an air inlet means for taking in air into said airtight chamber, filter means for filterining the intake air, and a fan means for forming a stream of clean air, wherein said air flow means prevents dust or water mist from being dragged into said gas jet type dryer means; and washing means, positioned in said washing space for washing the mask, wherein an air stream flowing from the top to the bottom of said chamber is produced during the washing process and the drying process, said air stream flow preventing washed out dust or water mist from the cleaned surface of the washed substrate from being recycled.