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US4079522A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus and method for cleaning and drying semiconductors

Assignee: RCA Corp
•
Filing: 1976-09-23
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Granted: 1978-03-21
•
Expires: 1996-09-23
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Abstract

Abstract A semiconductor wafer is cleansed of loose foreign surface matter and chemical impurities near the surface in an apparatus which passes superheated steam over the wafer. Condensate is permitted to form and drip off the wafer. After rising above 100° C the wafer becomes dry, and is removed from the apparatus and then permitted to cool.

Inventors

  • 👤 William Edward Ham

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 22:25
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; C; C30; C30B; C30B33/00

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 70 words
An apparatus for cleaning and drying a semiconductor wafer comprising: a. a chamber adapted to receive superheated steam; b. means for heating said chamber and maintaining a temperature in said chamber; c. a thermal mass located inside said chamber which mass has a flat inclined surface adapted to receive a semiconductor wafer; and d. means for controlling the temperature of the thermal mass said means being connected to the mass.
Claim 2
Independent Claim 70 words
An apparatus for cleaning and drying a semiconductor wafer comprising: a. a chamber adapted to receive superheated steam; b. means for heating said chamber and maintaining a temperature in said chamber; c. a thermal mass located inside said chamber which mass has a flat inclined surface adapted to receive a semiconductor wafer; and d. means for controlling the temperature of the thermal mass said means being connected to the mass.
Claim 3
Dependent Claim 19 words
The apparatus of claim 1 wherein said mass has an aperture therein adapted for flow of cooling fluid therethrough.
Claim 4
Dependent Claim 19 words
The apparatus of claim 2 wherein said means for controlling the temperature comprises a tube connected to said aperture.
Claim 5
Dependent Claim 26 words
The apparatus of claim 3 wherein said means for heating comprises a coiled electrical conductor adapted to provide heat by the passage of electrical current therethrough.
Claim 6
Dependent Claim 21 words
The apparatus of claim 4 further comprising means connected to said tube for controlling the flow of fluid through the tube.
Claim 7
Dependent Claim 19 words
The apparatus of claim 5 further comprising means connected to said conductor for controlling the passage of current therethrough.
Claim 8
Dependent Claim 13 words
The apparatus of claim 6 wherein the mass, chamber, and conduit are quartz.

References Cited (Backward Citations)

US3717439A Cited
US3845270A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-03-20 1981-09-19 1982-03-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-03-20 1985-09-19 1986-03-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-03-20 1989-09-19 1990-03-21 $7700.00 Window Closed / Lapsed

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