US4692230A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thin film forming method through sputtering and sputtering device
Assignee: Hitachi Ltd
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Filing: 1986-04-15
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Granted: 1987-09-08
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Expires: 2006-04-15
Abstract
Abstract A method for forming a thin film wherein plural targets of different materials are alternately sputtered througth the switching of the electric powers supplied thereto, the particles produced from the sputtering are ionized and thereafter deposited on a substrate. This method provides an alloy thin film, compound thin film or multi-layer thin film of any composition and enhances adhesion among the particles. A sputtering device for practicing this method is also disclosed.
Inventors
- 👤 Masayasu Nihei
- 👤 Masateru Suwa
- 👤 Mitsuo Chigasaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 01:11
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C14/32; C23C14/34; C23C14/35; C23C14/352; C23C14/354; C23C14/355
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
95 words
A method for forming film, comprising the steps of: preparing a plurality of targets formed of different materials; switching electric powers from one target to another to sputter said targets so as to deposit produced particles on a substrate; ionizing the particles produced from the sputtering and thereafter depositing the ionized particles on the substrate; accelerating the ionized particles and thereafter depositing them on a substrate so as to form said film; and controlling an accelerating voltage of said ionized particles in synchronism with a switching frequency of said electric powers supplied to the targets.
Claim 2
Independent Claim
95 words
A method for forming film, comprising the steps of: preparing a plurality of targets formed of different materials; switching electric powers from one target to another to sputter said targets so as to deposit produced particles on a substrate; ionizing the particles produced from the sputtering and thereafter depositing the ionized particles on the substrate; accelerating the ionized particles and thereafter depositing them on a substrate so as to form said film; and controlling an accelerating voltage of said ionized particles in synchronism with a switching frequency of said electric powers supplied to the targets.
Claim 3
Dependent Claim
33 words
A method for forming a film according to claim 1, wherein electric powers supplied to said targets are switched so as to supply the electric power to only one target at any time.
Claim 4
Dependent Claim
41 words
A method for forming a film according to claim 2, wherein the electric powers supplied to said plurality of targets are controlled in their peak value and application time in accordance with a composition of the thin film to be formed.
Claim 5
Independent Claim
91 words
A method for forming a film, comprising the steps of: preparing a plurality of targets formed of different materials; switching electric powers supplied from one target to another target to sputter said targets so as to deposit produced particles on a substrate; ionizing the particles produced through the sputtering; and accelerating the ionized particles and thereafter depositing them on a substrate so as to form said film; wherein an accelerating voltage of said ionized particles is controlled in synchronism with a switching frequency of said electric powers supplied to the targets.
Claim 6
Independent Claim
91 words
A method for forming a film, comprising the steps of: preparing a plurality of targets formed of different materials; switching electric powers supplied from one target to another target to sputter said targets so as to deposit produced particles on a substrate; ionizing the particles produced through the sputtering; and accelerating the ionized particles and thereafter depositing them on a substrate so as to form said film; wherein an accelerating voltage of said ionized particles is controlled in synchronism with a switching frequency of said electric powers supplied to the targets.
Claim 7
Dependent Claim
33 words
A method for forming a film according to claim 4, wherein electric powers supplied to said targets are switched so as to supply the electric power to only one target at any time.
Claim 8
Dependent Claim
40 words
A method for forming a film according to claim 4, wherein the electric powers supplied to said plurality of targets are controlled in their peak value and application time in accordance with a composition of the film to be formed.
Claim 9
Dependent Claim
89 words
A sputtering device comprising: at least two targets formed of different materials; a sputtering power source for supplying electric powers to said targets; switching means for switching the electric powers from one of said at least two targets to another of said at least two targets at a switching frequency; ionizing means for ionizing particles sputtered by means of said sputtering power source; ion accelerating means for accelerating said ionized particles with an accelerating voltage; and controlling means for controlling said accelerating voltage in synchronism with said switching frequency.
Claim 10
Dependent Claim
89 words
A sputtering device comprising: at least two targets formed of different materials; a sputtering power source for supplying electric powers to said targets; switching means for switching the electric powers from one of said at least two targets to another of said at least two targets at a switching frequency; ionizing means for ionizing particles sputtered by means of said sputtering power source; ion accelerating means for accelerating said ionized particles with an accelerating voltage; and controlling means for controlling said accelerating voltage in synchronism with said switching frequency.
Claim 11
Dependent Claim
29 words
A sputtering device according to claim 7, wherein said ionizing means includes a filament, a filament heating power source and power source for accelerating thermoelectrons emanated from the filament.
Claim 12
Dependent Claim
26 words
A sputtering device according to claim 7, wherein said switching means includes a switching element provided between each of said targets and said sputtering power source.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-09-07 | 1991-03-09 | 1991-09-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-09-07 | 1995-03-09 | 1995-09-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-09-07 | 1999-03-09 | 1999-09-08 | $7700.00 | Window Closed / Lapsed |