Apparatus for inspecting negatives

Claim 2

An inspecting method comprising the steps of: holding a transparent body, a reflective pattern being formed on one of the opposed surfaces of said transparent body; producing radiant energy; applying said radiant energy from the side of said body on which said reflective pattern is not formed so as to cause said radiant energy to converge so that the convergency of said radiant energy is greater on the surface on which said reflective pattern is formed than on the surface on which said reflective pattern is not formed; moving the area irradiated with the radiant energy and said body relative to each other; receiving the radiant energy reflected by said pattern and producing a first output; receiving the radiant energy transmitted through said body and producing a second output; and discriminating that the radiant energy applied area includes defects, when said first output is smaller than an output to be obtained in the normal reflection of said radiant energy on said pattern and said output is smaller than an output to be obtained in the normal transparence of said radiant energy through said pattern.

Claim 3

An inspecting method according to claim 1, wherein said radiant energy is laser.

Claim 4

An inspecting method according to claim 2, wherein said laser has a P-polarization characteristic.

Claim 5

An inspecting method according to claim 1, wherein said step of discriminating includes a sample and hold step, an A/D converting step, a binary conversion step, and a step of forming the logical sum.

Claim 6

A mask aligner provided with; first holding means for holding a transparent negative, a reflective semiconductor circuit pattern being formed on one of the opposed surfaces of said transparent negative; beam producing means for producing an inspecting beam; projection means for projecting said inspecting beam from the side of said negative on which said pattern is not formed so as to cause said inspecting beam to converge so that the convergency of said inspecting beam is greater on the surface on which said pattern is formed that on the surface on which said pattern is not formed; second holding means for holding a recording carrier responsive to the projected image of said pattern; first detecting means for receiving the inspecting beam reflected by said negative; second detecting means for receiving the inspecting beam transmitted through said negative; and discriminating means for discriminating that a defect is included in the area to which said inspecting beam is applied, when an output of said first detecting means is smaller than an output of said first detecting means in the normal reflection of said inspecting beam on said pattern, and an output of said second detecting means is smaller than an output of said second detecting means in the normal transparence of said inspecting beam through said pattern.

Claim 7

A mask aligner provided with; first holding means for holding a transparent negative, a reflective semiconductor circuit pattern being formed on one of the opposed surfaces of said transparent negative; beam producing means for producing an inspecting beam; projection means for projecting said inspecting beam from the side of said negative on which said pattern is not formed so as to cause said inspecting beam to converge so that the convergency of said inspecting beam is greater on the surface on which said pattern is formed that on the surface on which said pattern is not formed; second holding means for holding a recording carrier responsive to the projected image of said pattern; first detecting means for receiving the inspecting beam reflected by said negative; second detecting means for receiving the inspecting beam transmitted through said negative; and discriminating means for discriminating that a defect is included in the area to which said inspecting beam is applied, when an output of said first detecting means is smaller than an output of said first detecting means in the normal reflection of said inspecting beam on said pattern, and an output of said second detecting means is smaller than an output of said second detecting means in the normal transparence of said inspecting beam through said pattern.

Claim 10

An inspecting apparatus according to claim 6, wherein said discriminating means comprises means for taking the sum of the outputs of said first and second detecting means.

Claim 11

An inspecting apparatus according to claim 7, wherein said discriminating means further comprises means for converting the outputs of said first and second detecting means to digital form.

Claim 12

An inspecting apparatus according to claim 8, wherein said discriminating means carries out the discrimination on the basis of the sum of digitalized outputs of said first and second detecting means.

Claim 13

An inspecting apparatus according to claim 6, wherein said projecting means scans the beam relative to said body.

Claim 14

An inspecting apparatus according to claim 10, wherein said projecting means scans the beam relative to said body at a constant speed.

Claim 15

An inspecting apparatus according to claim 11, wherein said projecting means obliquely projects the beam to said body.

Claim 16

An inspecting apparatus according to claim 12, wherein said projecting means comprises means for correcting the aberrations of the converged point of the beam.

Claim 17

An inspecting apparatus according to claim 13, wherein said projecting means projects a linearly polarized beam.

Claim 18

An inspecting apparatus according to claim 14, wherein said projecting means projects a P-polarized beam.

Claim 19

An inspecting apparatus according to claim 15, wherein said projecting means projects a laser beam.

Claim 20

An inspecting apparatus according to claim 6, wherein said body is used during the manufacturing of a semiconductor.

Claim 21

An inspecting apparatus according to claim 6, wherein said body moves in a predetermined direction relative to the beam.

Claim 22

An inspecting apparatus according to claim 18, wherein said projecting means scans the beam in a direction different from that of the movement of said body.

Claim 23

An inspecting apparatus according to claim 19, wherein at least one of said first and second detecting means comprises a sensor array arranged in the direction of said beam scan.