Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
208 words
A semiconductor device being operable to produce millimeter wave signal oscillations, comprising in combination: first and second planar doped barrier regions of semiconductor material separated by a superlattice region, said superlattice region being comprised of a plurality of pairs of alternating layers of semiconductor material wherein each pair of layers define a period of a superlattice, said first planar doped barrier region being comprised of a relatively narrow layer of first type semiconductivity located between a pair of nominally undoped or intrinsic layers, each of said intrinsic layers being bounded by an outer layer of second type semiconductivity, said second planar doped barrier region being comprised of a relatively narrow layer of first type semiconductivity located between a pair of nominally undoped or intrinsic layers, each of said other intrinsic layers being bound by an outer layer of second type semiconductivity, whereby upon the application of a uniform electric field, the first planar doped barrier region oparates to input majority carriers into said superlattice region and which traverse therethrough and are collected by said second planar doped barrier region and in so doing undergo an oscillatory motion which is a function of the magnitude of the applied potential and the distance across each period of said superlattice region.
Claim 2
Dependent Claim
208 words
A semiconductor device being operable to produce millimeter wave signal oscillations, comprising in combination: first and second planar doped barrier regions of semiconductor material separated by a superlattice region, said superlattice region being comprised of a plurality of pairs of alternating layers of semiconductor material wherein each pair of layers define a period of a superlattice, said first planar doped barrier region being comprised of a relatively narrow layer of first type semiconductivity located between a pair of nominally undoped or intrinsic layers, each of said intrinsic layers being bounded by an outer layer of second type semiconductivity, said second planar doped barrier region being comprised of a relatively narrow layer of first type semiconductivity located between a pair of nominally undoped or intrinsic layers, each of said other intrinsic layers being bound by an outer layer of second type semiconductivity, whereby upon the application of a uniform electric field, the first planar doped barrier region oparates to input majority carriers into said superlattice region and which traverse therethrough and are collected by said second planar doped barrier region and in so doing undergo an oscillatory motion which is a function of the magnitude of the applied potential and the distance across each period of said superlattice region.
Claim 3
Dependent Claim
21 words
The device as defined by claim 1 wherein said pairs of alternating layers of semiconductive material comprise intrinsic layers of semiconductivity.
Claim 4
Dependent Claim
26 words
The device as defined by claim 1 wherein said device is fabricated from semiconductor compounds selected from Group III-V or II-IV compounds as well as silicon.
Claim 5
Dependent Claim
38 words
The device as defined by claim 1 wherein said first and second planar doped barrier regions are formed from gallium arsenide and wherein said superlattice region is formed from alternating layers of gallium arsenide and gallium aluminum arsenide.
Claim 6
Dependent Claim
25 words
The device as defined by claim 1 wherein said first type of semiconductivity comprises p+ semiconductivity and wherein said second type semiconductivity comprises n+ semiconductivity.
Claim 7
Dependent Claim
53 words
The device as defined by claim 1 wherein said relatively narrow layers of first type semiconductivity of said first and second planar doped barrier regions comprise regions of semiconductor material doped with p+ dopant material wherein said outer layers of said second type semiconductivity comprise semiconductive material doped with n+ type dopant material.
Claim 8
Dependent Claim
45 words
The device as defined by claim 1 wherein said first and second planar doped barrier regions comprise n+-i-p+-i-n+ and i-p+-i-n+ type epilayer structures, respectively, and wherein said superlattice region comprises an i type epilayer structure contiguous with said structures of said planar doped barrier regions.
Claim 9
Dependent Claim
22 words
The device as defined by claim 7 wherein said device is formed of semiconductor compounds selected from Group III-V or II-IV compounds.
Claim 10
Dependent Claim
45 words
The device as defined by claim 8 and wherein said epilayer structures of said first and second planar doped barrier regions are formed from gallium arsenide and wherein said epilayer structure of said superlattice region is formed from both gallium arsenide and gallium aluminum arsenide.
Claim 11
Dependent Claim
43 words
The device as defined by claim 9 and additionally including a pair of ohmic contacts formed on the outer surface of the outer n+ layers of the first and second planar doped barrier regions to thereby provide a diode type of semiconductor device.
Claim 12
Dependent Claim
85 words
The device as defined by claim 10 and wherein the outer n+ layer of said n+-i-p+-i-n+ epilayer structure of said second planar doped barrier region includes a ring-shaped ohmic contact on a common outer surface with said superlattice region; said first doped barrier region being located in the center of said ring-shaped ohmic contact, and additionally including an ohmic contact on the outer surface of the n+ layer of said n+-i-p+-i-n+ first planar doped barrier region to thereby provide a diode type of semiconductor device.
Claim 13
Dependent Claim
42 words
The device as defined by claim 11 wherein said outer n+ layer of said n+ i-p+-i-n+ epilayer structure of said second planar doped barrier region comprises a layer having a relatively large thickness in relation to the remaining layers of said structure.
Claim 14
Dependent Claim
36 words
The device as defined by claim 1 wherein said outer layers of said first and second planar doped barrier region include a pair of ohmic contacts formed thereon to provide a diode type of semiconductor device.