← Back to Patent Explorer
US4665504A Expired / Lapsed US ⏱️ 0.0 years remaining

Memory device containing electrically conducting substrate having deposited hereon a layer of amorphous or microcrystalline silicon-carbon alloy and a layer of amorphous or microcrystalline silicon-containing material

Assignee: BP PLC
•
Filing: 1983-11-16
•
Granted: 1987-05-12
•
Expires: 2003-11-16
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A memory device comprises an electrically conducting substrate having deposited thereon a layer of an amorphous or microcrystalline silicon-carbon alloy and a layer of amorphous or microcrystalline silicon-containing material to form a junction. Preferably the silicon-containing material is silicon and the junction is a heterojunction. The device has fast switching characteristics and good stability.

Inventors

  • 👤 Peter J. Hockley
  • 👤 Michael J. Thwaites

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 19:09
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/80; H10D62/82; H10D62/822; G; G11; G11C; G11C17/00; G11C17/14; G11C17/16; H10D48/00; H10D48/30; H10D48/38; H10D48/381; H10D62/40; H10W; H10W20/00; H10W20/40; H10W20/49; H10W20/491

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 56 words
A memory device conditioned by the application of a voltage sufficiently large to permanently modify the electrical characteristics to a layered semiconductor structure, the memory device comprising an electrically conducting substrate having deposited thereon a layer of an amorphous or microcrystalline silicon-carbon alloy and a layer of amorphous or microcrystalline silicon-containing material to form a junction.
Claim 2
Dependent Claim 56 words
A memory device conditioned by the application of a voltage sufficiently large to permanently modify the electrical characteristics to a layered semiconductor structure, the memory device comprising an electrically conducting substrate having deposited thereon a layer of an amorphous or microcrystalline silicon-carbon alloy and a layer of amorphous or microcrystalline silicon-containing material to form a junction.
Claim 3
Dependent Claim 31 words
A memory device according to claim 1 wherein the layer of amorphous or microcrystalline silicon-containing material is amorphous or microcrystalline silicon and forms a heterojunction with the layer of silicon-carbon alloy.
Claim 4
Dependent Claim 35 words
A memory device according to claim 1 wherein the layer of amorphous or microcrystalline silicon-containing material is also a layer of a silicon-carbon alloy and forms a homojunction with the first layer of silicon-carbon alloy.
Claim 5
Dependent Claim 25 words
A memory device according to claim 1 wherein the layers have the configuration p-i, p + -i, p-n, p + -n, or p-n + .
Claim 6
Dependent Claim 21 words
A memory device according to claim 1 wherein at least three layers are present having a p-i-n or p-n-i type configuration.
Claim 7
Dependent Claim 57 words
A memory device, conditioned by the application of a voltage sufficiently large to permanently modify the electrical characteristics to a layered semiconductor structure, the memory device comprising an electrically conducting substrate having deposited thereon a p-type layer of an amorphous or microcrystalline silicon-carbon alloy and an n-type layer of amorphous or microcrystalline silicon to form a heterojunction.
Claim 8
Dependent Claim 57 words
A memory device, conditioned by the application of a voltage sufficiently large to permanently modify the electrical characteristics to a layered semiconductor structure, the memory device comprising an electrically conducting substrate having deposited thereon a p-type layer of an amorphous or microcrystalline silicon-carbon alloy and an n-type layer of amorphous or microcrystalline silicon to form a heterojunction.

References Cited (Backward Citations)

US3600645A Cited
GB1300528A Cited
US3740620A Cited
US4103312A Cited
US4199692A Cited
US4459163A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-05-11 1990-11-10 1991-05-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-05-11 1994-11-10 1995-05-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-05-11 1998-11-10 1999-05-12 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag