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US4630094A Expired / Lapsed US ⏱️ 0.0 years remaining

Use of metallic glasses for fabrication of structures with submicron dimensions

Assignee: Wisconsin Alumni Research Foundation
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Filing: 1985-03-08
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Granted: 1986-12-16
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Expires: 2005-03-08
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Abstract

Abstract Patterned structures of submicron dimension formed of supported or unsupported amorphous metals having submicron feature sizes characterized by etching behavior sufficient to allow delineation of sharp edges and smooth flat flanks, resistance to time-dependent dimensional changes caused by creep, flow, in-diffusion of unwanted impurities, out-diffusion of constituent atoms, void formation, grain growth or phase separation and resistance to phase transformations or compound formation.

Inventors

  • 👤 John D. Wiley
  • 👤 John H. Perepezko

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 06:21
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/20; G03F7/00; Y; Y10; Y10S; Y10S428/00; Y10S428/922; Y10S428/923

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 53 words
Patterned structures in contact with semiconductor regions having physical, geometric features of submicron dimension formed of amorphous metals having submicron feature sizes characterized by etching behavior sufficient to allow delineation of sharp edges and smooth flat flanks and without grain boundaries or other microscopic inhomogeneities which could cause anisotropic or locally enhanced etching.
Claim 2
Dependent Claim 53 words
Patterned structures in contact with semiconductor regions having physical, geometric features of submicron dimension formed of amorphous metals having submicron feature sizes characterized by etching behavior sufficient to allow delineation of sharp edges and smooth flat flanks and without grain boundaries or other microscopic inhomogeneities which could cause anisotropic or locally enhanced etching.
Claim 3
Dependent Claim 36 words
Patterned structures of submicron dimension as claimed in claim 1 characterized by resistance to time-dependent dimensional changes caused by creep, flow, in-diffusion of unwanted impurities, out-diffusion of constituent atoms, void formation, grain growth or phase separation.
Claim 4
Dependent Claim 19 words
Patterned structures of submicron dimension as claimed in claim 1 characterized by resistance to phase transformations or compound formation.
Claim 5
Dependent Claim 29 words
Patterned structures of submicron dimension as claimed in claim 1 in which the amorphous metal is characterized by a lack of crystallinity on a distance scale of 10-20 angstroms.
Claim 6
Dependent Claim 45 words
Patterned structures of submicron dimension as claimed in claim 1 in which the amorphous metal has a binary composition having the formula T x N 1-x in which x is approximately 0.8, T is a transition metal and N is a normal metal or metalloid.
Claim 7
Dependent Claim 24 words
Patterned structures of submicron dimension as claimed in claim 5 in which T is selected from the group consisting of Pd, Au and Co.
Claim 8
Dependent Claim 24 words
Patterned structures of submicron dimension as claimed in claim 5 in which N is selected from the group consisting of Si, Ge and B.
Claim 9
Dependent Claim 52 words
Patterned structures of submicron dimension as claimed in claim 1 in which the amorphous metal has a pseudobinary composition having the formula (T 1 ) n (T 2 ) 0 .8-n N 2 in which T 1 and T 2 are transition metals, N is a normal metal or metalloid and 0.2≦n≧0.8.
Claim 10
Dependent Claim 28 words
Patterned structures of submicron dimension as claimed in claim 8 in which T 1 and T 2 are selected from the group consisting of Pd, Au and Co.
Claim 11
Dependent Claim 24 words
Patterned structures of submicron dimension as claimed in claim 8 in which N is selected from the group consisting of Si, Ge and B.
Claim 12
Dependent Claim 38 words
Patterned structures of submicron dimension as claimed in claim 1 in which the patterned structure is in the form of holes, channels, grooves or other recessed surface features formed in a planar surface of an amorphous metal layer.
Claim 13
Dependent Claim 37 words
Patterned structures of submicron dimension as claimed in claim 1 in which the patterned structure is in the form of mesas, stripes, islands or other raised structures of amorphous metal bonded onto the surface of a substrate.
Claim 14
Dependent Claim 35 words
Patterned structures of submicron dimension as claimed in claim 1 in which the patterned structure is a combination of holes, channels, grooves or other recessed surface features and mesas, stripes, islands or other raised structures.
Claim 15
Dependent Claim 43 words
Patterned structures of submicron dimension as claimed in claim 1 in which the patterned structure is a combination of holes, channels, grooves or other recessed surface features in a first layer and mesas, stripes, islands or other raised structures in a second layer.
Claim 16
Dependent Claim 24 words
Patterned structures of submicron dimension as claimed in claim 1 in which the amorphous metal contains crystallites in a volume fraction not exceeding 25%.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-12-15 1990-06-16 1990-12-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-12-15 1994-06-16 1994-12-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-12-15 1998-06-16 1998-12-16 $7700.00 Window Closed / Lapsed

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