US4626491A
Expired / Lapsed
US
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Deep ultra-violet lithographic resist composition and process of using
Assignee: Avantor Performance Materials LLC
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Filing: 1985-09-12
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Granted: 1986-12-02
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Expires: 2005-09-12
Abstract
Abstract Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula <IMAGE> wherein X is alkylene, arylene, alkoxyalkylene or aralkylene and n is a positive integer such that the molecular weight of the oligomeric compound is from about 500 to about 3000.
Inventors
- 👤 Gary M. Gray
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 06:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
88 words
A lithographic resist composition for use with deep UV light of less than 300 nm wavelength comprising a base soluble film-forming polymer and in admixture therewith as a deep UV photosensitive solubilizing agent, a sufficient quantity of an oligomeric compound of the formula ##STR10## wherein X is ##STR11## and n is a whole positive integer such that the molecular weight of the oligomeric compound is from about 300 to about 3000 daltons, whereby upon exposure to deep UV radiation the exposed composition becomes more soluble in basic developer.
Claim 2
Dependent Claim
88 words
A lithographic resist composition for use with deep UV light of less than 300 nm wavelength comprising a base soluble film-forming polymer and in admixture therewith as a deep UV photosensitive solubilizing agent, a sufficient quantity of an oligomeric compound of the formula ##STR10## wherein X is ##STR11## and n is a whole positive integer such that the molecular weight of the oligomeric compound is from about 300 to about 3000 daltons, whereby upon exposure to deep UV radiation the exposed composition becomes more soluble in basic developer.
Claim 3
Dependent Claim
26 words
A composition of claim 1 wherein the base-soluble film-forming polymer is a resin selected from the group consisting of phenol-formaldehyde, cresol-formaldehyde and poly(methyl methacrylate-methacrylic acid) resins.
Claim 4
Dependent Claim
32 words
A composition of claim 1 wherein the solubilizing agent is present in an amount of from about 15 to about 95% by weight based on the combined weight of polymer and agent.
Claim 5
Dependent Claim
32 words
A composition of claim 2 wherein the solubilizing agent is present in an amount of from about 15 to about 95% by weight based on the combined weight of polymer and agent.
Claim 6
Dependent Claim
13 words
A composition of claim 2 wherein the polymer is a poly(methyl methacrylate-methacrylic acid).
Claim 7
Dependent Claim
28 words
A composition of claim 5 wherein the poly(methyl methacrylate-methacrylic acid) has a molecular weight of about 80,000 and the ratio of methyl methacrylate to methacrylic acid is 75/25.
Claim 8
Dependent Claim
27 words
A castable resist composition comprising the lithographic resist composition of claim 1 in a film-forming solvent having a boiling point of from about 120° to 210° C.
Claim 9
Dependent Claim
27 words
A castable resist composition comprising the lithographic resist composition of claim 4 in a film-forming solvent having a boiling point of from about 120° to 210° C.
Claim 10
Dependent Claim
23 words
A castable resist composition of claim 8 wherein the solvent comprises from about 50 to about 85% by weight of the castable composition.
Claim 11
Dependent Claim
27 words
A castable resin composition of claim 9 wherein the solvent is selected from the group consisting of diglyme, methyl isobutyl ketone and 2-ethoxyethanol, 2-methoxyethyl acetate and γ-butyrolactone.
Claim 12
Dependent Claim
27 words
A castable resist composition comprising the lithographic resist composition of claim 6 in a film-forming solvent having a boiling point of from about 120° to 210° C.
Claim 13
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 7.
Claim 14
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 8.
Claim 15
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution herein the film cast on the substrate comprises a film cast from the castable composition of claim 9.
Claim 16
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 10.
Claim 17
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 11.
References Cited (Backward Citations)
US3046118A
Cited
US3494767A
Cited
US3647443A
Cited
US4207107A
Cited
US4339522A
Cited
US4284706A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-12-01 | 1990-06-02 | 1990-12-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-12-01 | 1994-06-02 | 1994-12-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-12-01 | 1998-06-02 | 1998-12-02 | $7700.00 | Window Closed / Lapsed |