US4588670A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
Assignee: Clariant Finance BVI Ltd
•
Filing: 1985-02-28
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Granted: 1986-05-13
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Expires: 2005-02-28
Abstract
Abstract A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.
Inventors
- 👤 Michael Kelly
- 👤 Donald C. Mammato
- 👤 Dana Durham
- 👤 Sangya Jain
- 👤 Lawrence Crane
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 11:25
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
59 words
A light sensitive composition comprising a mixture of an alkali soluble resin and a light sensitive component, said light sensitive component consisting essentially of a compound of the formula ##STR6## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue wherein the ratio by weight of said resin to said light-sensitive component is in the range of from about 1:1 to about 10:1.
Claim 2
Dependent Claim
59 words
A light sensitive composition comprising a mixture of an alkali soluble resin and a light sensitive component, said light sensitive component consisting essentially of a compound of the formula ##STR6## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue wherein the ratio by weight of said resin to said light-sensitive component is in the range of from about 1:1 to about 10:1.
Claim 3
Dependent Claim
13 words
The composition of claim 1 wherein said resin is a hydroxy aryl resin.
Claim 4
Dependent Claim
12 words
The composition of claim 2 wherein said resin is a novolak resin.
Claim 5
Dependent Claim
12 words
The composition of claim 3 wherein said resin is cresol novolak resin.
Claim 6
Dependent Claim
13 words
The composition of claim 2 wherein said resin is a polyvinyl phenol resin.
Claim 7
Dependent Claim
11 words
The composition of claim 1 wherein X is a naphthoquinone-(1,2)-diazide-(2)-4-sulfonyl residue.
Claim 8
Dependent Claim
11 words
The composition of claim 1 wherein X is a naphthoquinone-(1,2)-diazide-(2)-5-sulfonyl residue.
Claim 9
Dependent Claim
18 words
The composition of claim 1 wherein said resin is cresol novolak resin and X is a napthoquinone-(1,2)-diazide-(2)-4-sulfonyl residue.
Claim 10
Dependent Claim
18 words
The composition of claim 1 wherein said resin is cresol novolak resin and X is a naphthoquinone-(1,2)-diazide-(2)-5-sulfonyl residue.
Claim 11
Dependent Claim
27 words
The composition of claim 8 wherein the ratio by weight of said resin to said naphthoquinone derivative is in the range from about 6:1 to about 10:1.
Claim 12
Dependent Claim
28 words
The composition of claim 9 wherein the ratio by weight of said resin to said naphthoquinone derivative is in the range of from about 6:1 to about 10:1.
Claim 13
Dependent Claim
13 words
A photoresist which comprises the composition of claim 1 coated on a support.
Claim 14
Dependent Claim
28 words
The photoresist of claim 12 wherein said support is selected from the group consisting of a semiconductor material, a metal, a plastic film, wood, paper, ceramics and textiles.
Claim 15
Dependent Claim
12 words
The photoresist of claim 12 wherein said support is a silicon-based wafer.
Claim 16
Dependent Claim
10 words
The photoresist of claim 13 wherein said support comprises aluminum.
Claim 17
Dependent Claim
29 words
The composition of claim 1 further comprising one or more additives selected from the group consisting of colorants, dyes, anti-striation agents, plasticizers, adhesion promoters, speed enhancers, solvents and surfactants.
Claim 18
Dependent Claim
37 words
The photoresist of claim 12 wherein said support comprises one or more compounds selected from the group consisting of polyester, polyolefin, silicon, gallium arsenide, silicon/silicon dioxide, doped silicon dioxide, silicon nitride, aluminum/copper mixtures, tantalum, copper and polysilicon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-05-12 | 1989-11-11 | 1990-05-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-05-12 | 1993-11-11 | 1994-05-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-05-12 | 1997-11-11 | 1998-05-13 | $7700.00 | Window Closed / Lapsed |