US4174222A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive-type O-quinone diazide containing photoresist compositions
Assignee: Tokyo Ohka Kogyo Co Ltd
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Filing: 1978-02-27
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Granted: 1979-11-13
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Expires: 1998-02-27
Abstract
Abstract A gallic acid alkyl ester or a gallic acid aryl ester is reacted in an inert solvent with 3 equivalents of naphthoquinone-(1,2)-diazido-(2)-sulfonyl chloride in the presence of an alkali to effect sulfonylation of 3 hydroxyl groups in the gallic acid moiety whereby a photodecomposable naphthoquinone-(1,2)-diazido-(2)-sulfonic acid ester is obtained. The new naphthoquinonediazido derivative thus obtained is mixed with an alkali-soluble phenol resin such as m-cresol novolac resin or phenol novolac resin to prepare a positive-type photoresist composition having high sensitivity and high resolving power as well as excellent dimensional accuracy and etching-resistance. In addition, this composition forms a good photosensitive film and can be a good ink receptor.
Inventors
- 👤 Takashi Komine
- 👤 Akira Yokota
- 👤 Hisashi Nakane
- 👤 Shingo Asaumi
- 👤 Noboru Okazaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 04:12
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
70 words
A positive-type photoresist composition which comprises as essential ingredients an alkali-soluble phenolic novolac resin in an amount sufficient to give etching resistance to the composition and at least one naphthoquinonediazido derivative of the general formula ##STR3## in an amount sufficient to make the composition photodecomposable wherein R stands for a substituent selected from the group consisting of alkyl, aryl and nucleus-substituted aryl groups and X stands for a naphthoquinone-(1,2)-diazido-(2)-sulfonyl residue.
Claim 2
Dependent Claim
70 words
A positive-type photoresist composition which comprises as essential ingredients an alkali-soluble phenolic novolac resin in an amount sufficient to give etching resistance to the composition and at least one naphthoquinonediazido derivative of the general formula ##STR3## in an amount sufficient to make the composition photodecomposable wherein R stands for a substituent selected from the group consisting of alkyl, aryl and nucleus-substituted aryl groups and X stands for a naphthoquinone-(1,2)-diazido-(2)-sulfonyl residue.
Claim 3
Dependent Claim
39 words
The positive-type photoresist composition as claimed in claim 1 wherein R in the general formula is selected from the group consisting of alkyl groups having 2-5 carbon atoms, phenyl group, nucleus-substituted phenyl groups, nephthyl group and nucleus-substituted naphthyl groups.
Claim 4
Dependent Claim
40 words
The positive-type photoresist composition as claimed in claim 2 wherein R in the general formula is selected from the group consisting of ethyl, propyl, n-butyl, isobutyl, amyl, isoamyl, phenyl, naphthyl, tolyl, xylyl, α-methylnaphthyl, methoxyphenyl, ethoxyphenyl, acetylphenyl, hydroxyphenyl and hydroxynaphthyl groups.
Claim 5
Dependent Claim
19 words
The positive-type photoresist composition as claimed in claim 1 wherein the naphthoquinone-(1,2)-diazido-(2)-sulfonyl residue is naphthoquinone-(1,2)-diazido-(2)-4-sulfonyl residue or naphthoquinone-(1,2)-diazido-(1,2)-5-sulfonyl residue.
Claim 6
Dependent Claim
25 words
The positive-type photoresist composition as claimed in claim 1 wherein the alkali-soluble phenolic novolac resin is a m-cresol novolac resin or a phenol novolac resin.
Claim 7
Dependent Claim
33 words
The positive-type photoresist composition as claimed in claim 1 wherein the ratio by weight of the alkali-soluble phenolic novolac resin to the naphthoquinonediazido derivative is in the range from about 1:1 to 10:1.
Claim 8
Dependent Claim
18 words
The positive-type photoresist composition as claimed in claim 1 which additionally comprises a dye or a thermal stabilizer.
Claim 9
Dependent Claim
12 words
The composition as set forth in claim 1 wherein X is naphthoquinone-(1,2)-diazido-(2)-5-sulfonyl.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-11-12 | 1983-05-14 | 1983-11-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-11-12 | 1987-05-14 | 1987-11-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-11-12 | 1991-05-14 | 1991-11-13 | $7700.00 | Window Closed / Lapsed |