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US4587540A Expired / Lapsed US ⏱️ 0.0 years remaining

Vertical MESFET with mesa step defining gate length

Assignee: International Business Machines Corp
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Filing: 1985-01-17
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Granted: 1986-05-06
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Expires: 2005-01-17
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Abstract

Abstract The edge of a conformal coating over a mesa is usable to define a shoulder in the vertical dimension of the mesa which in turn is used for positioning. Structures are provided that permit electrodes at precise locations along the length of a mesa. A vertical field effect transistor is set forth with a mesa serving as the channel and the gate electrode positioned at a shoulder formed by the edge dimension of a coating on the sides of the mesa.

Inventors

  • 👤 Thomas N. Jackson

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 18:59
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/69; H10P50/691; H10D; H10D62/00; H10D62/10; H10D62/113; H10D62/115; H10D62/116; H10D64/00; H10D64/01; H10D64/011

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 138 words
A semiconductor structure comprising in combination: a monocrystalline semiconductor substrate of one conductivity type having a planar top surface and a mesa extending from said planar top surface; wherein said mesa has a step at a given distance from said planar top surface defining a base of said mesa which has a larger cross sectional area than the portion above the step; an electrode with a thickness equal to said given distance which forms a rectifying contact with said base of said mesa; wherein said electrode is formed on said planar top surface around the periphery of said mesa contiguous with said base of said mesa; and wherein said semiconductor substrate is semi-insulating in that region directly under and contiguous with said electrode; ohmic contacts formed on the top of said mesa and the bottom of said substrate.
Claim 2
Dependent Claim 138 words
A semiconductor structure comprising in combination: a monocrystalline semiconductor substrate of one conductivity type having a planar top surface and a mesa extending from said planar top surface; wherein said mesa has a step at a given distance from said planar top surface defining a base of said mesa which has a larger cross sectional area than the portion above the step; an electrode with a thickness equal to said given distance which forms a rectifying contact with said base of said mesa; wherein said electrode is formed on said planar top surface around the periphery of said mesa contiguous with said base of said mesa; and wherein said semiconductor substrate is semi-insulating in that region directly under and contiguous with said electrode; ohmic contacts formed on the top of said mesa and the bottom of said substrate.
Claim 3
Dependent Claim 11 words
The structure of claim 1 wherein said semiconductor substrate is GaAs.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-05-05 1989-11-04 1990-05-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-05-05 1993-11-04 1994-05-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-05-05 1997-11-04 1998-05-06 $7700.00 Window Closed / Lapsed

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