US4586141A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for an electron beam exposure system
Assignee: Fujitsu Ltd
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Filing: 1983-09-27
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Granted: 1986-04-29
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Expires: 2003-09-27
Abstract
Abstract An electron beam exposure system and method which varies beam size from pattern to pattern corresponding to the accuracy required for each pattern. In order to improve the throughput of the exposer, the beam size is adjusted to the maximum size useable for each pattern. The pattern is divided into rectangles equal to the maximum beam size determined by the pattern size or the accuracy required for the pattern. If a residual part of the pattern smaller than a rectangle remains, the rectangles are adjusted to be smaller than the maximum beam size, so the entire area of the pattern can be divided into equal size rectangles. The pitch and size of the beam are adjusted to this new beam size and exposure is repeated according to the new size rectangles. To increase the processing speed, all the patterns to be exposed in one process are checked as to their size and required accuracy, and the data necessary for the pattern generation such as beam size, pitch and number of exposures are calculated in advance and stored in a memory of a beam controller.
Inventors
- 👤 Hiroshi Yasuda
- 👤 Haruo Tsuchikawa
- 👤 Junichi Kai
- 👤 Koichi Kobayashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 14:36
CPC Classifications
B; B82; B82Y; B82Y10/00; H; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3023; H01J37/3026; B82Y40/00; H01J37/317; H01J37/3174; H10; H10P; H10P95/00; H01J2237/00; H01J2237/30; H01J2237/317; H01J2237/3175; H01J2237/31761; H01J2237/31764; H01J2237/31776
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
237 words
An electron beam exposure method for exposing patterns on a substrate, comprising the steps of: (a) storing pattern information, including accuracy information, starting position information and pattern size information for the patterns; (b) storing pattern data, including number data, pitch data and beam size data in dependence upon the pattern information, said step (b) comprising the substeps of: (bi) dividing each of the patterns into rectangles equal to a maximum size of the beam in dependence upon the accuracy information; (bii) generating the beam size data; (biii) adjusting the beam size data to a new beam size if a residual area of the patterns smaller than the maximum beam size remains, the new beam size being smaller than the maximum beam size thereby allowing each of the patterns to be divided into an integer number of new rectangles having a size equal to the new beam size; and (biv) generating the pitch data and the number data in dependence upon the adjusted beam size data; (c) selecting the pattern data in dependence upon the accuracy information and the pattern size information; (d) providing a beam size signal in dependence upon the beam size data; (e) providing position signals in dependence upon the pitch data, the number data and the starting position information; (f) deflecting the beam in accordance with the beam size signal; and (g) deflecting the beam onto the substrate in accordance with the position signals.
Claim 2
Dependent Claim
237 words
An electron beam exposure method for exposing patterns on a substrate, comprising the steps of: (a) storing pattern information, including accuracy information, starting position information and pattern size information for the patterns; (b) storing pattern data, including number data, pitch data and beam size data in dependence upon the pattern information, said step (b) comprising the substeps of: (bi) dividing each of the patterns into rectangles equal to a maximum size of the beam in dependence upon the accuracy information; (bii) generating the beam size data; (biii) adjusting the beam size data to a new beam size if a residual area of the patterns smaller than the maximum beam size remains, the new beam size being smaller than the maximum beam size thereby allowing each of the patterns to be divided into an integer number of new rectangles having a size equal to the new beam size; and (biv) generating the pitch data and the number data in dependence upon the adjusted beam size data; (c) selecting the pattern data in dependence upon the accuracy information and the pattern size information; (d) providing a beam size signal in dependence upon the beam size data; (e) providing position signals in dependence upon the pitch data, the number data and the starting position information; (f) deflecting the beam in accordance with the beam size signal; and (g) deflecting the beam onto the substrate in accordance with the position signals.
Claim 3
Dependent Claim
221 words
An electron beam exposure method for exposing patterns on a substrate, comprising the steps of: (a) storing pattern information, including accuracy information, starting position information and pattern size information for the patterns; (b) storing pattern data, including number data, pitch data and beam size data in dependence upon the pattern information, said step (b) comprising the substeps of: (bi) dividing each of the patterns into rectangles equal to the maximum beam size in dependence upon the accuracy information; (bii) generating beam size data corresponding to a main part of the pattern, the main part being an integer multiple size of the maximum beam size, and the beam size data, the pitch data and the number data being generated in dependence upon the maximum beam size; and (biii) generating beam size data, pitch data and number data corresponding to a residual area which is smaller than the maximum beam size; (c) selecting the pattern data in dependence upon the accuracy information and the pattern size information; (d) providing a beam size signal in dependence upon the beam size data; (e) providing position signals in dependence upon the pitch data, the number data and the starting position information; (f) deflecting the beam in accordance with the beam size signal; and (g) deflecting the beam onto the substrate in accordance with the position signals.
Claim 4
Dependent Claim
221 words
An electron beam exposure method for exposing patterns on a substrate, comprising the steps of: (a) storing pattern information, including accuracy information, starting position information and pattern size information for the patterns; (b) storing pattern data, including number data, pitch data and beam size data in dependence upon the pattern information, said step (b) comprising the substeps of: (bi) dividing each of the patterns into rectangles equal to the maximum beam size in dependence upon the accuracy information; (bii) generating beam size data corresponding to a main part of the pattern, the main part being an integer multiple size of the maximum beam size, and the beam size data, the pitch data and the number data being generated in dependence upon the maximum beam size; and (biii) generating beam size data, pitch data and number data corresponding to a residual area which is smaller than the maximum beam size; (c) selecting the pattern data in dependence upon the accuracy information and the pattern size information; (d) providing a beam size signal in dependence upon the beam size data; (e) providing position signals in dependence upon the pitch data, the number data and the starting position information; (f) deflecting the beam in accordance with the beam size signal; and (g) deflecting the beam onto the substrate in accordance with the position signals.
Claim 5
Dependent Claim
255 words
An electron beam exposure method for exposing patterns on a substrate, comprising the steps of: (a) storing pattern information, including accuracy information, starting position information and pattern size information for the patterns; (b) storing pattern data, including number data, pitch data and beam size data in dependence upon the pattern information, said step (b) comprising the substeps of: (bi) dividing each of the patterns into rectangles equal to the maximum beam size in dependence upon the accuracy information; (bii) generating beam size data corresponding to a main part of the pattern; (biii) generating beam size data corresponding to a residual part of the pattern; (biv) combining a portion of the main part, the residual part and the remainder of the main part, and forming a combined portion and a remaining portion; (bv) generating the pitch data and the number data in dependence upon the maximum beam size for the remaining portion; and (bvi) changing the beam size data corresponding to the residual part in dependence upon the size of the combined portion, and generating pitch data and number data for the combined portion; (c) selecting the pattern data in dependence upon the accuracy information and the pattern size information; (d) providing a beam size signal in dependence upon the beam size data; (e) providing position signals in dependence upon the pitch data, the number data and the starting position information; (f) deflecting the beam in accordance with the beam size signal; and (g) deflecting the beam onto the substrate in accordance with the position signals.
Claim 6
Dependent Claim
255 words
An electron beam exposure method for exposing patterns on a substrate, comprising the steps of: (a) storing pattern information, including accuracy information, starting position information and pattern size information for the patterns; (b) storing pattern data, including number data, pitch data and beam size data in dependence upon the pattern information, said step (b) comprising the substeps of: (bi) dividing each of the patterns into rectangles equal to the maximum beam size in dependence upon the accuracy information; (bii) generating beam size data corresponding to a main part of the pattern; (biii) generating beam size data corresponding to a residual part of the pattern; (biv) combining a portion of the main part, the residual part and the remainder of the main part, and forming a combined portion and a remaining portion; (bv) generating the pitch data and the number data in dependence upon the maximum beam size for the remaining portion; and (bvi) changing the beam size data corresponding to the residual part in dependence upon the size of the combined portion, and generating pitch data and number data for the combined portion; (c) selecting the pattern data in dependence upon the accuracy information and the pattern size information; (d) providing a beam size signal in dependence upon the beam size data; (e) providing position signals in dependence upon the pitch data, the number data and the starting position information; (f) deflecting the beam in accordance with the beam size signal; and (g) deflecting the beam onto the substrate in accordance with the position signals.
References Cited (Backward Citations)
US31630A
Cited
US3949228A
Cited
US4393312A
Cited
USRE31630E
Cited
US4182958A
Cited
US4218621A
Cited
US4151422A
Cited
US4132898A
Cited
US4199689A
Cited
US4393310A
Cited
US4243866A
Cited
US4469950A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-04-28 | 1989-10-28 | 1990-04-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-04-28 | 1993-10-28 | 1994-04-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-04-28 | 1997-10-28 | 1998-04-29 | $7700.00 | Window Closed / Lapsed |