Electron beam exposure system

Claim 2

stepwise deflection..Iaddend. 3. An electron beam exposure system according to claim 2 in which said signal generating means incorporates a

Claim 3

laser interferometer. 4. An electron beam exposure system comprising a source for emitting an electron beam; means comprising two aperture plates having multi-sided openings and an electron beam lens and a first deflecting means located between said two aperture plates, said electron beam lens serving to focus the image of the first aperture plate on the second aperture plate, said first deflecting means serving to vary the shape and size of said electron beam cross-section through the combined interceptive action of said two aperture plates; an electron optical system for converging and projecting the electron beam thus shaped onto a workpiece .Iadd.to expose a two-dimensional pattern element thereon.Iaddend.; blanking means for interrupting the electron beam projected on the workpiece; a driving means for shifting the workpiece continuously in a selected direction; a second deflecting means for .Iadd.stepwise .Iaddend.deflecting the electron beam in a narrow band range on the workpiece more or less perpendicular to said selected direction; and means for generating a signal .Iadd.comprising a pulse .Iaddend.each time the workpiece shifts by a certain constant amount in the selected direction, .[.said signal being used a synchronizing signal for controlling said blanking means.]. .Iadd.a dividing circuit for frequency dividing the said pulse signal, the output of the dividing circuit being used to directly and periodically initiate the instances

Claim 4

when the blanking means interrupts the electron beam..Iaddend. 5. An electron beam exposure system comprising a source for emitting an electron beam; means comprising two aperture plates having multi-sided openings and an electron beam lens and a first deflecting means located between said two aperture plates, said electron beam lens serving to focus the image of the first aperature plate on the second aperature plate, said first deflecting means serving to vary the shape and size of said electron beam cross-section through the combined interceptive action of said two aperture plates; an electron optical system for converging and projecting the electron beam thus shaped onto a workpiece .Iadd.to expose a two-dimensional pattern element thereon.Iaddend.; a driving means for shifting the workpiece continuously in a selected Y-direction; a second deflecting means for large step shifting the electron beam in the X-direction perpendicular to said Y-direction; a third deflecting means for small scale .Iadd.stepwise .Iaddend.varying of the electron beam over an area on the workpiece generally defined by the drive means and second deflecting means; and a means for generating a signal .Iadd.comprising a pulse .Iaddend.each time the workpiece shifts by a certain constant amount in the selected Y-direction, .[.said signal being used as a synchronizing signal for controlling said second and/or third deflecting means.]. .Iadd.a dividing circuit for frequency dividing the said signal, the output of the dividing circuit being used to directly and periodically initiate the instances when the second and/or third deflecting means

Claim 5

produce stepwise deflection..Iaddend. 6. An electron beam exposure system according to claim 5 in which said signal generating means incorporates a laser interferometer and a circuit for dividing the output pulses of said interferometer. .[.7. An electron beam exposure system comprising a source for emitting an electron beam; means comprising two aperture plates having multi-sided openings and an electron beam lens and a first deflecting means located between said two aperture plates, said electron beam lens serving to focus the image of the first aperture plate on the second aperture plate, said first deflecting means serving to vary the shape and size of said electron beam cross-section through the combined interceptive action of said two aperture plates; an electron optical system for converging and projecting the electron beam thus shaped onto a workpiece; a driving means for shifting the workpiece continuously in a selected direction; a second deflecting means for deflecting the electron beam in a narrow band range on the workpiece more or less perpendicular to said selected direction; means for generating a signal each time the workpiece shifts by some constant amount in the selected direction, and a third deflecting means for tracking the electron beam by some constant amount in said selected direction in response to said signal..]. .[.8. An electron beam exposure system according to claim 7 in which the deflecting signal of said third deflecting means is applied to the same deflecting plates or deflecting coils forming part of said second deflecting means for deflecting the electron beam in the narrow band on the workpiece via

Claim 6

an adding circuit applied with other deflecting signals..]. 9. An electron beam exposure system comprising a source for emitting an electron beam; means comprising two aperture plates having multi-sided openings and an electron beam lens and a first deflecting means located between said two plates, said electron beam lens serving to focus the image of the first aperture plate on the second aperture plate, said first deflecting means serving to vary the shape and size of said electron beam cross-section through the combined interceptive action of said two aperture plates; an electron optical system for converging and projecting the electron beam thus shaped onto a workpiece .Iadd.to expose a two-dimensional pattern element thereon.Iaddend.; a driving means for shifting the workpiece continuously in a Y-direction; a second deflecting means for large step shifting the electron beam in the X-direction perpendicular to said Y-direction; a third deflecting means for small scale .Iadd.stepwise .Iaddend.varying of the electron beam over an area on the workpiece generally defined by the drive means and second deflecting means; blanking means for interrupting the electron beam projected on the workpiece; a fourth deflecting means for tracking the electron beam by some constant amount in said Y-direction, and means for generating a signal .Iadd.comprising a pulse .Iaddend.each time the workpiece shifts by a certain constant amount in the Y-direction, said signal being used as a synchronizing signal for controlling the .[.first, second, third and.]. fourth deflecting means .[.and the blanking means.]. .Iadd.a dividing circuit for frequency dividing the said pulse signal, the output of the dividing circuit being used to directly and periodically initiate the stepwise deflection of the second, third and fourth deflecting means, and to directly and periodically initiate the instances of electron beam interruption by the blanking means..Iaddend.