Patent US4577945A successfully refreshed from Google Patents.
US4577945A
Expired / Lapsed
US
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Pattern transfer device and method
Assignee: Toshiba Corp
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Filing: 1984-02-10
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Granted: 1986-03-25
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Expires: 2004-02-10
Abstract
Abstract For the manufacture of photomasks or in order to draw a pattern on a semiconductor wafer, a step-and-repeat procedure is used. In a step-and-repeat pattern transfer device, the length of a lens barrel 1 is varied so that the reduction of a pattern original 5 is finely adjusted so that the size errors of the pattern may be corrected. The fine adjustment of the reduction is made to such an extent that the expansion of the semiconductor wafer or the like may be compensated for. In order to vary the length of the lens barrel 1, an adjustment means such as a piezoelectric element or electric motor is incorporated in the lens barrel.
Inventors
- 👤 Kuniya Shimazaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 22:22
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
137 words
A pattern transfer device comprising: a main table upon which is mounted an object; a lens barrel having a first section and a second section, one end of said first section being adapted to receive an original and a distal end of said second section being adapted to receive a high resolving power lens for focusing an image of said original on said object; control means for determining a dimensional variation in said object and for producing a control signal based on said dimensional variation as detected; and a reduction ratio adjustment means, coupled between said first and second sections and responsive to said control means, for varying the length of said lens barrel in response to said control signal to vary the size of the image focused on said object through said high resolving power lens.
Claim 2
Dependent Claim
137 words
A pattern transfer device comprising: a main table upon which is mounted an object; a lens barrel having a first section and a second section, one end of said first section being adapted to receive an original and a distal end of said second section being adapted to receive a high resolving power lens for focusing an image of said original on said object; control means for determining a dimensional variation in said object and for producing a control signal based on said dimensional variation as detected; and a reduction ratio adjustment means, coupled between said first and second sections and responsive to said control means, for varying the length of said lens barrel in response to said control signal to vary the size of the image focused on said object through said high resolving power lens.
Claim 3
Dependent Claim
24 words
A pattern transfer device as set forth in claim 1, wherein said reduction ratio adjustment means deforms itself in response to said control signal.
Claim 4
Dependent Claim
20 words
A pattern transfer device as set forth in claim 1, wherein said reduction ratio adjustment means comprises a piezoelectric element.
Claim 5
Dependent Claim
162 words
A pattern transfer device comprising: a main table upon which is mounted an object; a lens barrel having a first section and a second section, one end of said first section being adapted to receive an original, and a distal end of said second section having a high resolving power lens for focusing a reduced image of said original on said object; a pattern position detection means for detecting the position of the pattern transferred on said object and obtaining a step position error; control means responsive to said pattern position detection means for producing a control signal based on said step position error; and a reduction ratio adjustment means coupled between said first and second sections and responsive to said control means, for performing fine adjustment of the length of said lens barrel in response to said control signal, and so for changing the size of the image of said original focused through said high resolving power lens on said object.
Claim 6
Dependent Claim
162 words
A pattern transfer device comprising: a main table upon which is mounted an object; a lens barrel having a first section and a second section, one end of said first section being adapted to receive an original, and a distal end of said second section having a high resolving power lens for focusing a reduced image of said original on said object; a pattern position detection means for detecting the position of the pattern transferred on said object and obtaining a step position error; control means responsive to said pattern position detection means for producing a control signal based on said step position error; and a reduction ratio adjustment means coupled between said first and second sections and responsive to said control means, for performing fine adjustment of the length of said lens barrel in response to said control signal, and so for changing the size of the image of said original focused through said high resolving power lens on said object.
Claim 7
Dependent Claim
24 words
A pattern transfer device as set forth in claim 5, wherein said reduction ratio adjustment means deforms itself in response to said control signal.
Claim 8
Dependent Claim
20 words
A pattern transfer device as set forth in claim 5, wherein said reduction ratio adjustment means comprises a piezoelectric element.
Claim 9
Dependent Claim
65 words
A pattern transfer method in which a pattern is reduced and transferred to an object in a step-and-repeat procedure, comprising the steps of: (a) obtaining a dimensional variation in the size of said object; and (b) performing fine adjustment of reduction of said pattern based on said dimensional variation obtained in said step (a), thereby adjusting the size of each pattern transferred on said object.
Claim 10
Dependent Claim
65 words
A pattern transfer method in which a pattern is reduced and transferred to an object in a step-and-repeat procedure, comprising the steps of: (a) obtaining a dimensional variation in the size of said object; and (b) performing fine adjustment of reduction of said pattern based on said dimensional variation obtained in said step (a), thereby adjusting the size of each pattern transferred on said object.
References Cited (Backward Citations)
US3744902A
Cited
US4155692A
Cited
US4140392A
Cited
US4190325A
Cited
US4383757A
Cited
US4414749A
Cited
US4420233A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-03-24 | 1989-09-23 | 1990-03-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-03-24 | 1993-09-23 | 1994-03-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-03-24 | 1997-09-23 | 1998-03-25 | $7700.00 | Window Closed / Lapsed |