US4577215A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dual word line, electrically alterable, nonvolatile floating gate memory device
Assignee: RCA Corp
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Filing: 1983-02-18
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Granted: 1986-03-18
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Expires: 2003-02-18
Abstract
Abstract A structure having dual word line, electrically alterable, nonvolatile floating gate memory cell is described wherein the word-line-to-floating gate capacitance is made significantly greater than either the program-line-to-floating gate capacitance or the floating-gate-to-substrate capacitance. This allows the program line and word line to be counter driven to minimize coupling to the floating gate during the write/erase cycle and to maximize coupling during the read cycle. The net result is higher write/erase/read efficiencies than heretofore possible.
Inventors
- 👤 Roger G. Stewart
- 👤 Alfred C. Ipri
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 02:39
CPC Classifications
G; G11; G11C; G11C16/00; G11C16/02; G11C16/04; G11C16/0408; G11C16/0425; H; H10; H10D; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/683
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
225 words
A non-volatile electrically erasable, programmable floating gate memory device having a body of semiconductor material of a first conductivity type with extended, parallel source and drain regions of a second conductivity type embedded in the body of semiconductor material at a surface thereof and spaced one from the other to define a channel region, a conductive floating gate member oriented parallel to said surface and insulated from the substrate and having a portion thereof disposed over the channel region, a conductive program line having a portion thereof disposed over and insulated from the floating gate member and a conductive word line disposed over and insulated from the conductive program line, comprising: a portion of the floating gate being oriented in a direction parallel to the extended source and drain regions and aligned with the channel region; the program line being disposed under and parallel to the word line over the channel region with both lines perpendicularly disposed with respect to the orientation of the floating gate; the ends of the floating gate being aligned with the width of the word line; and the capacitance values of the floating gate, the word and program lines and the substrate having the relationship: C.sub.2 <C.sub.3 >C.sub.1 where: C 1 =the floating gate-to-substrate capacitance, C 2 =the program line-to-floating gate capacitance; and C 3 =the word line-to-floating gate capacitance.
Claim 2
Dependent Claim
225 words
A non-volatile electrically erasable, programmable floating gate memory device having a body of semiconductor material of a first conductivity type with extended, parallel source and drain regions of a second conductivity type embedded in the body of semiconductor material at a surface thereof and spaced one from the other to define a channel region, a conductive floating gate member oriented parallel to said surface and insulated from the substrate and having a portion thereof disposed over the channel region, a conductive program line having a portion thereof disposed over and insulated from the floating gate member and a conductive word line disposed over and insulated from the conductive program line, comprising: a portion of the floating gate being oriented in a direction parallel to the extended source and drain regions and aligned with the channel region; the program line being disposed under and parallel to the word line over the channel region with both lines perpendicularly disposed with respect to the orientation of the floating gate; the ends of the floating gate being aligned with the width of the word line; and the capacitance values of the floating gate, the word and program lines and the substrate having the relationship: C.sub.2 <C.sub.3 >C.sub.1 where: C 1 =the floating gate-to-substrate capacitance, C 2 =the program line-to-floating gate capacitance; and C 3 =the word line-to-floating gate capacitance.
Claim 3
Dependent Claim
33 words
The memory device of claim 1, wherein: the conductive floating gate and the program and word lines are selected from the group consisting of doped polycrystalline silicon, refractory metals and refractory metal silicides.
Claim 4
Dependent Claim
74 words
The floating gate memory device of claim 1, wherein: the floating gate is insulated from the channel region by a layer of silicon oxide of the order of about 500 angstroms; the program line is insulated from the floating gate by a layer of silicon oxide of the order of about 200 angstroms; and the word line is insulated from the program line by a layer of silicon the order of about 500 angstroms.
Claim 5
Dependent Claim
31 words
The floating gate memory device of claim 3, wherein: the substrate is doped with P type conductivity modifiers; and the source and drain regions are doped with N type conductivity modifiers.
Claim 6
Dependent Claim
25 words
The floating gate memory device of claim 4, wherein: the floating gate is "hour-glass" shaped with the narrow portion thereof aligned with the channel region.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-03-17 | 1989-09-16 | 1990-03-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-03-17 | 1993-09-16 | 1994-03-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-03-17 | 1997-09-16 | 1998-03-18 | $7700.00 | Window Closed / Lapsed |