US4574179A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Ion beam machining device
Assignee: The University of Tokyo
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Filing: 1984-02-29
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Granted: 1986-03-04
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Expires: 2004-02-29
Abstract
Abstract The disclosed ion beam machining device has a plasma-generating chamber, a machining chamber, and an ion-extracting grid disposed between the two chambers, which grid has an insulator layer facing the plasma-generating chamber and a conductor layer facing the machining chamber.
Inventors
- 👤 Takahisa Masuzawa
- 👤 Ichiro Tsuchiya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 04:24
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/305; H01J37/3053; H01J37/3056; H01J37/02; H01J37/04; H01J37/08
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
118 words
An ion beam machining device, comprising: a plasma-generating chamber for producing plasma ions, an ion-extracting grid for extracting the produced ions as ion beams, a machining chamber for irradiating the extracted ion beams onto a workpiece, said ion-extracting grid having an electrical insulator layer facing the plasma-generating chamber and an electrical conductor layer, and a plurality of holes extending through both said insulator layer and said conductor layer, and means for connecting said conductor layer to a workpiece through a suppressor power source to generate an electric potential which is negative relative to potential of said plasma, wherein said insulator layer of said grid is thicker than said conductive layer thereof to focus said ion beam for machining.
Claim 2
Dependent Claim
118 words
An ion beam machining device, comprising: a plasma-generating chamber for producing plasma ions, an ion-extracting grid for extracting the produced ions as ion beams, a machining chamber for irradiating the extracted ion beams onto a workpiece, said ion-extracting grid having an electrical insulator layer facing the plasma-generating chamber and an electrical conductor layer, and a plurality of holes extending through both said insulator layer and said conductor layer, and means for connecting said conductor layer to a workpiece through a suppressor power source to generate an electric potential which is negative relative to potential of said plasma, wherein said insulator layer of said grid is thicker than said conductive layer thereof to focus said ion beam for machining.
Claim 3
Dependent Claim
33 words
An ion beam machining device as set forth in claim 1, wherein said insulator layer of said grid has a thickness which is more than 20% of the diameter of said hole thereof.
Claim 4
Dependent Claim
32 words
An ion beam machining device as set forth in claim 1, wherein said insulator layer is an alumina layer and said conductor layer is a nickel film plated on said alumina layer.
Claim 5
Dependent Claim
34 words
An ion beam machining device as set forth in claim 1, wherein said conductor layer is a stainless steel plate and said insulator layer is a silica film vacuum deposited on said conductor layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-03-03 | 1989-09-02 | 1990-03-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-03-03 | 1993-09-02 | 1994-03-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-03-03 | 1997-09-02 | 1998-03-04 | $7700.00 | Window Closed / Lapsed |