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US4569721A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for the production of semiconductor lasers

Assignee: Sharp Corp
•
Filing: 1984-08-27
•
Granted: 1986-02-11
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Expires: 2004-08-27
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Abstract

Abstract A method for the production of semiconductor lasers comprising: (a) forming a substrate having a striped portion on its face, said striped portion being formed into a mesa, (b) forming a current blocking layer on each of said striped portion and the remaining face of said substrate, (c) eliminating said current blocking layer only on said striped portion thereby allowing electric current to flow through the substrate and form said striped portion into a terrace or a groove, as a whole, and (d) successively laminating crystal growth layers for laser operation on the whole face of the substrate in strict conformity with said terrace or groove on the face of said substrate, thereby attaining stabilization of the transverse mode of laser oscillation.

Inventors

  • 👤 Toshiro Hayakawa
  • 👤 Nobuyuki Miyauchi
  • 👤 Seiki Yano
  • 👤 Takahiro Suyama

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 12:45
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/30; H01S5/34; B; B82; B82Y; B82Y20/00; H01S5/20; H01S5/22; H01S5/223; H01S5/2232; H01S5/2234; H01S5/2235

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 113 words
A method for the production of semiconductor lasers comprising: (a) forming a substrate having a striped portion on its face, said striped portion being formed into a mesa, (b) forming a current blocking layer on each of said striped portion and the remaining face of said substrate, (c) eliminating said current blocking layer only on said striped portion thereby allowing electric current to flow through the substrate and form said striped portion into a terrace or a groove, as a whole, and (d) successively laminating crystal growth semiconductor layers for laser operation on the whole face of the substrate in strict conformity with said terrace or groove on the face of said substrate.
Claim 2
Independent Claim 113 words
A method for the production of semiconductor lasers comprising: (a) forming a substrate having a striped portion on its face, said striped portion being formed into a mesa, (b) forming a current blocking layer on each of said striped portion and the remaining face of said substrate, (c) eliminating said current blocking layer only on said striped portion thereby allowing electric current to flow through the substrate and form said striped portion into a terrace or a groove, as a whole, and (d) successively laminating crystal growth semiconductor layers for laser operation on the whole face of the substrate in strict conformity with said terrace or groove on the face of said substrate.
Claim 3
Dependent Claim 24 words
A method according to claim 1, wherein said semiconductor layers consist of one selected from the GaAlAs, InGaP, InGaAlP, InAlAs, InGaAs and InGaAsP systems.
Claim 4
Dependent Claim 17 words
A method according to claim 1, wherein said semiconductor layers are grown by molecular beam epitaxy deposition.
Claim 5
Dependent Claim 17 words
A method according to claim 2, wherein said semiconductor layers are grown by molecular beam epitaxy deposition.
Claim 6
Dependent Claim 17 words
A method according to claim 1, wherein said semiconductor layers are grown by metal-organic chemical vapor deposition.
Claim 7
Dependent Claim 17 words
A method according to claim 2, wherein said semiconductor layers are grown by metal-organic chemical vapor deposition.

References Cited (Backward Citations)

US4425650A Cited
US4404730A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-02-10 1989-08-12 1990-02-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-02-10 1993-08-12 1994-02-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-02-10 1997-08-12 1998-02-11 $7700.00 Window Closed / Lapsed

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