Patent US4559901A successfully refreshed from Google Patents.
US4559901A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Ion beam deposition apparatus
Assignee: Futaba Corp
•
Filing: 1985-01-30
•
Granted: 1985-12-24
•
Expires: 2005-01-30
Abstract
Abstract An ion beam deposition apparatus capable of uniformly distributing an ionized vaporized material on a desired area of a substrate is disclosed. The apparatus includes an accelerating electrode and a deflecting electrode each arranged between an ionization region and a substrate.
Inventors
- 👤 Kiyoshi Morimoto
- 👤 Toshinori Takagi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 21:58
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/221; H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3178
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
120 words
An ion beam deposition apparatus comprising: an ionization region for ionizing at least a part of a vaporized material and imparting kinetic energy to said ionized vaporized material to transport said ionized vaporized material together with non-ionized vaporized material to a substrate, to thereby deposit said vaporized material on said substrate; an accelerating electrode arranged between said ionization region and said substrate for imparting necessary kinetic energy to said ionized vaporized material when said ionized vaporized material reaches said substrate; and means for providing said ionized vaporized material of a uniform concentration over a desired area of said substrate or uniformly distributing said ionized vaporized material over said area, said means being arranged between said ionization region and said substrate.
Claim 2
Dependent Claim
120 words
An ion beam deposition apparatus comprising: an ionization region for ionizing at least a part of a vaporized material and imparting kinetic energy to said ionized vaporized material to transport said ionized vaporized material together with non-ionized vaporized material to a substrate, to thereby deposit said vaporized material on said substrate; an accelerating electrode arranged between said ionization region and said substrate for imparting necessary kinetic energy to said ionized vaporized material when said ionized vaporized material reaches said substrate; and means for providing said ionized vaporized material of a uniform concentration over a desired area of said substrate or uniformly distributing said ionized vaporized material over said area, said means being arranged between said ionization region and said substrate.
Claim 3
Dependent Claim
51 words
The ion beam deposition apparatus as defined in claim 1, wherein said means for providing said ionized vaporized material of a uniform concentration over a desired area of said substrate or uniformly distributing said ionized vaporized material over said area comprises an electrode for accelerating and/or decelerating said ionized vaporized material.
Claim 4
Dependent Claim
31 words
The ion beam deposition apparatus as defined in claim 2, wherein said electrode for accelerating and/or decelerating said ionized vaporized material is arranged between said ionization region and said accelerating electrode.
Claim 5
Dependent Claim
50 words
The ion beam deposition apparatus as defined in claim 1, wherein said means for providing said ionized vaporized material of a uniform concentration over a desired area of said substrate or uniformly distributing said ionized vaporized material over said area comprises a deflecting electrode for deflecting said ionized vaporized material.
Claim 6
Dependent Claim
22 words
The ion beam deposition apparatus as defined in claim 4, said deflecting electrode is arranged between said accelerating electrode and said substrate.
Claim 7
Dependent Claim
24 words
The ion beam deposition apparatus as defined in claim 4, wherein said deflecting electrode is arranged between said ionization region and said accelerating electrode.
Claim 8
Dependent Claim
42 words
The ion beam deposition apparatus as defined in claim 4, wherein said deflecting electrode comprises a pair of X-axis deflecting electrodes arranged to be opposite to each other and a pair of Y-axis deflecting electrodes arranged to be opposite to each other.
Claim 9
Dependent Claim
45 words
The ion beam deposition apparatus as defined in claim 7, wherein said X-axis deflecting electrodes and Y-axis deflecting electrodes are applied thereto voltages of a sine wave of which the phases are different by 90° from each other and the crest values are gradually increased.
References Cited (Backward Citations)
US4451499A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-12-23 | 1989-06-24 | 1989-12-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-12-23 | 1993-06-24 | 1993-12-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-12-23 | 1997-06-24 | 1997-12-24 | $7700.00 | Window Closed / Lapsed |