Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
167 words
A method for providing a pattern-wise photoresist layer on a substrate plate which comprises the steps of: (a) forming a first layer of a first positive photosensitive composition containing a halation inhibitor on at least one surface of a substrate plate; (b) then bonding onto the first layer a preformed dry film of a second positive photosensitive composition; (c) exposing the film of the second composition with pattern-wise light while simultaneously exposing said first layer to said pattern-wise light, through the second layer; and (d) dissolving the thus pattern-wise exposed photosensitive film and first layer with a developer liquid capable of dissolving the exposed areas of the first and the second photosensitive compositions, wherein the halation inhibitor in the first photosensitive composition is an organic dye or pigment compatible with the photosensitive composition and absorbing light in the wavelength range from 280 to 430 nm, and wherein the amount of halation inhibitor in the first photosensitive composition is in the range from 0.001 to 10% by weight.
Claim 2
Independent Claim
167 words
A method for providing a pattern-wise photoresist layer on a substrate plate which comprises the steps of: (a) forming a first layer of a first positive photosensitive composition containing a halation inhibitor on at least one surface of a substrate plate; (b) then bonding onto the first layer a preformed dry film of a second positive photosensitive composition; (c) exposing the film of the second composition with pattern-wise light while simultaneously exposing said first layer to said pattern-wise light, through the second layer; and (d) dissolving the thus pattern-wise exposed photosensitive film and first layer with a developer liquid capable of dissolving the exposed areas of the first and the second photosensitive compositions, wherein the halation inhibitor in the first photosensitive composition is an organic dye or pigment compatible with the photosensitive composition and absorbing light in the wavelength range from 280 to 430 nm, and wherein the amount of halation inhibitor in the first photosensitive composition is in the range from 0.001 to 10% by weight.
Claim 3
Dependent Claim
36 words
The method of claim 1 wherein said first layer comprises a protective layer for protecting the surface of the substrate plate from mechanical damage and contamination prior to bonding the dry film onto the first layer.
Claim 4
Dependent Claim
22 words
The method as claimed in claim 1 wherein the first layer has a thickness in the range from 0.5 to 20 μm.
Claim 5
Dependent Claim
28 words
The method as claimed in claim 1 wherein the amount of halation inhibitor in the first photosensitive composition is in the range of 0.05 to 2% by weight.
Claim 6
Dependent Claim
30 words
The method of claim 1 wherein said step (a) of forming a first layer comprises coating the plate with the first photosensitive material in liquid form and drying the coating.
Claim 7
Independent Claim
167 words
A method for providing a pattern-wise photoresist layer on a substrate plate which comprises the steps of: (a) forming a first layer of a first negative photosensitive composition containing a halation inhibitor on at least one surface of a substrate plate; (b) then bonding onto the first layer a preformed dry film of a second negative photosensitive composition; (c) exposing the film of the second composition with pattern-wise light while simultaneously exposing said first layer to said pattern-wise light, through the second layer; and (d) dissolving the thus pattern-wise unexposed photosensitive film and first layer with a developer liquid capable of dissolving the unexposed areas of the first and the second photosensitive compositions, wherein the halation inhibitor in the first photosensitive composition is an organic dye or pigment compatible with the photosensitive composition and absorbing light in the wavelength range from 280 to 430 nm, and wherein the amount of halation inhibitor in the first photosensitive composition is in the range from 0.001 to 10% by weight.
Claim 8
Independent Claim
167 words
A method for providing a pattern-wise photoresist layer on a substrate plate which comprises the steps of: (a) forming a first layer of a first negative photosensitive composition containing a halation inhibitor on at least one surface of a substrate plate; (b) then bonding onto the first layer a preformed dry film of a second negative photosensitive composition; (c) exposing the film of the second composition with pattern-wise light while simultaneously exposing said first layer to said pattern-wise light, through the second layer; and (d) dissolving the thus pattern-wise unexposed photosensitive film and first layer with a developer liquid capable of dissolving the unexposed areas of the first and the second photosensitive compositions, wherein the halation inhibitor in the first photosensitive composition is an organic dye or pigment compatible with the photosensitive composition and absorbing light in the wavelength range from 280 to 430 nm, and wherein the amount of halation inhibitor in the first photosensitive composition is in the range from 0.001 to 10% by weight.
Claim 9
Dependent Claim
36 words
The method of claim 6 wherein said first layer comprises a protective layer for protecting the surface of the substrate plate from mechanical damage and contamination prior to bonding the dry film onto the first layer.
Claim 10
Dependent Claim
22 words
The method as claimed in claim 6 wherein the first layer has a thickness in the range from 0.5 to 20 μm.
Claim 11
Dependent Claim
28 words
The method as claimed in claim 6 wherein the amount of halation inhibitor in the first photosensitive composition is in the range of 0.05 to 2% by weight.
Claim 12
Dependent Claim
30 words
The method of claim 6 wherein said step (a) of forming a first layer comprises coating the plate with the first photosensitive material in liquid form and drying the coating.