US3982943A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask
Assignee: International Business Machines Corp
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Filing: 1974-03-05
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Granted: 1976-09-28
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Expires: 1994-03-05
Abstract
Abstract A method for use in forming thin film patterns in the fabrication of integrated circuits. The method involves depositing a bottom layer of positive photoresist material on a substrate, and forming over the bottom layer, a discrete light-transparent top layer of positive photoresist material which is less solubilized in developer after exposure to light than is the material in the bottom layer. The top and bottom layers are preferably separated by an intermediate layer of a light-transparent polymeric material which is immiscible in the bottom layer and unaffected by the subsequently applied top layer. The composite structure is exposed to a selected pattern of light, e.g., through a mask, and developer for the positive photoresist material is applied to the top and bottom layers. In the case where an intermediate layer is used, the top layer is developed first. Then, the intermediate layer is removed where exposed in the apertures through the top layer, preferably by ashing, after which, the bottom layer is subjected to the developer. In the resulting structure, the bottom layer has an aperture pattern coincident with and laterally wider than that of the top layer. The thin films are then deposited onto a substrate through the coincident aperture patterns with the photoresist layer serving as a deposition mask.
Inventors
- 👤 Bai C. Feng
- 👤 Richard H. Flachbart
- 👤 Leonard J. Fried
- 👤 Harold A. Levine
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 07:50
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/02; H05K3/04; H05K3/046; H05K3/048; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; H10; H10P; H10P95/00; H10W; H10W74/00; H10W74/40; H10W74/47
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
133 words
A method of depositing patterned thin films on an inorganic substrate comprising: forming on said substrate, a bottom layer of positive photoresist material, forming over said bottom layer, a discrete light-transparent top layer of positive photoresist material which is less solubilized in developer by exposure to light than is the material in said bottom layer, simultaneously exposing said layers to the same selected pattern of light, applying developer for said photoresist materials to said top and bottom layers to thereby form an aperture pattern through said top layer corresponding to said light pattern and a corresponding aperture pattern through said bottom layer coincident with and laterally wider than said top layer apertures, and depositing said thin films onto said substrate through said coincident aperture patterns using said photoresist layers as a deposition mask.
Claim 2
Independent Claim
133 words
A method of depositing patterned thin films on an inorganic substrate comprising: forming on said substrate, a bottom layer of positive photoresist material, forming over said bottom layer, a discrete light-transparent top layer of positive photoresist material which is less solubilized in developer by exposure to light than is the material in said bottom layer, simultaneously exposing said layers to the same selected pattern of light, applying developer for said photoresist materials to said top and bottom layers to thereby form an aperture pattern through said top layer corresponding to said light pattern and a corresponding aperture pattern through said bottom layer coincident with and laterally wider than said top layer apertures, and depositing said thin films onto said substrate through said coincident aperture patterns using said photoresist layers as a deposition mask.
Claim 3
Dependent Claim
25 words
The method of claim 1 wherein said developer is applied sequentially to said top and bottom layers to form said aperture patterns in separate steps.
Claim 4
Dependent Claim
74 words
The method of claim 2, including the further steps of forming on said bottom layer prior to formation of said top layer, an intermediate layer of a light-transparent polymeric material which is immiscible with said bottom layer and unaffected by the subsequently applied top layer, and removing a portion of said polymeric layer to form an aperture pattern therethrough corresponding to the top layer pattern prior to applying said developer to said bottom layer.
Claim 5
Dependent Claim
41 words
The method claim 3 wherein said top and bottom layers are several times the thickness of said intermediate polymeric layer and after developing the top layer said intermediate polymeric layer exposed in said aperture pattern is removed by an ashing step.
Claim 6
Dependent Claim
15 words
The method of claim 4 wherein said intermediate polymeric layer comprises a negative photoresist material.
Claim 7
Dependent Claim
12 words
The method of claim 3 wherein said substrate is a semiconductor substrate.
Claim 8
Dependent Claim
12 words
The method of claim 3 wherein said substrate is a metallic oxide.
Claim 9
Dependent Claim
11 words
The method of claim 7 wherein said substrate is silicon dioxide.
Claim 10
Dependent Claim
23 words
The method of claim 1 including the further step of removing the remainder of photoresist layers after the deposition of the thin films.
Claim 11
Dependent Claim
23 words
The method of claim 4 including the further step of removing the remainder of photoresist layers after the desposition of the thin films.
Claim 12
Dependent Claim
11 words
The method of claim 3 wherein said thin films are metallic.
Claim 13
Dependent Claim
71 words
A structure used in photolithographic fabrication of integrated circuits comprising an inorganic substrate covered with a composite comprising a bottom layer of positive photoresist, a top layer of light-transparent positive photoresist which is less solubilized in developer by exposure to light than is the material in said bottom layer, and a layer between said bottom and top layers of a light-transparent polymeric material which is not solubilized upon exposure to light.
Claim 14
Dependent Claim
71 words
A structure used in photolithographic fabrication of integrated circuits comprising an inorganic substrate covered with a composite comprising a bottom layer of positive photoresist, a top layer of light-transparent positive photoresist which is less solubilized in developer by exposure to light than is the material in said bottom layer, and a layer between said bottom and top layers of a light-transparent polymeric material which is not solubilized upon exposure to light.
Claim 15
Dependent Claim
14 words
The structure of claim 12 wherein said polymeric layer comprises a negative photoresist material.
Claim 16
Dependent Claim
12 words
The structure of claim 12 wherein said substrate is a semiconductor substrate.
Claim 17
Dependent Claim
12 words
The structure of claim 12 wherein said substrate is a metallic oxide.
Claim 18
Dependent Claim
11 words
The structure of claim 15 wherein said substrate is silicon dioxide.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-09-28 | 1980-03-29 | 1980-09-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-09-28 | 1984-03-29 | 1984-09-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-09-28 | 1988-03-29 | 1988-09-28 | $7700.00 | Window Closed / Lapsed |