← Back to Patent Explorer
US4528061A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for manufacturing boron-doped gallium arsenide single crystal

Assignee: Sumitomo Electric Industries Ltd
•
Filing: 1983-04-15
•
Granted: 1985-07-09
•
Expires: 2003-04-15
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A process for manufacturing boron-doped GaAs single crystals which comprises preparing a mixture of boron, gallium and arsenic covered by a liquid B 2 O 3 encapsulant, melting the mixture, pulling up boron-doped GaAs crystals from the mixture melts in accordance with the LEC method, crushing those crystals into small pieces after removing the seed end therefrom, remelting those pieces in the presence of B 2 O 3 , and pulling up single crystals from the mixture melts in accordance with the LEC method.

Inventors

  • 👤 Shintaro Miyazawa
  • 👤 Yasushi Nanishi
  • 👤 Kohji Tada
  • 👤 Akihisa Kawasaki
  • 👤 Toshihiro Kotani

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 19:55
CPC Classifications
C; C30; C30B; C30B27/00; C30B27/02; C30B29/00; C30B29/10; C30B29/40; C30B29/42

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 101 words
A process for manufacturing a boron-doped GaAs single crystal containing a large quantity of boron, comprising: preparing a mixture of boron, gallium and arsenic covered by a liquid B 2 O 3 encapsulant; melting the mixture; pulling up a boron-doped GaAs body from the melted mixture in accordance with the LEC (Liquid Encapsulated Czochralski) method in which a seed is employed; crushing the body into small pieces after removing the seed end therefrom; remelting the pieces in the presence of B 2 O 3 ; and pulling up a single crystal from the remelted pieces in accordance with the LEC method.
Claim 2
Dependent Claim 101 words
A process for manufacturing a boron-doped GaAs single crystal containing a large quantity of boron, comprising: preparing a mixture of boron, gallium and arsenic covered by a liquid B 2 O 3 encapsulant; melting the mixture; pulling up a boron-doped GaAs body from the melted mixture in accordance with the LEC (Liquid Encapsulated Czochralski) method in which a seed is employed; crushing the body into small pieces after removing the seed end therefrom; remelting the pieces in the presence of B 2 O 3 ; and pulling up a single crystal from the remelted pieces in accordance with the LEC method.
Claim 3
Dependent Claim 14 words
Process as set forth in claim 1, wherein the body is a polycrystalline body.
Claim 4
Dependent Claim 17 words
A process as set forth in claim 1, further including incorporating additional boron when remelting the pieces.
Claim 5
Dependent Claim 33 words
A process as set forth in claim 3, wherein the gallium and arsenic are of the 6-nine grade (99.9999%) in purity, and the B 2 O 3 is of the 5-nine grade (99.999%).
Claim 6
Dependent Claim 25 words
A process as set forth in claim 4, wherein the boron is in the form of shots having a diameter of 1 to 2 mm.
Claim 7
Dependent Claim 25 words
A process as set forth in claim 4, wherein the B 2 O 3 has a water content of less than 300 ppm by weight.
Claim 8
Dependent Claim 25 words
A process as set forth in claim 4, wherein the B 2 O 3 has a water content of higher than 600 ppm by weight.

References Cited (Backward Citations)

DE2133875A1 Cited
US4303464A Cited
US4200621A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-07-08 1989-01-07 1989-07-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-07-08 1993-01-07 1993-07-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-07-08 1997-01-07 1997-07-09 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag