US4520554A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making a multi-level metallization structure for semiconductor device
Assignee: RCA Corp
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Filing: 1984-11-30
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Granted: 1985-06-04
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Expires: 2004-11-30
Abstract
Abstract A semiconductor device having a multi-level metallization system wherein the first level is of aluminum containing up to 3 of percent silicon and the second level is either aluminum or aluminum containing silicon in an amount less than that contained in the first level. The two levels where they contact each other are sintered together with some of the silicon from the first level being diffused into the second level so that the second level has a region adjacent the junction between the two levels which has a higher content of silicon than the remaining portion of the second level. When making the device, the surface of the first level where it is to be joined with the second level is etched to remove some of the aluminum, but not the silicon, which roughens this surface. The second level is applied on this roughened surface and the device is heated to sinter the two levels together and diffuse the silicon into the second level.
Inventors
- 👤 Albert W. Fisher
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 22:19
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W20/40; H10W20/41; H10W20/44; H10W20/4403; H10W20/4405
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
131 words
A method of forming a multi-level metallization on a substrate comprising the steps of: forming a first metallization layer of aluminum containing up to 3 percent of silicon over a surface of a substrate, forming a layer of an insulating material over the first metallization layer, forming an opening through the insulating layer to the first metallization layer, forming a second metallization layer of aluminum containing silicon in an amount less than that contained in the first metallization layer over the insulating layer and in the opening to contact the first metallization layer, and heating the metallization layer to sinter the two layers together at their junction within the opening within the insulating layer and to diffuse some of the silicon from the first metallization layer into the second metallization layer.
Claim 2
Independent Claim
131 words
A method of forming a multi-level metallization on a substrate comprising the steps of: forming a first metallization layer of aluminum containing up to 3 percent of silicon over a surface of a substrate, forming a layer of an insulating material over the first metallization layer, forming an opening through the insulating layer to the first metallization layer, forming a second metallization layer of aluminum containing silicon in an amount less than that contained in the first metallization layer over the insulating layer and in the opening to contact the first metallization layer, and heating the metallization layer to sinter the two layers together at their junction within the opening within the insulating layer and to diffuse some of the silicon from the first metallization layer into the second metallization layer.
Claim 3
Dependent Claim
53 words
The method in accordance with claim 1 in which prior to forming the second metallization layer, the surface of the first metallization layer in the opening in the insulating layer is treated to remove some of the aluminum and expose some of the silicon particles at the surface of the first metallization layer.
Claim 4
Dependent Claim
27 words
The method in accordance with claim 2 in which the first metallization layer is treated by subjecting it to an etchant which removes aluminum, but not silicon.
Claim 5
Independent Claim
169 words
A method of forming a multi-level metallization on a substrate comprising the steps of: forming a first metallization layer of aluminum containing up to 3% of silicon over a surface of the substrate, forming a layer of an insulating material over the first metallization layer, forming an opening through the insulating layer to the first metallization layer, treating the surface of the first metallization layer in the opening in the insulating layer to remove some of the aluminum and expose some of the silicon particles at the surface of the first metallization layer, forming a second metallization layer of either aluminum or aluminum containing silicon in an amount less than that contained in the first metallization layer over the insulating layer and in the opening to contact the first metallization layer, and heating the metallization layer to sin the two layers together at their junction within the opening within the insulating layer and to diffuse some of the silicon from the first metallization layer into the second metallization layer.
Claim 6
Independent Claim
169 words
A method of forming a multi-level metallization on a substrate comprising the steps of: forming a first metallization layer of aluminum containing up to 3% of silicon over a surface of the substrate, forming a layer of an insulating material over the first metallization layer, forming an opening through the insulating layer to the first metallization layer, treating the surface of the first metallization layer in the opening in the insulating layer to remove some of the aluminum and expose some of the silicon particles at the surface of the first metallization layer, forming a second metallization layer of either aluminum or aluminum containing silicon in an amount less than that contained in the first metallization layer over the insulating layer and in the opening to contact the first metallization layer, and heating the metallization layer to sin the two layers together at their junction within the opening within the insulating layer and to diffuse some of the silicon from the first metallization layer into the second metallization layer.
Claim 7
Dependent Claim
27 words
The method in accordance with claim 4 in which the first metallization layer is treated by subjecting it to an etchant which removes aluminum, but not silicon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-03 | 1988-12-03 | 1989-06-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-03 | 1992-12-03 | 1993-06-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-03 | 1996-12-03 | 1997-06-04 | $7700.00 | Window Closed / Lapsed |