US4515671A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electrochemical treatment of copper for improving its bond strength
Assignee: Olin Corp
•
Filing: 1984-01-30
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Granted: 1985-05-07
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Expires: 2004-01-30
Abstract
Abstract A process and apparatus for treating a metal foil to enhance its ability to be bonded to a substrate comprise immersing the metal foil in an electrolytic cell having an electrolyte bath solution containing copper and applying a current having regularly recurring pulses and preferably flowing in only one direction to the cell. The current causes a dendritic layer of copper to be deposited on at least one surface of the metal foil at a first current density and bonded thereto at a second current density. The process and apparatus are particularly suited for treating copper foil.
Inventors
- 👤 Ned W. Polan
- 👤 Chung-Yao Chao
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 08:38
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/38; H05K3/382; H05K3/384; B; B32; B32B; B32B38/00; C; C25; C25D; C25D5/00; C25D5/18; C25D5/60; C25D5/605; B32B2309/00; B32B2309/02; B32B2310/00; B32B2310/021; B32B2311/00; B32B2311/12; B32B2457/00; B32B2457/08; H05K2201/00; H05K2201/03; H05K2201/0332; H05K2201/0335; H05K2201/0355; H05K2203/00; H05K2203/03; H05K2203/0307; H05K2203/07; H05K2203/0703; H05K2203/0723; Y; Y10; Y10S; Y10S204/00; Y10S204/09
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
222 words
An apparatus for treating metal foil for enhancing its ability to adhere to a substrate, said apparatus comprising: means for containing an electrolytic bath solution containing a concentration of metal; an anode and a cathode immersed in said solution; said cathode comprising said metal foil; means for providing a non-zero base cathodic current having a desired frequency and a desired waveform comprising recurring pulses with each said pulse comprising a first portion having a first current density for a first time period, a base portion having a second current density for a second time period, said first current density being greater than the limiting current density and substantially larger than said second current density, said second current density being less than the limiting current density, and said first time period being less than about 0.125 seconds; said current providing means comprising a source of direct current and a function generator for modifying the direct current signal from said source to produce said current with said desired waveform; and means for applying said current to said cathode and anode so that said foil is subjected to more than 10 of said pulses so that metal from said solution is deposited onto said foil as a fine dendritic plating having improved peel strength, improved resistance to wear and stress, and improved powder transfer characteristics.
Claim 2
Independent Claim
222 words
An apparatus for treating metal foil for enhancing its ability to adhere to a substrate, said apparatus comprising: means for containing an electrolytic bath solution containing a concentration of metal; an anode and a cathode immersed in said solution; said cathode comprising said metal foil; means for providing a non-zero base cathodic current having a desired frequency and a desired waveform comprising recurring pulses with each said pulse comprising a first portion having a first current density for a first time period, a base portion having a second current density for a second time period, said first current density being greater than the limiting current density and substantially larger than said second current density, said second current density being less than the limiting current density, and said first time period being less than about 0.125 seconds; said current providing means comprising a source of direct current and a function generator for modifying the direct current signal from said source to produce said current with said desired waveform; and means for applying said current to said cathode and anode so that said foil is subjected to more than 10 of said pulses so that metal from said solution is deposited onto said foil as a fine dendritic plating having improved peel strength, improved resistance to wear and stress, and improved powder transfer characteristics.
Claim 3
Dependent Claim
13 words
The apparatus of claim 1 wherein said source comprises a constant current source.
Claim 4
Dependent Claim
32 words
The apparatus of claim 1 wherein said source comprises a constant voltage source and said function generator generates a voltage having a desired voltage waveform and said current having said desired waveform.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-05-06 | 1988-11-05 | 1989-05-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-05-06 | 1992-11-05 | 1993-05-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-05-06 | 1996-11-05 | 1997-05-07 | $7700.00 | Window Closed / Lapsed |