Patent US4510229A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4510229A Expired / Lapsed US ⏱️ 0.0 years remaining

Lithographic photosensitive material

Assignee: Fujifilm Holdings Corp
•
Filing: 1984-03-19
•
Granted: 1985-04-09
•
Expires: 2004-03-19
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A lithographic photosensitive material which comprises a support having thereon at least one silver halide emulsion layer and that, contains as a lithographic development accelerating agent a compound represented by the following general formula (I) in its silver halide emulsion layer or another hydrophilic colloidal layer: ##STR1## wherein R 1 to R 5 may be the same or different, and they each represent hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR2## (wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring), --NH--CO--R 8 or --NHSO 2 --R 9 (wherein R 8 and R 9 each represents an alkyl group, an aryl group or an aralkyl group), or R 3 and R 4 , or R 4 and R 5 may combine with each other to form a benzene ring and that, it is necessary to said compound that at least one of substituents R 1 , R 3 and R 5 represents --NHSO 2 --R 9 , or the benzene ring formed by combining R 3 and R 4 , or by combining R 4 with R 5 is substituted with at least one --NHSO 2 --R 9 group.

Inventors

  • 👤 Yutaka Oka
  • 👤 Naomi Saeki
  • 👤 Yoshiharu Fuseya

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 17:26
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/005; G03C1/06; G03C1/08; G03C1/10; Y; Y10; Y10S; Y10S430/00; Y10S430/15

Claims Analysis

Total Claims: 21
Claim 1
Independent Claim 241 words
A lithographic photosensitive material to provide high contrast half-tone dot or line silver images as final images for use in the graphic arts comprising: a support base; a silver halide emulsion layer containing silver chlorobromide or silver chloroiodobromide, each containing up to 50 mol% silver bromide, and developed by a lithographic developer comprising a o- or p-dihydroxybenzene developing agent; and a compound represented by the formula by the general formula (1): ##STR13## wherein R 1 to R 5 may be the same or different, and each represents hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR14## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring, --NH--CO--R 8 or --NHSO 2 --R 9 wherein R 8 and R 9 each represents an alkyl group, an aryl group or an aralkyl group, or R 3 and R 4 , or R 4 and R 5 may combine with each other to form a benzene ring and that, it is necessary to said compound that one and only one of substituents R 1 , R 3 and R 5 represents --NHSO 2 --R 9 , or the benzene ring formed by combining R 3 with R 4 , or by combining R 4 with R 5 is substituted with at least one --NHSO 2 --R 9 group.
Claim 2
Dependent Claim 241 words
A lithographic photosensitive material to provide high contrast half-tone dot or line silver images as final images for use in the graphic arts comprising: a support base; a silver halide emulsion layer containing silver chlorobromide or silver chloroiodobromide, each containing up to 50 mol% silver bromide, and developed by a lithographic developer comprising a o- or p-dihydroxybenzene developing agent; and a compound represented by the formula by the general formula (1): ##STR13## wherein R 1 to R 5 may be the same or different, and each represents hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR14## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring, --NH--CO--R 8 or --NHSO 2 --R 9 wherein R 8 and R 9 each represents an alkyl group, an aryl group or an aralkyl group, or R 3 and R 4 , or R 4 and R 5 may combine with each other to form a benzene ring and that, it is necessary to said compound that one and only one of substituents R 1 , R 3 and R 5 represents --NHSO 2 --R 9 , or the benzene ring formed by combining R 3 with R 4 , or by combining R 4 with R 5 is substituted with at least one --NHSO 2 --R 9 group.
Claim 3
Dependent Claim 144 words
A lithographic photosensitive material as claimed in claim 1, wherein the compound represented by general formula (I) is a compound selected from the group consisting of compounds represented by the general formula (II): ##STR15## wherein R 1 , R 2 and R 3 may be the same or different, and they each represents hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR16## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other and form a 5- or 6-membered nitrogen-containing saturated hetero ring, --NH--CO--R 8 or --NHSO 2 --R 9 wherein R 8 and R 9 each represents an alkyl group or an aralkyl group, and that, at least one of these substituents must be --NHSO 2 --R 9 wherein R 9 represents an alkyl group or an aralkyl group.
Claim 4
Dependent Claim 83 words
A lithographic photosensitive material, as claimed in claim 1, wherein the compound represented by general formula (I) is a compound selected from the group of compounds represented by the general formula (III): ##STR17## wherein R 10 represents hydrogen, a halogen atom or a group ##STR18## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring and R 11 represents an aryl group.
Claim 5
Dependent Claim 56 words
A lithographic photosensitive material as claimed in claim 1, wherein the compound represented by general formula (I) is a compound which contains at least one --NHSO 2 --R 9 wherein R 9 represents an alkyl group or aralkyl group, one alkoxy group and one alkyl group simultaneously as substituents of R 1 to R 5 .
Claim 6
Dependent Claim 38 words
A lithographic photosensitive material, as claimed in claim 3, wherein the compound represented by the general formula (III) is present in an amount in the range of 1 mg to 1000 mg per 1 mol of silver halide.
Claim 7
Dependent Claim 38 words
A lithographic photosensitive material, as claimed in claim 5, wherein the compound represented by the general formula (III) is present in an amount in the range of 10 mg to 100 mg per 1 mol of silver halide.
Claim 8
Dependent Claim 25 words
A lithographic photosensitive material, as claimed in claim 3, wherein said R 11 aryl group is an unsubstituted or substituted phenyl group or naphthyl group.
Claim 9
Dependent Claim 40 words
A lithographic photosensitive material, as claimed in claim 7, wherein R 11 is a substituted phenyl group or naphthyl group wherein said substituent is at least one of an alkyl group, alkoxy group, halogen atom, nitro group or carboxyl group.
Claim 10
Dependent Claim 38 words
A lithographic photosensitive material, as claimed in claim 8, wherein said alkyl group substituent has 1 to 5 carbon atoms, said alkoxy group substituent has 1 to 8 carbon atoms and said halogen atom is chlorine or bromine.
Claim 11
Dependent Claim 270 words
A process for forming high contrast halftone dot or line silver images as final images for use in the graphic arts, comprising: providing a lithographic photosensitive material comprising (a) a support base, (b) a silver halide emulsion layer containing silver chlorobromide or silver chloroiodobromide, each containing up to 50 mol% silver bromide, and developed by a lithographic developer comprising an o- or p-dihydroxybenzene developing agent, and (c) a compound represented by the general formula (I) ##STR19## wherein R 1 to R 5 may be the same or different, and each represents hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR20## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring, --NH--CO--R 8 or --NHSO 2 --R 9 wherein R 8 and R 9 each represents an alkyl group, an aryl group or an aralkyl group, or R 3 and R 4 , or R 4 and R 5 may combine with each other to form a benzene ring and that, it is necessary to said compound that one and only one of the substituents R 1 , R 3 and R 5 represents --NHSO 2 --R 9 , or the benzene ring formed by combining R 3 with R 4 , or by combining R 4 with R 5 is substituted with at least one --NHSO 2 --R 9 group; image-wise exposing the lithographic photosensitive material; and developing the exposed lithographic photosensitive material with a lithographic developer comprising an o- or p-dihydroxybenzene developing agent.
Claim 12
Dependent Claim 270 words
A process for forming high contrast halftone dot or line silver images as final images for use in the graphic arts, comprising: providing a lithographic photosensitive material comprising (a) a support base, (b) a silver halide emulsion layer containing silver chlorobromide or silver chloroiodobromide, each containing up to 50 mol% silver bromide, and developed by a lithographic developer comprising an o- or p-dihydroxybenzene developing agent, and (c) a compound represented by the general formula (I) ##STR19## wherein R 1 to R 5 may be the same or different, and each represents hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR20## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring, --NH--CO--R 8 or --NHSO 2 --R 9 wherein R 8 and R 9 each represents an alkyl group, an aryl group or an aralkyl group, or R 3 and R 4 , or R 4 and R 5 may combine with each other to form a benzene ring and that, it is necessary to said compound that one and only one of the substituents R 1 , R 3 and R 5 represents --NHSO 2 --R 9 , or the benzene ring formed by combining R 3 with R 4 , or by combining R 4 with R 5 is substituted with at least one --NHSO 2 --R 9 group; image-wise exposing the lithographic photosensitive material; and developing the exposed lithographic photosensitive material with a lithographic developer comprising an o- or p-dihydroxybenzene developing agent.
Claim 13
Dependent Claim 140 words
Process according to claim 10, wherein the compound represented by general formula (I) is a compound selected from the group consisting of compounds represented by the general formula (II) ##STR21## wherein R 1 , R 2 and R 3 may be the same or different, and they each represent hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, ##STR22## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other and form a 5- or 6-membered nitrogen-containing saturated hetero ring, --NH--CO--R 8 or --NHSO 2 --R 9 wherein R 8 and R 9 each represents an alkyl group or an aralkyl group, and that, at least one of these substituents must be --NHSO 2 --R 9 wherein R 9 represents an alkyl group or an aralykl group.
Claim 14
Dependent Claim 78 words
Process according to claim 10, wherein the compound represented by general formula (I) is a compound selected from the group of compounds represented by the general formula (III): ##STR23## wherein R 10 represents hydrogen, a halogen atom or a group ##STR24## wherein R 6 and R 7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen-containing saturated hetero ring and R 11 represents an aryl group.
Claim 15
Dependent Claim 52 words
Process according to claim 10, wherein the compound represented by general formula (I) is a compound which contains at least one --NHSO 2 --R 9 wherein R 9 represents an alkyl group or aralkyl group, one alkoxy group and one alkyl group simultaneously as substituents of R 1 to R 5 .
Claim 16
Dependent Claim 34 words
Process according to claim 12, wherein the compound represented by the general formula (III) is present in an amount in the range of 1 mg to 1000 mg per 1 mol of silver halide.
Claim 17
Dependent Claim 33 words
Process according to claim 14, wherein the compound represented by the general formula (III) is present in an amount in the range of 10 mg to 100 mg per mol of silver halide.
Claim 18
Dependent Claim 21 words
Process according to claim 12, wherein said R 11 aryl group is an unsubstituted or substituted phenyl group or naphthyl group.
Claim 19
Dependent Claim 36 words
Process according to claim 16, wherein R 11 is a substituted phenyl group or naphthyl group wherein said substituent is at least one of an alkyl group, alkoxy group, halogen atom, nitro group or carboxyl group.
Claim 20
Dependent Claim 34 words
Process according to claim 17, wherein said alkyl group substituent has 1 to 5 carbon atoms, said alkoxy group substituent has 1 to 8 carbon atoms and said halogen atom is chlorine or bromine.
Claim 21
Dependent Claim 28 words
Process according to claim 10, wherein the lith-developer contains a sulfite as preservative in an amount of about 5 g or less per one liter of the developer.

References Cited (Backward Citations)

US2362598A Cited
US2536010A Cited
US3790383A Cited
US3799780A Cited
US3737316A Cited
US4010036A Cited
US4009038A Cited
US4011082A Cited
US4311781A Cited
US4332878A Cited
US4358532A Cited
US4447523A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-04-08 1988-10-08 1989-04-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-04-08 1992-10-08 1993-04-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-04-08 1996-10-08 1997-04-09 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag