US4501766A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Film depositing apparatus and a film depositing method
Assignee: Toshiba Corp
•
Filing: 1983-01-11
•
Granted: 1985-02-26
•
Expires: 2003-01-11
Abstract
Abstract A film depositing apparatus forms a film with a given thickness on each of a plurality of bases. The apparatus is provided with a casing removably mounted on a base section to form a film depositing chamber whose interior is isolated from the outside space; transfer mechanism for transferring the plurality of bases in one direction inside the film depositing chamber; gas supplying mechanism for feeding material gas into the casing, the gas supplying mechanism including injecting portions arranged along said one direction in the film depositing chamber to inject the material gas in the casing into the film depositing chamber along said one direction; and electric discharge mechanism for activating the material gas injected into the film depositing chamber by the injecting portions.
Inventors
- 👤 Katsumi Suzuki
- 👤 Shuji Yoshizawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 11:51
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0448; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5093; C23C16/54; H01; H01J; H01J37/00; H01J37/02; H01J37/18; H01J37/32; H01J37/32009; H01J37/32018
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
92 words
A film depositing apparatus which deposits a film with a given thickness on each of a plurality of substrates, said apparatus comprising: a base section; a casing removably mounted on the base section to form a sealed film depositing chamber; transfer means for transferring the plurality of substrates in one direction inside the film depositing chamber; gas supplying means for supplying a material gas into the film depositing chamber of the casing; and electric discharge means for activating the material gas supplied to the film depositing chamber by the gas supplying means.
Claim 2
Dependent Claim
92 words
A film depositing apparatus which deposits a film with a given thickness on each of a plurality of substrates, said apparatus comprising: a base section; a casing removably mounted on the base section to form a sealed film depositing chamber; transfer means for transferring the plurality of substrates in one direction inside the film depositing chamber; gas supplying means for supplying a material gas into the film depositing chamber of the casing; and electric discharge means for activating the material gas supplied to the film depositing chamber by the gas supplying means.
Claim 3
Dependent Claim
43 words
The film depositing apparatus according to claim 1, wherein said gas supplying means includes injecting means arranged along said one direction in the film depositing chamber to inject the material gas in the casing into the film depositing chamber along said one direction.
Claim 4
Dependent Claim
34 words
The film depositing apparatus according to claim 2, wherein said injecting means includes a pair of gas inlet portions extending along said one direction so as to face each other with the bases therebetween.
Claim 5
Dependent Claim
41 words
The film depositing apparatus according to claim 3, wherein each said gas inlet portion is formed of conductive material, and said electric discharge means includes a power source connected to said pair of gas inlet portions, and said substrates are grounded.
Claim 6
Dependent Claim
27 words
The film depositing apparatus according to claim 1, wherein said transfer means includes plural stand means moveable along said one direction and rotatable about their own axes.
Claim 7
Dependent Claim
178 words
A film depositing apparatus which deposits a film with a given thickness on each of a plurality of substrates, said apparatus comprising: a base section; a casing fixedly mounted on the base section to form a sealed interior film depositing chamber, said casing defining an antechamber exterior thereof; first transfer means in the film depositing chamber for endlessly moving the plurality of substrates in one direction from a predetermined portion of the film depositing chamber facing the antechamber; gas supplying means for feeding material gas into the film depositing chamber; electric discharge means for activating the material gas fed into the film depositing chamber by the gas supplying means; feeding means having a terminal end connected to the antechamber, for feeding the substrates one after another into the film depositing chamber; delivery means having a starting end connected to the antechamber, for carrying the substrates filmed in the film depositing chamber out of said film depositing chamber one after another; and pressure reducing means for selectively reducing the internal pressures of the film depositing chamber and the antechamber.
Claim 8
Dependent Claim
178 words
A film depositing apparatus which deposits a film with a given thickness on each of a plurality of substrates, said apparatus comprising: a base section; a casing fixedly mounted on the base section to form a sealed interior film depositing chamber, said casing defining an antechamber exterior thereof; first transfer means in the film depositing chamber for endlessly moving the plurality of substrates in one direction from a predetermined portion of the film depositing chamber facing the antechamber; gas supplying means for feeding material gas into the film depositing chamber; electric discharge means for activating the material gas fed into the film depositing chamber by the gas supplying means; feeding means having a terminal end connected to the antechamber, for feeding the substrates one after another into the film depositing chamber; delivery means having a starting end connected to the antechamber, for carrying the substrates filmed in the film depositing chamber out of said film depositing chamber one after another; and pressure reducing means for selectively reducing the internal pressures of the film depositing chamber and the antechamber.
Claim 9
Dependent Claim
24 words
The film depositing apparatus according to claim 6, wherein said first transfer means includes means permitting the substrates to rotate about their own axes.
Claim 10
Dependent Claim
35 words
The film depositing apparatus according to claim 6, wherein said gas supplying means includes a pair of gas inlet portions extending along said one direction so as to face each other with the substrates therebetween.
Claim 11
Dependent Claim
41 words
The film depositing apparatus according to claim 8, wherein each said gas inlet portion is formed of conductive material, and said electric discharge means includes a power source connected to said pair of gas inlet portions, and said substrates are grounded.
Claim 12
Dependent Claim
19 words
The film depositing apparatus according to claim 6, wherein said first transfer means has a circular locus of movement.
Claim 13
Dependent Claim
205 words
A film depositing apparatus which deposits a film with a given thickness on each of a plurality of substrates, said apparatus comprising: a base section; a casing fixedly mounted on the base section to form a sealed film depositing chamber, said casing including a front antechamber at one end portion and a rear antechamber at the other end portion; conveyor means having starting and terminal ends and disposed in the film depositing chamber for carrying the plurality of substrates in one direction from the starting end thereof facing the front antechamber to the terminal end thereof facing the rear antechamber; gas supplying means for supplying material gas into the film depositing chamber; electric discharge means for activating the material gas supplied to the film depositing chamber by the gas supplying means; feeding means whose terminal end is connected to the front antechamber for feeding said substrates one after another into the film depositing chamber; delivery means whose starting end is connected to the rear antechamber for carrying said substrates filmed in the film depositing chamber out of said film depositing chamber one after another; and pressure reducing means for selectively reducing the internal pressures of the front and rear antechambers and the film depositing chamber.
Claim 14
Dependent Claim
205 words
A film depositing apparatus which deposits a film with a given thickness on each of a plurality of substrates, said apparatus comprising: a base section; a casing fixedly mounted on the base section to form a sealed film depositing chamber, said casing including a front antechamber at one end portion and a rear antechamber at the other end portion; conveyor means having starting and terminal ends and disposed in the film depositing chamber for carrying the plurality of substrates in one direction from the starting end thereof facing the front antechamber to the terminal end thereof facing the rear antechamber; gas supplying means for supplying material gas into the film depositing chamber; electric discharge means for activating the material gas supplied to the film depositing chamber by the gas supplying means; feeding means whose terminal end is connected to the front antechamber for feeding said substrates one after another into the film depositing chamber; delivery means whose starting end is connected to the rear antechamber for carrying said substrates filmed in the film depositing chamber out of said film depositing chamber one after another; and pressure reducing means for selectively reducing the internal pressures of the front and rear antechambers and the film depositing chamber.
Claim 15
Dependent Claim
21 words
The film depositing apparatus according to claim 11, wherein said conveyor means causes the bases to rotate about their own axes.
Claim 16
Dependent Claim
35 words
The film depositing apparatus according to claim 11, wherein said gas supplying means includes a pair of gas inlet portions extending along said one direction so as to face each other with the substrates therebetween.
Claim 17
Dependent Claim
41 words
The film depositing apparatus according to claim 13, wherein each said gas inlet portion is formed of conductive material, and said electric discharge means includes a power source connected to said pair of gas inlet portions, and said substrates are grounded.
Claim 18
Independent Claim
155 words
A method for depositing a film with a given thickness on the surface of each of a plurality of substrates, said method comprising the steps of: (a) arranging the plurality of substrates on a feed path along a transfer direction; (b) arranging the internal pressure of a film depositing chamber including an endless transfer path to lead material gas into the film depositing chamber; (c) causing electric discharge inside the film depositing chamber to activate the material gas; (d) feeding each of the substrates from the feed path to a predetermined portion of the transfer path in the film depositing chamber through an antechamber; (e) endlessly driving the substrates in the film depositing chamber along the transfer path to transfer each of the substrates again to the predetermined portion of the transfer path; and (f) carrying the filmed substrates returned to the predetermined portion of the transfer path to a delivery path via the antechamber.
Claim 19
Independent Claim
155 words
A method for depositing a film with a given thickness on the surface of each of a plurality of substrates, said method comprising the steps of: (a) arranging the plurality of substrates on a feed path along a transfer direction; (b) arranging the internal pressure of a film depositing chamber including an endless transfer path to lead material gas into the film depositing chamber; (c) causing electric discharge inside the film depositing chamber to activate the material gas; (d) feeding each of the substrates from the feed path to a predetermined portion of the transfer path in the film depositing chamber through an antechamber; (e) endlessly driving the substrates in the film depositing chamber along the transfer path to transfer each of the substrates again to the predetermined portion of the transfer path; and (f) carrying the filmed substrates returned to the predetermined portion of the transfer path to a delivery path via the antechamber.
Claim 20
Dependent Claim
14 words
The method according to claim 15, wherein said material gas contains at least silicon.
Claim 21
Independent Claim
147 words
A method for depositing a film with a given thickness on the surface of each of a plurality of substrates, said method comprising the steps of: (a) arranging the plurality of substrates on a feed path along a transfer direction; (b) reducing the internal pressure of a film depositing chamber including a transfer path extending along one direction to lead material gas into the film depositing chamber; (c) causing electric discharge inside the film depositing chamber to activate the material gas; (d) feeding each of the substrates from the feed path to one end of the transfer path in the film depositing chamber through a front antechamber; (e) transferring the substrates in the film depositing chamber along the transfer path to the other end thereof; and (f) carrying the substrates transferred to the other end of the transfer path to a delivery path through a rear antechamber.
Claim 22
Independent Claim
147 words
A method for depositing a film with a given thickness on the surface of each of a plurality of substrates, said method comprising the steps of: (a) arranging the plurality of substrates on a feed path along a transfer direction; (b) reducing the internal pressure of a film depositing chamber including a transfer path extending along one direction to lead material gas into the film depositing chamber; (c) causing electric discharge inside the film depositing chamber to activate the material gas; (d) feeding each of the substrates from the feed path to one end of the transfer path in the film depositing chamber through a front antechamber; (e) transferring the substrates in the film depositing chamber along the transfer path to the other end thereof; and (f) carrying the substrates transferred to the other end of the transfer path to a delivery path through a rear antechamber.
Claim 23
Dependent Claim
14 words
The method according to claim 17, wherein said material gas contains at least silicon.
References Cited (Backward Citations)
US2995463A
Cited
GB1281539A
Cited
GB1328838A
Cited
US3865072A
Cited
GB1534833A
Cited
US4225222A
Cited
JPS5486341A
Cited
JPS5499441A
Cited
DE2951453A1
Cited
EP0060651A2
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-02-26 | 1988-08-27 | 1989-02-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-02-26 | 1992-08-27 | 1993-02-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-02-26 | 1996-08-27 | 1997-02-26 | $7700.00 | Window Closed / Lapsed |