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US4489149A Expired / Lapsed US ⏱️ 0.0 years remaining

Electrophotographic amorphous silicon member

Assignee: Kyocera Corp
•
Filing: 1983-12-19
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Granted: 1984-12-18
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Expires: 2003-12-19
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Abstract

Abstract The invention disclosed relates to an electrophotographic sensitive member having a photoconductive layer of amorphous silicon. The photoconductive layer is preferably formed by the glow discharge process and includes about 10 -5 to 5×10 -2 atomic % of oxygen, about 10 to 40 atomic % of hydrogen and about 10 to 20000 ppm of a Group IIIb impurity of the Periodic Table. A barrier layer of amorphous silicon having a thickness of about 0.2 to 5 microns and containing about 0.05 to 1 atomic % of oxygen may also be formed between a substrate and said photoconductive layer.

Inventors

  • 👤 Takao Kawamura
  • 👤 Masazumi Yoshida

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 09:19
CPC Classifications
G; G03; G03G; G03G5/00; G03G5/02; G03G5/04; G03G5/08; G03G5/082; G03G5/08214; G03G5/08221

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 80 words
An electrophotographic sensitive member which comprises a substrate, a barrier layer of amorphous silicon having a thickness of about 0.2 to 5 microns and containing about 0.05 to 1 atomic % of oxygen and a photoconductive layer of amorphous silicon formed on said barrier layer and containing about 10 -5 to 5×10 -2 atomic % of oxygen, about 10 to 40 atomic % of hydrogen and about 10 to 20000 ppm of a Group IIIa impurity of the Periodic Table.
Claim 2
Dependent Claim 80 words
An electrophotographic sensitive member which comprises a substrate, a barrier layer of amorphous silicon having a thickness of about 0.2 to 5 microns and containing about 0.05 to 1 atomic % of oxygen and a photoconductive layer of amorphous silicon formed on said barrier layer and containing about 10 -5 to 5×10 -2 atomic % of oxygen, about 10 to 40 atomic % of hydrogen and about 10 to 20000 ppm of a Group IIIa impurity of the Periodic Table.
Claim 3
Dependent Claim 26 words
An electrophotographic sensitive member as claimed in claim 1 wherein both of said barrier layer and said photoconductive layer are formed by the glow discharge process.
Claim 4
Dependent Claim 42 words
An electrophotographic sensitive member as claimed in claim 1 wherein said barrier layer preferably contains about 0.05 to 0.5 atomic % of oxygen and as much as about 1 atomic % of oxygen when the thickness is about 0.2 to 0.04 micron.
Claim 5
Dependent Claim 14 words
An electrophotographic sensitive member as claimed in claim 2 wherein said impurity is boron.
Claim 6
Dependent Claim 109 words
An electrophotographic sensitive member which comprises, a barrier layer of amorphous silicon formed by the glow discharge process and having a thickness of about 0.2 to 5 micron and containing about 0.05 to 0.5 atomic % of oxygen but containing as much as about 1 atomic % when the thickness is about 0.2 to 0.4 micron, and a photoconductive layer of amourphous silicon formed by the glow discharge process and having a thickness of about 5 to 100 microns, said photoconductive layer including about 10 -5 to 5×10 -2 atomic % of oxygen, about 10 to 40 atomic % of hydrogen and about 10 to 20000 ppm of boron.
Claim 7
Dependent Claim 109 words
An electrophotographic sensitive member which comprises, a barrier layer of amorphous silicon formed by the glow discharge process and having a thickness of about 0.2 to 5 micron and containing about 0.05 to 0.5 atomic % of oxygen but containing as much as about 1 atomic % when the thickness is about 0.2 to 0.4 micron, and a photoconductive layer of amourphous silicon formed by the glow discharge process and having a thickness of about 5 to 100 microns, said photoconductive layer including about 10 -5 to 5×10 -2 atomic % of oxygen, about 10 to 40 atomic % of hydrogen and about 10 to 20000 ppm of boron.
Claim 8
Dependent Claim 42 words
An electrophotographic sensitive member as claimed in claim 2 wherein said barrier layer preferably contains about 0.05 to 0.5 atomic % of oxygen and as much as about 1 atomic % of oxygen when the thickness is about 0.2 to 0.4 micron.

References Cited (Backward Citations)

US4225222A Cited
US4265991A Cited
US4147667A Cited
US4217374A Cited
US4226898A Cited
JPS54145539A Cited
JPS54145550A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-12-18 1988-06-18 1988-12-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-12-18 1992-06-18 1992-12-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-12-18 1996-06-18 1996-12-18 $7700.00 Window Closed / Lapsed

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