US4481070A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Double planarization process for multilayer metallization of integrated circuit structures
Assignee: Advanced Micro Devices Inc
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Filing: 1984-04-04
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Granted: 1984-11-06
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Expires: 2004-04-04
Abstract
Abstract A process is disclosed for the planarization of an integrated circuit structure by a two stage planarization process which comprises: applying over a metallization layer, having one or more openings therein, a layer of insulation sufficiently thin to avoid formation of voids in the portion of the insulation applied in the openings in the metallization layer; smoothing the insulation layer by removing the high portions of the insulation by, for example, dry etching the insulation; applying a further layer of insulation over the first insulation layer; and smoothing the further layer of insulation by removing the high portions by, for example, dry etching; whereby the resultant smoothed insulation surface will be substantially planar and substantially void-free. In a preferred embodiment, a second material, such as a photoresist material, is coated over the insulation layer prior to the smoothing step, particularly when an anisotropic dry etching process is used, to insure that only the high portions of the insulation layer are removed in the etching step.
Inventors
- 👤 Mammen Thomas
- 👤 Linda J. Koyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 05:36
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/06; H10P95/062; H10P95/064; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/092
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
103 words
An improved process for the planarization of an integrated circuit structure comprises: (a) applying over a metallization layer, having one or more openings therein, a layer of insulation sufficiently thin to avoid formation of voids in the portion of said insulation deposited in the openings in said metallization layer; (b) smoothing said insulation layer by removing the high portions of said insulation; (c) applying a further layer of insulation over said first insulation layer; and (d) smoothing said further layer of insulation by removing the high portions of said insulation; whereby the resultant smoothed insulation surface will be substantially planar and substantially void-free.
Claim 2
Dependent Claim
103 words
An improved process for the planarization of an integrated circuit structure comprises: (a) applying over a metallization layer, having one or more openings therein, a layer of insulation sufficiently thin to avoid formation of voids in the portion of said insulation deposited in the openings in said metallization layer; (b) smoothing said insulation layer by removing the high portions of said insulation; (c) applying a further layer of insulation over said first insulation layer; and (d) smoothing said further layer of insulation by removing the high portions of said insulation; whereby the resultant smoothed insulation surface will be substantially planar and substantially void-free.
Claim 3
Dependent Claim
23 words
The process of claim 1 wherein said smoothing of said insulation layer is done by dry etching the upper surface of said insulation.
Claim 4
Dependent Claim
36 words
The process of claim 2 including the further steps of coating said insulation material with a second etchable material prior to said dry etching step, and removing said second etchable material after said dry etching step.
Claim 5
Dependent Claim
159 words
An improved process for planarization of an integrated circuit structure which comprises: (a) applying over a metallization layer having one or more openings therein, a layer of insulation sufficiently thin to avoid formation of voids in the portion of said insulation material applied in said one or more openings in said metallization layer; (b) coating said insulation with a second material which will, at least partially, fill in the steps formed by said insulation and which is capable of being dry etched; (c) dry etching away a portion of said insulation and said second material whereby the highest portions of said insulation will be partially removed; (d) selectively removing the remaining portions of said second material; (e) applying a further layer of insulation over said first layer; and (f) dry etching said further layer of insulation to remove the highest portions of said second layer of insulation whereby the resultant etched surface will be substantially planar and substantially void-free.
Claim 6
Dependent Claim
159 words
An improved process for planarization of an integrated circuit structure which comprises: (a) applying over a metallization layer having one or more openings therein, a layer of insulation sufficiently thin to avoid formation of voids in the portion of said insulation material applied in said one or more openings in said metallization layer; (b) coating said insulation with a second material which will, at least partially, fill in the steps formed by said insulation and which is capable of being dry etched; (c) dry etching away a portion of said insulation and said second material whereby the highest portions of said insulation will be partially removed; (d) selectively removing the remaining portions of said second material; (e) applying a further layer of insulation over said first layer; and (f) dry etching said further layer of insulation to remove the highest portions of said second layer of insulation whereby the resultant etched surface will be substantially planar and substantially void-free.
Claim 7
Dependent Claim
45 words
The process of claim 4 including the steps of coating said further layer of insulation with a second material capable of being dry etched to at least partially fill in low areas on said insulation; and removing said second material after said dry etching step.
Claim 8
Dependent Claim
33 words
The process of claim 4 wherein said first insulation layer is coated with an organic material which may be selectively removed after said dry etching to permit application of said further insulation layer.
Claim 9
Dependent Claim
14 words
The process of claim 4 wherein said insulation layers comprise applications of oxide material.
Claim 10
Dependent Claim
12 words
The process of claim 7 wherein said oxide material comprises silicon dioxide.
Claim 11
Dependent Claim
13 words
The process of claim 7 wherein said dry etching comprises an anisotropic etching.
Claim 12
Dependent Claim
15 words
The process of claim 9 wherein said anisotropic etching is an anisotropic reactive ion etching.
Claim 13
Dependent Claim
22 words
The process of claim 9 wherein said second material comprises an organic material capable of being partially removed by said dry etching.
Claim 14
Dependent Claim
27 words
The process of claim 11 wherein said organic material comprises a photoresist material having a dry etch rate substantially similar to the etch rate of said oxide.
Claim 15
Dependent Claim
179 words
An improved process for smoothing the step coverage over a metallization layer for subsequent application of a further metallization layer which comprises: (a) applying on said metallization layer, a layer of insulation material selected from the group consisting of silicon dioxide and silicon dioxide doped with phosphorus which is sufficiently thin to permit at least partial filling with said insulation material of openings in said metallization layer without forming voids in the insulation layer; (b) coating said insulation layer with a layer of photoresist material to smooth the step coverage of said oxide layer; (c) dry etching the photoresist coating and raised portions of the underlying insulation layer; (d) selectively removing the photoresist layer; (e) applying a second insulation layer selected from the group consisting of silicon dioxide and silicon dioxide doped with phosphorus over said first insulation layer; (f) coating said second insulation layer with a further layer of photoresist; (g) dry etching said further photoresist coating and raised portions of said underlying insulation layer to smooth the second insulation layer; and (h) removing the second photoresist coating.
Claim 16
Dependent Claim
179 words
An improved process for smoothing the step coverage over a metallization layer for subsequent application of a further metallization layer which comprises: (a) applying on said metallization layer, a layer of insulation material selected from the group consisting of silicon dioxide and silicon dioxide doped with phosphorus which is sufficiently thin to permit at least partial filling with said insulation material of openings in said metallization layer without forming voids in the insulation layer; (b) coating said insulation layer with a layer of photoresist material to smooth the step coverage of said oxide layer; (c) dry etching the photoresist coating and raised portions of the underlying insulation layer; (d) selectively removing the photoresist layer; (e) applying a second insulation layer selected from the group consisting of silicon dioxide and silicon dioxide doped with phosphorus over said first insulation layer; (f) coating said second insulation layer with a further layer of photoresist; (g) dry etching said further photoresist coating and raised portions of said underlying insulation layer to smooth the second insulation layer; and (h) removing the second photoresist coating.
Claim 17
Dependent Claim
17 words
The process of claim 13 wherein a second metallization layer is applied over said second insulation layer.
Claim 18
Dependent Claim
56 words
The process of claim 14 wherein a layer of insulation is applied over said second metallization layer, said insulation layer is coated with photoresist material, said photoresist and raised portions of said insulation layer are dry etched, and said photoresist is selectively removed to provide a smooth surface for the application of a third metallization layer.
Claim 19
Dependent Claim
38 words
The process of claim 13 wherein a second metallization layer is deposited over said second insulation layer and steps (a) to (h) are then repeated to provide a smooth surface for the application of a third metallization layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-11-06 | 1988-05-07 | 1988-11-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-11-06 | 1992-05-07 | 1992-11-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-11-06 | 1996-05-07 | 1996-11-06 | $7700.00 | Window Closed / Lapsed |