Patent US4462883A successfully refreshed from Google Patents.
US4462883A
Expired / Lapsed
US
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Low emissivity coatings on transparent substrates
Assignee: Pilkington Group Ltd
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Filing: 1983-09-19
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Granted: 1984-07-31
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Expires: 2003-09-19
Abstract
Abstract A low emissivity coating on a transparent substrate of glass or plastics material is produced by cathode sputtering a layer of silver and thereafter reactively sputtering an anti-reflection metal oxide layer over the silver in the presence of oxygen or an oxidizing gas, wherein a small amount of an additional metal other than silver is sputtered onto the silver before the overlying anti-reflection metal oxide layer is applied. The process produces a new low emissivity coated product comprising a glass or plastics substrate with a low emissivity coating comprising a silver layer, a small amount of additional metal dispersed non-uniformly in the silver layer and possibly extending over the silver layer, and an overlying anti-reflection metal oxide coating.
Inventors
- 👤 Frederick H. Hart
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 12:38
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/20; G02B5/28; G02B5/285; C; C03; C03C; C03C17/00; C03C17/34; C03C17/36; C03C17/3602; C03C17/3615; C03C17/3644; C03C17/3652; C03C17/3657; C03C17/366; C03C17/3681; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/083; C23C14/086; C23C14/14; C23C14/18; C23C14/20; G02B1/00; G02B1/10; G02B1/11; G02B1/113; G02B1/115; G02B1/116; Y; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12535
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
94 words
A process for the production of a low emissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence, (i) sputtering a layer of silver from 5 to 30 nm thick onto the transparent glass or plastics substrate (ii) sputtering at least one additional metal other than silver in amount equivalent to a layer 0.5 to 10 nm thick onto the silver and (iii) reactively sputtering, in the presence of oxygen or an oxidising gas, at least one anti-reflection metal oxide layer over the silver and additional metal.
Claim 2
Dependent Claim
94 words
A process for the production of a low emissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence, (i) sputtering a layer of silver from 5 to 30 nm thick onto the transparent glass or plastics substrate (ii) sputtering at least one additional metal other than silver in amount equivalent to a layer 0.5 to 10 nm thick onto the silver and (iii) reactively sputtering, in the presence of oxygen or an oxidising gas, at least one anti-reflection metal oxide layer over the silver and additional metal.
Claim 3
Dependent Claim
30 words
A process according to claim 1 wherein the or each additional metal is a metal which forms a colourless metal oxide on subsequent reactive sputtering of the anti-reflection metal oxide.
Claim 4
Dependent Claim
12 words
A process according to claim 1 wherein the additional metal is copper.
Claim 5
Dependent Claim
27 words
A process according to claim 1 wherein additional metal is sputtered onto the silver in a total amount equivalent to a layer 1 to 5 nm thick.
Claim 6
Dependent Claim
18 words
A process according to claim 1 wherein the layer of silver sputtered is 8 to 15 nm thick.
Claim 7
Dependent Claim
21 words
A process according to claim 1 wherein an anti-reflection layer is sputtered onto the substrate before sputtering of the silver layer.
Claim 8
Dependent Claim
125 words
A process according to claim 1 for the production of a low emissivity coating on a transparent substrate of glass by cathode sputtering comprising (a) depositing an anti-reflection layer of SnO 2 30 to 50 nm thick onto the glass substrate by reactive sputtering of tin in the presence of oxygen or an oxidising gas; (b) sputtering a layer of silver 8 to 12 nm thick onto said anti-reflection layer; (c) sputtering copper in an amount equivalent to a layer of copper 1 to 5 nm thick onto said silver layer; and thereafter (d) depositing on the coating so formed an anti-reflection layer of SnO 2 30 to 50 nm thick by reactive sputtering of tin in the presence of oxygen or an oxidising gas.
Claim 9
Dependent Claim
15 words
A process according to claim 1 wherein the sputtering processes are aided by magnetic enhancement.
Claim 10
Dependent Claim
104 words
A process according to claim 1 for the production of a low emissivity coating on a transparent glass substrate by D.C. magnetron sputtering comprising, in sequence, (i) sputtering an anti-reflection metal oxide layer on to the substrate; (ii) sputtering a layer of silver from 8 to 15 nm thick onto the said layer; (iii) sputtering an additional metal or metals other than silver in an amount equivalent to a layer 0.5 to 5 nm thick onto the silver; and (iv) reactively sputtering, in the presence of oxygen or an oxidising gas, an anti-reflection metal oxide layer or layers over the silver and additional metal.
Claim 11
Dependent Claim
12 words
A process according to claim 9 wherein the additional metal is copper.
Claim 12
Dependent Claim
29 words
A process according to claim 9 wherein the additional metal is a metal which forms a colourless metal oxide on subsequent reactive sputtering of the anti-reflection metal oxide layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-31 | 1988-01-30 | 1988-07-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-31 | 1992-01-30 | 1992-07-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-31 | 1996-01-30 | 1996-07-31 | $7700.00 | Window Closed / Lapsed |