Process for and structure of high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines

Claim 2

A process for fabricating a field effect semiconductor device on a mononcyrstalline silicon substrate having a first surface on which said device is to be formed, comprising the steps of: thermally oxidizing the surface of said semiconductor substrate to form a first silicon dioxide layer thereon, forming a first silicon nitride layer on said first silicon dioxide layer, retaining portions of said first silicon nitride layer and the corresponding underlying first silicon dioxide layer overlying a selected area of said substrate surface and removing remaining portions of said first silicon nitride and silicon dioxide layers to expose said substrate surface outside said selected area, thermally growing a field oxide on said exposed surface of said substrate surrounding said selected area, removing said first silicon nitride and silicon dioxide layers, thermally growing a second silicon dioxide layer on said selected area, forming a second silicon nitride layer on said second silicon dioxide layer on said field oxide, forming a thin silicon oxynitride layer on said second silicon nitride layer, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversly of said selected area for said device and to define at least one polysilicon conducting line on said second nitride layer over said field oxide and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to source and drain regions of said device and comprising the electrode of the gate of said device, oxidizing the surfaces of said gate polysilicon layer and of said at least one polysilicon conducting line while retaining said second silicon nitride layer over said source and drain regions of device to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, removing exposed portions of said second silicon nitride layer by a material selective removal process including said silicon oxynitride layer formed thereon, thereby to expose the underlying said second silicon dioxide layer on said source and drain regions, removing the portions of said second silicon dioxide layer uncovered by removal of said portions of said second nitride layer, thereby to expose the surface of said substrate at said source and drain regions of said device and provide self-aligned vias for contacts to said source and drain regions of said device.

Claim 3

A process as recited in claim 1, further comprising, after oxidizing the surface of said gate polysilicon layer, implanting ions into said substrate for doping of said selecting areas, said silicon dioxide insulating layer formed on said gate polysilicon layer preventing doping of said substrate in the respectively underlying portion thereof.

Claim 4

A process as recited in claim 1 further comprising: subsequently to oxidizing the surfaces of said gate polysilicon layer and of said at least one polysilicon conducting line, selectively removing at least a portion of the oxide layer formed on the gate polysilicon layer to expose the surface of same and thereby afford a via for a contact directly to the gate of the device.

Claim 5

A process as recited in claim 3, further comprising: subsequently to the step of removing the portions of said second silicon dioxide layer, providing conductive lines extending over said field oxide and into contact with the exposed surfaces of said source and drain regions of said selected active device and to said exposed surface of said gate polysilicon layer to provide electrical connection thereto.

Claim 6

A process for fabricating very large scale integrated circuits including field effect semiconductor devices and diffused conducting lines on a monocrystalline silicon semiconductor substrate having a first surface on which said integrated circuits are to be formed, comprising the steps of: forming a field oxide on said first surface surrounding and isolating selected areas of said first surface on which respectively corresponding said devices and diffused conducting lines are to be formed, each said device including source and drain regions in the corresponding said selected area and, for at least a selected such device, diffused conducting lines extending in common from respective said source and drain regions thereof to a position in said substrate remote from the gate of said selected device, thermally growing a silicon dioxide layer on said selected areas of said first surface, of a thickness suitable for the gate insulator layer of said device, forming a silicon nitride layer on said silicon dioxide layer extending at least over said selected areas, oxidizing said silicon nitride layer to form a silicon oxynitride layer thereon, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversely of said selected area for each said device and to define at least one polysilicon conducting line on said field oxide, and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to said source and drain regions to be formed for each said device and comprising the electrode of the gate of said device, oxidizing the surfaces of said gate polysilicon layer and of said at least one polysilicon conducting line while retaining the silicon nitride layer over said selected areas including said source and drain regions of each said device and said diffused conductive lines to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, doping said source and drain regions and said diffused conducting lines, selectively removing a portion of the oxidized surface of said gate polysilicon layer for exposing same and affording a via for a direct contact to the gate of said device, removing the silicon oxynitride layers formed on the silicon nitride layers at least in the areas overlying said source and drain regions, and selectively removing portions of the silicon nitride layer overlying the said diffused conducting lines associated with said source and drain regions of each said selected device to expose the surfaces thereof at said remote positions thereof to provide vias for contacts thereto, removing any oxide material exposed by removal of the silicon nitride layer, and providing conductive lines extending over said field oxide and into contact with said remote, exposed portions of the surfaces of said diffused conducting lines associated with said source and drain regions of each said selected device and into contact with the exposed surface of said gate polysilicon layer to provide electrical connection thereto.

Claim 7

A process for fabricating very large scale integrated circuits including field effect semiconductor devices and diffused conducting lines on a monocrystalline silicon semiconductor substrate having a first surface on which said integrated circuits are to be formed, comprising the steps of: forming a field oxide on said first surface surrounding and isolating selected areas of said first surface on which respectively corresponding said devices and diffused conducting lines are to be formed, each said device including source and drain regions in the corresponding said selected area and, for at least a selected such device, diffused conducting lines extending in common from respective said source and drain regions thereof to a position in said substrate remote from the gate of said selected device, thermally growing a silicon dioxide layer on said selected areas of said first surface, of a thickness suitable for the gate insulator layer of said device, forming a silicon nitride layer on said silicon dioxide layer extending at least over said selected areas, oxidizing said silicon nitride layer to form a silicon oxynitride layer thereon, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversely of said selected area for each said device and to define at least one polysilicon conducting line on said field oxide, and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to said source and drain regions to be formed for each said device and comprising the electrode of the gate of said device, oxidizing the surfaces of said gate polysilicon layer and of said at least one polysilicon conducting line while retaining the silicon nitride layer over said selected areas including said source and drain regions of each said device and said diffused conductive lines to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, doping said source and drain regions and said diffused conducting lines, selectively removing a portion of the oxidized surface of said gate polysilicon layer for exposing same and affording a via for a direct contact to the gate of said device, removing the silicon oxynitride layers formed on the silicon nitride layers at least in the areas overlying said source and drain regions, and selectively removing portions of the silicon nitride layer overlying the said diffused conducting lines associated with said source and drain regions of each said selected device to expose the surfaces thereof at said remote positions thereof to provide vias for contacts thereto, removing any oxide material exposed by removal of the silicon nitride layer, and providing conductive lines extending over said field oxide and into contact with said remote, exposed portions of the surfaces of said diffused conducting lines associated with said source and drain regions of each said selected device and into contact with the exposed surface of said gate polysilicon layer to provide electrical connection thereto.

Claim 8

A process for fabricating very large scale intergrated circuits including field effect semiconductor devices and conducting lines on a monocrystalline silicon semiconductor substrate having a first surface on which said integrated circuitsaare to be formed, comprising the steps of: forming a field oxide on said first surface surrounding and isolating selected areas of said first surface on which respectively corresponding said devices are to be formed, each said device including source and drain regions in the corresponding said selected area and a gate on said substrate intermediate said source and drain regions thermally growing a silicon dioxide layer on said selected areas of said first surface, of a thickness suitable for the gate insulator layer of the gates of said devices, forming a silicon nitride layer on said silicon dioxide layer extending at least over said selected areas, oxidizing said silicon nitride layer to form a silicon oxynitride layer thereon, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversely of said selected area and comprising the electrode of the gate for each said device and to define at least one polysilicon conducting line on said field oxide, and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to said source and drain regions to be formed for each said device, oxidizing the surfaces of said gate polysilicon layer and of each said polysilicon conducting line while retaining the silicon nitride layer over said source and drain regions of each said device to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, and selectively removing a portion of the oxidized surface of said gate polysilicon layer of at least a selected said device for exposing same and affording a via for a direct contact to the gate of said selected device.

Claim 9

A process for fabricating very large scale intergrated circuits including field effect semiconductor devices and conducting lines on a monocrystalline silicon semiconductor substrate having a first surface on which said integrated circuitsaare to be formed, comprising the steps of: forming a field oxide on said first surface surrounding and isolating selected areas of said first surface on which respectively corresponding said devices are to be formed, each said device including source and drain regions in the corresponding said selected area and a gate on said substrate intermediate said source and drain regions thermally growing a silicon dioxide layer on said selected areas of said first surface, of a thickness suitable for the gate insulator layer of the gates of said devices, forming a silicon nitride layer on said silicon dioxide layer extending at least over said selected areas, oxidizing said silicon nitride layer to form a silicon oxynitride layer thereon, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversely of said selected area and comprising the electrode of the gate for each said device and to define at least one polysilicon conducting line on said field oxide, and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to said source and drain regions to be formed for each said device, oxidizing the surfaces of said gate polysilicon layer and of each said polysilicon conducting line while retaining the silicon nitride layer over said source and drain regions of each said device to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, and selectively removing a portion of the oxidized surface of said gate polysilicon layer of at least a selected said device for exposing same and affording a via for a direct contact to the gate of said selected device.

Claim 10

A process as recited in claim 6, further comprising: providing a conductive line extending over said field oxide and into contact with said exposed surface of said gate polysilicon layer to provide electrical connection to the gate of each said selected device.

Claim 11

A process as recited in claim 5 or 6, further comprising: subsequently to selectively removing a portion of the oxidized surface of said gate polysilicon layer for exposing same and affording a via for contact thereto, for each said selected device, selectively removing portions of the silicon nitride layer including at least the corresponding portions of said silicon oxynitride layer thereon overlying the source and drain regions in the corresponding said selected area for at least certain of said devices thereby to expose the underlying said silicon dioxide layer on said source and drain region, removing the portions of said silicon dioxide layer uncovered by removal of said portions of said silicon nitride layer, thereby to expose the surfaces of said source and drain regions to afford self-aligned vias for contacts thereto.

Claim 12

A process as recited in claim 5 or 7, further comprising: subsequently to the step of selectively removing a portion of the oxidized surface of said gate polysilicon layer for exposing same and affording a via for contact thereto, for each said selected device, removing the portions of said silicon nitride layer by a material selective removal process, thereby to expose the underlying said silicon dioxide layer on said source and drain regions, removing the portions of said silicon dioxide layer uncovered by removal of said portions of said second silicon nitride layer, thereby to expose the surface of said substrate at said source and drain regions and afford self-aligned vias for contacts to said source and drain regions of said device, providing conductive lines extending over said field oxide and into contact with said exposed surfaces of said gate polysilicon layer and of said source and drain regions to provide electrical connection thereto.

Claim 13

A process for fabricating a field effect semiconductor device on a monocrystalline silicon substrate having a first surface on which said device is to be formed, comprising the steps of: forming a field oxide on said first surface surrounding and isolating a selected area of said first surface on which said device is to be formed, said device including source and drain regions in said selected area and a gate intermediate said source and drain regions, thermally growing a silicon dioxide layer on said selected area of said first surface, of a thickness suitable for the gate insulator layer of said device, forming a silicon nitride layer on said silicon dioxide layer extending at least over said selected areas, forming a layer of silicon oxynitride on said silicon nitride layer, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversely of said selected area for said device and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to said source and drain regions to be formed for each said device and comprising the electrode of the gate of said device, oxidizing the surfaces of said gate polysilicon layer while retaining the silicon nitride layer over said source and drain regions of said device to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, and selectively removing a portion of the oxidized surface of said gate polysilicon layer for exposing same and affording a via for a direct contact to the gate of said device.

Claim 14

A process for fabricating a field effect semiconductor device on a monocrystalline silicon substrate having a first surface on which said device is to be formed, comprising the steps of: forming a field oxide on said first surface surrounding and isolating a selected area of said first surface on which said device is to be formed, said device including source and drain regions in said selected area and a gate intermediate said source and drain regions, thermally growing a silicon dioxide layer on said selected area of said first surface, of a thickness suitable for the gate insulator layer of said device, forming a silicon nitride layer on said silicon dioxide layer extending at least over said selected areas, forming a layer of silicon oxynitride on said silicon nitride layer, depositing a layer of doped polysilicon on said silicon oxynitride layer, delineating said polysilicon layer to define a gate polysilicon layer extending transversely of said selected area for said device and removing remaining portions of the polysilicon layer, said gate polysilicon layer defining first and second, remaining portions of said selected area corresponding to said source and drain regions to be formed for each said device and comprising the electrode of the gate of said device, oxidizing the surfaces of said gate polysilicon layer while retaining the silicon nitride layer over said source and drain regions of said device to prevent the formation of any substantial amount of thermal oxide on said source and drain regions, and selectively removing a portion of the oxidized surface of said gate polysilicon layer for exposing same and affording a via for a direct contact to the gate of said device.

Claim 15

A process as recited in claim 10, further comprising: removing the silicon oxynitride formed on the silicon nitride layers at least in the areas overlying said source and drain regions, and selectively removing portions of the silicon nitride layer overlying said source and drain regions of said device to expose the surfaces thereof and removing any oxide material layer portions exposed by removal of the silcon nitride layer, thereby providing vias for contacts thereto, and providing conductive lines extending over said field oxide and through said vias into contact with said exposed portions of the surfaces of said source and drain regions and into contact with the exposed surface of said gate polysilicon layer to provice electrical connection thereto.

Claim 16

A process as recited in claim 10, further comprising: forming said field oxide on said first surface to surround and isolate further selected areas of said first surface on which respectively corresponding diffused conducting lines are to be formed, extending from respective said source and drain regions to a position remote from the gate of said device, simultaneously with said selected area, thermally growing said silicon dioxide layer on said further selected areas of said first surface, of a thickness suitable for the gate insulator of said device and forming said silicon nitride layer on said silicon dioxide layer extending at least over said selected and said further selected areas, removing any oxide material layer portions exposed by removal of the silcon nitride layer selectively removing portions of the silicon nitride layer overlying the said diffused conducting lines associated with said source and drain regions of said device to expose the surfaces thereof at said remote positions thereof to provide vias for contacts thereto, and providing conductive lines extending over said field oxide and through said vias into contact with said remote, exposed portions of the surfaces of said diffused conducting lines associated with said source and drain regions of said device and into contact with the exposed surface of said gate polysilicon layer to provide electrical connection thereto.