Installation for depositing thin layers in the reactive vapor phase

Claim 1

An installation for the deposition of thin layers in reactive vapour phase, comprising a tightly sealed enclosure, means for introducing into the enclosure a gas having an appropriate composition, means for introducing into the same enclosure a high frequency field able to form a plasma, and a sample holder, the gas and high frequency introduction means being brought together in a head comprising a coaxial conductor able to propagate the high frequency field, said conductor entering the enclosure by a tight passage and being constituted by an outer sheath and a hollow inner core connected to gas supply means, further comprising a chamber constituted by a cylinder having openings along one generatrix, said cylinder being closed by two end covers, the core being linked with the chamber by a gas distribution tube located within the cylinder, the outer sheath of the conductor being connected to a metal skirt surrounding the chamber, whilst the sample holder is positioned beneath the row of openings, and wherein means are provided to permit a relative displacement of the sample holder with respect to the head in a direction perpendicular to the row of openings.