Abstract The invention provides a novel method for manufacturing fused quartz glass by the decomposition and oxidation of a vaporizable silicon compound such as silicon tetrachloride in a plasma flame according to which the quartz glass rod produced contains a controlled amount of hydroxy groups with high reproducibility. The principle of the inventive method consists in the admixture of gaseous hydrogen chloride into the gaseous reactant mixture or in the plasma-supporting gas as the source for the hydrogen atoms to be converted to the hydroxy groups in place of hydrogen gas or water vapor as the hydrogen source. Good proportionality is established between the concentration of the hydrogen chloride in the gaseous feed and the hydroxy content in the resultant fused quartz glass rod.
A method for manufacturing fused quartz glass with a controlled amount of hydroxy groups which method comprises admixing gaseous hydrogen chloride and oxygen with the vapor of a vaporizable silicon compound to form a gaseous reactant mixture, blowing the gaseous reactant mixture into a plasma flame formed with a gas flow of a plasma-supporting gas selected from the group consisting of oxygen, argon and mixtures thereof, whereby the silicon compound is decomposed and oxidized into silicon dioxide which is molten at the temperature of the plasma flame, and depositing the molten silicon dioxide on a substrate below the plasma flame to form said glass.
Claim 2
Independent Claim
104 words
A method for manufacturing fused quartz glass with a controlled amount of hydroxy groups which method comprises admixing gaseous hydrogen chloride and oxygen with the vapor of a vaporizable silicon compound to form a gaseous reactant mixture, blowing the gaseous reactant mixture into a plasma flame formed with a gas flow of a plasma-supporting gas selected from the group consisting of oxygen, argon and mixtures thereof, whereby the silicon compound is decomposed and oxidized into silicon dioxide which is molten at the temperature of the plasma flame, and depositing the molten silicon dioxide on a substrate below the plasma flame to form said glass.
Claim 3
Dependent Claim
15 words
The method as claimed in claim 1 wherein the vaporizable silicon compound is silicon tetrachloride.
Claim 4
Dependent Claim
16 words
The method as claimed in claim 1 wherein the plasma-supporting gas further contains gaseous hydrogen chloride.