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US4426311A
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Methylene chloride-methane sulfonic acid stripping compositions and methods for using same
Assignee: Hmc Patents Holding Co Inc
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Filing: 1981-12-23
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Granted: 1984-01-17
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Expires: 2001-12-23
Abstract
Abstract Methylene chloride-methane sulfonic acid compositions used in removing polymeric organic substances from inorganic substrates, such as polymeric adhesives from metal and lense glass parts and positive and negative photoresists from metallized silicon/silicon dioxide wafers, which comprise an effective amount, usually about 1 to 40 percent by weight methane sulfonic acid and the balance methylene chloride are described. Methods for using the above composition at ambient temperatures to remove the polymeric organic substances from the metal and non-metallic inorganic substrates are also described.
Inventors
- 👤 John E. Vander Mey
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 13:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
46 words
A stripping composition capable of removing polymeric organic substances from an inorganic substrate at a temperature of from about 15° C. to about 40° C., the stripping composition comprising methylene chloride and methane sulfonic acid in an amount effective for removal of the organic polymeric substances.
Claim 2
Dependent Claim
46 words
A stripping composition capable of removing polymeric organic substances from an inorganic substrate at a temperature of from about 15° C. to about 40° C., the stripping composition comprising methylene chloride and methane sulfonic acid in an amount effective for removal of the organic polymeric substances.
Claim 3
Dependent Claim
24 words
The stripping composition of claim 1 wherein the amount of methane sulfonic acid is about 1 to about 40 weight percent of the composition.
Claim 4
Dependent Claim
24 words
The stripping composition of claim 1 wherein the amount of methane sulfonic acid is about 1 to about 5 weight percent of the composition.
Claim 5
Dependent Claim
24 words
The stripping composition of claim 1 wherein the amount of methane sulfonic acid is about 25 to about 40 weight percent of the composition.
Claim 6
Dependent Claim
45 words
A method for removing polymeric organic substances from an inorganic substrate which comprises contacting the polymeric substance with the composition of claim 1 at a temperature of from about 15° C. to about 40° C. for a period of time sufficient to remove said substance.
Claim 7
Dependent Claim
21 words
The method as described in claim 5 wherein the temperature of the contact is from about 15° to about 40° C.
Claim 8
Dependent Claim
12 words
The method described in claim 5 wherein further comprises applying ultrasonic energy.
Claim 9
Dependent Claim
28 words
The method as described in claim 5 wherein the polymeric organic substance is a photoresist selected from the group consisting of polyisoprenes, polyvinyl cinnamates and phenol formaldehyde resins.
Claim 10
Dependent Claim
34 words
The method as described in claim 5 wherein the inorganic substrate is gadolinium gallium garnet, gallium arsenide, sapphire, silicon on sapphire, silicon, silicon dioxide, or silicon or silicon dioxide metallized with aluminum or nickel-chromium.
Claim 11
Dependent Claim
36 words
A method for removing polymeric organic substances from a mask used in photolithography comprising contacting said polymeric organic substance with a stripping composition of claim 1 for a period of time sufficient to remove said substances.
Claim 12
Dependent Claim
23 words
A method as described in claim 10 wherein the stripping composition contains from about 1 to about 40 weight percent methane sulfonic acid.
Claim 13
Dependent Claim
22 words
A method as described in claim 10 wherein the stripping composition contains from about 20 to 40 weight percent methane sulfonic acid.
Claim 14
Dependent Claim
35 words
A method as described in claim 12 wherein the mask comprises an optical grade glass with a pattern thereon formed from a material selected from the group consisting of chromium, chromium oxide and iron oxide.
Claim 15
Dependent Claim
27 words
A method as described in claim 10 wherein the polymeric organic substance is a photoresist selected from the group consisting of polyisoprenes, polyvinylcinnamates and phenol formaldehyde resins.
Claim 16
Dependent Claim
42 words
A method of removing organic polymeric rubber adhesive used to bond a photographic lens in a metal housing which comprises contacting the polymeric rubber adhesive with the composition of claim 1 for a period of time sufficient to remove said rubber material.
Claim 17
Dependent Claim
24 words
A method as described in claim 15 wherein the stripping composition contains from about 1 to about 40 percent by weight methane sulfonic acid.
Claim 18
Dependent Claim
25 words
A method as described in claim 15 wherein the stripping composition contains from about 1 to about 5 weight percent by weight methane sulfonic acid.
Claim 19
Dependent Claim
17 words
A method as described in claim 15 wherein the temperature is about 15° to about 40° C.
Claim 20
Dependent Claim
16 words
A method as described in claim 15 wherein the polymeric rubber adhesive is a polysulfide elastomer.
Claim 21
Dependent Claim
56 words
A stripping composition capable of removing polymeric organic substances from an inorganic substrate at a temperature of from about 15° C. to about 40° C., said composition consisting essentially of from about 99 to about 60 weight percent of methylene chloride and from about 1 weight percent to about 40 weight percent of methane sulfonic acid.
Claim 22
Dependent Claim
56 words
A stripping composition capable of removing polymeric organic substances from an inorganic substrate at a temperature of from about 15° C. to about 40° C., said composition consisting essentially of from about 99 to about 60 weight percent of methylene chloride and from about 1 weight percent to about 40 weight percent of methane sulfonic acid.
Claim 23
Independent Claim
69 words
A method for removing polymeric organic substances from an inorganic substrate which comprises contacting the polymeric organic substances with a stripping composition comprising from about 99 to about 60 weight percent methylene chloride and from about 1 to about 40 weight percent methane sulfonic acid at a temperature of from about 15° C. to about 40° C. for a period of time sufficient to remove said polymeric organic substances.
Claim 24
Independent Claim
69 words
A method for removing polymeric organic substances from an inorganic substrate which comprises contacting the polymeric organic substances with a stripping composition comprising from about 99 to about 60 weight percent methylene chloride and from about 1 to about 40 weight percent methane sulfonic acid at a temperature of from about 15° C. to about 40° C. for a period of time sufficient to remove said polymeric organic substances.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-01-16 | 1987-07-18 | 1988-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-01-16 | 1991-07-18 | 1992-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-01-16 | 1995-07-18 | 1996-01-17 | $7700.00 | Window Closed / Lapsed |