Apparatus for projecting a series of images onto dies of a semiconductor wafer

Claim 3

Apparatus according to claim 1, wherein said shutter means comprises a filter for preventing passage of that portion of the spectrum of said beam normally used to expose a die for microlithograpic printing.

Claim 4

Apparatus according to claim 1, wherein said means for detecting comprises a plurality of aperatures selectively positionable to pass light scattered from fiducial marks on predetermined areas of said die.

Claim 5

Apparatus according to claim 1, wherein said means for detecting comprises mask means for blocking all scattered light except that from the area of a die around the projected image of a fiducial mark on the reticle, and a photomultiplier for detecting the intensity of light passing said mask means.

Claim 6

Apparatus according to claim 1, wherein said correcting means comprises means for shifting said scattered light relative to said mask.

Claim 7

Apparatus for use in a microlithography system to position a reticle pattern having spaced fiducial marks for subsequent projection of an image of said pattern and marks onto a semiconductor wafer having a plurality of dies with further, correspondingly positioned fiducial marks, said apparatus comprising: means for directing a beam of light toward a reticle; shutter means having an aperature for permitting a fraction of said beam to illuminate the spaced fiducial marks of the reticle pattern; a projection lens comprising: a spherical, concave mirror having an aperture on its optical axis, a meniscus lens having a first convex surface facing said mirror and a concave surface facing away from said mirror, a plano-convex lens having a second convex surface facing said concave surface and a first flat surface facing away from said mirror, and first and second prisms for coupling light into and from separate fields on said first flat surface, each of said prisms having an optical path length and a second flat surface facing one of the image and object planes of said projection lens, said object and image planes being spaced from said second flat surfaces, whereby said fraction of said beam passes through a reticle positioned at the object plane to illuminate a wafer positioned at the image plane; wafer means positioned at said image plane for scattering light from the projected image of the spaced fiducial marks of the reticle pattern; means including spaced aperatures selectively positionable to pass light scattered through said aperature of said mirror by said wafer from the projected image of the spaced fiducial marks of the reticle pattern; means for moving the reticle in the object plane to align the projected image of the spaced fiducial marks of the reticle pattern with said spaced aperatures; and means for detecting light passed through said spaced aperatures to determine coincidence of the wafer and reticle fiducial marks.

Claim 8

Apparatus for use in a microlithography system to position a reticle pattern having spaced fiducial marks for subsequent projection of an image of said pattern and marks onto a semiconductor wafer having a plurality of dies with further, correspondingly positioned fiducial marks, said apparatus comprising: means for directing a beam of light toward a reticle; shutter means having an aperature for permitting a fraction of said beam to illuminate the spaced fiducial marks of the reticle pattern; a projection lens comprising: a spherical, concave mirror having an aperture on its optical axis, a meniscus lens having a first convex surface facing said mirror and a concave surface facing away from said mirror, a plano-convex lens having a second convex surface facing said concave surface and a first flat surface facing away from said mirror, and first and second prisms for coupling light into and from separate fields on said first flat surface, each of said prisms having an optical path length and a second flat surface facing one of the image and object planes of said projection lens, said object and image planes being spaced from said second flat surfaces, whereby said fraction of said beam passes through a reticle positioned at the object plane to illuminate a wafer positioned at the image plane; wafer means positioned at said image plane for scattering light from the projected image of the spaced fiducial marks of the reticle pattern; means including spaced aperatures selectively positionable to pass light scattered through said aperature of said mirror by said wafer from the projected image of the spaced fiducial marks of the reticle pattern; means for moving the reticle in the object plane to align the projected image of the spaced fiducial marks of the reticle pattern with said spaced aperatures; and means for detecting light passed through said spaced aperatures to determine coincidence of the wafer and reticle fiducial marks.

Claim 9

Apparatus according to claim 6, wherein said shutter means comprises a filter for preventing passage of that portion of the spectrum of said beam normally used to expose a die for microlithographic printing.

Claim 10

Apparatus according to claim 6, wherein said means for detecting comprises a plurality of further aperatures selectively positioned to pass light scattered from preselected projected images of the fiducial marks of the reticle pattern.

Claim 11

Apparatus according to claim 6, wherein said means for detecting comprises mask means for blocking all scattered light except that from the area of a die around the projected image of a fiducial mark on the reticle, and a photomultiplier for detecting the intensity of light passing said mask means.

Claim 12

Apparatus according to claim 6, wherein said correcting means comprises means for shifting said scattered light relative to said mask.

Claim 13

A unit magnification optical system for use in microlithography, comprising: a lamp having normal power rating at which it produces an output having a plurality of spectral lines with a low continuum between spectral lines; means for pulsing said lamp at a power substantially above said normal power rating to produce an output having a high continuum between at least two spectral lines; and a projection lens optimized at said at least two spectral lines comprising: a concave spherical mirror; a meniscus lens having a first convex surface facing said mirror and a concave surface facing away from said mirror; a plano-convex lens having a second convex surface facing said concave surface and a flat surface facing away from said mirror; and first and second prisms for coupling light from said lamp into and from said first flat surface, each of said prisms having an optical path length and a second flat surface facing one of the image and object planes of said projection lens, said optical path length being such that said image and object planes are spaced sufficiently from said second flat surfaces to preclude focusing of dust particles and to accomodate a pellicle.

Claim 14

A unit magnification optical system for use in microlithography, comprising: a lamp having normal power rating at which it produces an output having a plurality of spectral lines with a low continuum between spectral lines; means for pulsing said lamp at a power substantially above said normal power rating to produce an output having a high continuum between at least two spectral lines; and a projection lens optimized at said at least two spectral lines comprising: a concave spherical mirror; a meniscus lens having a first convex surface facing said mirror and a concave surface facing away from said mirror; a plano-convex lens having a second convex surface facing said concave surface and a flat surface facing away from said mirror; and first and second prisms for coupling light from said lamp into and from said first flat surface, each of said prisms having an optical path length and a second flat surface facing one of the image and object planes of said projection lens, said optical path length being such that said image and object planes are spaced sufficiently from said second flat surfaces to preclude focusing of dust particles and to accomodate a pellicle.

Claim 15

A projection system according to claim 11, wherein said lamp is a mercury short arc lamp and said high continuum occurs between spectral lines at 405 mm and 436 mm.

Claim 16

A projection system according to claim 11, wherein said achromatic lens consists of said meniscus lens, said plano-convex lens and said prisms.

Claim 17

An optical system according to claim 13, wherein said meniscus lens is made from a light flint glass; said plano-convex lens, from a dense flint glass; and said prisms, from a dense crown glass.

Claim 18

A projection system according to claim 14, wherein said light flint glass is Schott SF2; said dense flint glass, Schott KF6; and said dense crown glass, Schott LAKN7.