US4424102A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Reactor for reactive ion etching and etching method
Assignee: International Business Machines Corp
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Filing: 1983-03-28
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Granted: 1984-01-03
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Expires: 2003-03-28
Abstract
Abstract A reactor comprising a plate-shaped cathode that is horizontally arranged and connected to an alternating voltage, in a ground connected casing, and gas inlet and gas outlet lines. The cathode is equipped with means for generating local magnetic fields restricted to the region of the individually supported substrates. The cathode can be furthermore have holes or openings in which are arranged substrate holders shiftable or movable vertically to relate to the substrate surface. The substrates are etched in the reactor by means of a plasma which is produced from at least one reactive gas. Each substrate is exposed to at least one local magnetic field. If a mostly chemically etchable material is to be etched in the presence of a mostly physically etchable material, to a much stronger extent than the latter, the advantageous etching speed ratio can be set in that the substrates are additionally raised over the cathode surface.
Inventors
- 👤 Christine Brandeis
- 👤 Jurgen Kempf
- 👤 Georg Kraus
- 👤 Ulrich Ku/ nzel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 18:17
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; C; C23; C23F; C23F4/00; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H01J37/3266; H01J37/34; H01J37/3402; H01J37/3405
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
59 words
A plasma apparatus suitable for a plurality of spaced reactive ion etching substrates comprising: a vacuum chamber, means for creating a plasma of ions reactive with said substrates and applying a potential between said plasma and said substrates, and a localized means to generate magnetic fields at and across each of said substrates in spaced relationship to other substrates.
Claim 2
Dependent Claim
59 words
A plasma apparatus suitable for a plurality of spaced reactive ion etching substrates comprising: a vacuum chamber, means for creating a plasma of ions reactive with said substrates and applying a potential between said plasma and said substrates, and a localized means to generate magnetic fields at and across each of said substrates in spaced relationship to other substrates.
Claim 3
Dependent Claim
35 words
The apparatus of claim 1 including an electrode for supporting said substrates in spaced relationship to each other, means electrically insulated from said electrode for raising said substrate relative to the surface of said electrode.
Claim 4
Dependent Claim
46 words
The apparatus of claim 2 wherein said electrode comprises a planar cathode have a plurality of aperatures corresponding to the number of said substrates employed, and having mounted in said aperature said substrate elevating means, with said magnetic field generating means mounted in said elevating means.
Claim 5
Dependent Claim
30 words
The apparatus of claim 3 wherein magnetic field generating means are selected to form at least one of magnetic field lines parallel and vertical to the surfaces of said substrates.
Claim 6
Dependent Claim
33 words
The apparatus of claim 4 wherein the top surface of said cathode is coated with a dielectric, and said elevating means comprises a dielectric substrate support at least in the upper portions thereof.
Claim 7
Dependent Claim
55 words
In a plasma reactor having two opposed parallel electrodes, means on one said electrode for individually supporting substrates in spaced relationship to each other, means for displacing said substrate between and into the space between said electrodes and relative to one of said electrodes, and means for generating individual electric fields at each of substrates.
Claim 8
Dependent Claim
55 words
In a plasma reactor having two opposed parallel electrodes, means on one said electrode for individually supporting substrates in spaced relationship to each other, means for displacing said substrate between and into the space between said electrodes and relative to one of said electrodes, and means for generating individual electric fields at each of substrates.
Claim 9
Independent Claim
67 words
A method for etching substrates in a plasma formed between an anode and a cathode electrodes comprising; Dispersing a plurality of substrates on one of said electrodes, generating individual magnetic fields at and across each of said substrates in spaced relationship to other of other said fields and said substrates, and controllably elevating said substrates relative to said one electrode and the dark space of said plasma.
Claim 10
Independent Claim
67 words
A method for etching substrates in a plasma formed between an anode and a cathode electrodes comprising; Dispersing a plurality of substrates on one of said electrodes, generating individual magnetic fields at and across each of said substrates in spaced relationship to other of other said fields and said substrates, and controllably elevating said substrates relative to said one electrode and the dark space of said plasma.
Claim 11
Dependent Claim
14 words
The method of claim 7 including electrically insulating said substrate from said one electrode.
Claim 12
Dependent Claim
22 words
The method of claim 8 wherein said magnetic field is formed to produce field lines parallel to the surface of said substrates.
Claim 13
Dependent Claim
22 words
The method of claim 8 wherein said magnetic field is formed to produce field lines vertical to the surfaces of said substrates.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-01-02 | 1987-07-04 | 1988-01-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-01-02 | 1991-07-04 | 1992-01-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-01-02 | 1995-07-04 | 1996-01-03 | $7700.00 | Window Closed / Lapsed |