Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
129 words
An improved sputtering cathode for a high rate sputtering apparatus for substrate coating, adapted to be located inside an evacuable sealed enclosure, the cathode having means for target cooling during sputtering and means for enhancing the sputtering rate, the target having a sputtering face of a material to be sputtered and a back face opposed to the sputtering face, wherein the improvement comprises: a first, thin gas tight chamber formed by the back face of the target and an intermediate support, adapted to have a gas of high thermal conductivity therein; a second, fluid tight chamber formed in part by the intermediate support, adapted to have a liquid coolant circulating therein; and a means for detecting the escape of the gas of high thermal conductivity from the first chamber.
Claim 2
Dependent Claim
129 words
An improved sputtering cathode for a high rate sputtering apparatus for substrate coating, adapted to be located inside an evacuable sealed enclosure, the cathode having means for target cooling during sputtering and means for enhancing the sputtering rate, the target having a sputtering face of a material to be sputtered and a back face opposed to the sputtering face, wherein the improvement comprises: a first, thin gas tight chamber formed by the back face of the target and an intermediate support, adapted to have a gas of high thermal conductivity therein; a second, fluid tight chamber formed in part by the intermediate support, adapted to have a liquid coolant circulating therein; and a means for detecting the escape of the gas of high thermal conductivity from the first chamber.
Claim 3
Dependent Claim
26 words
An improved sputtering cathode as in claim 1 further comprising means to switch off the sputtering immediately once the escape of the gas has been detected.
Claim 4
Dependent Claim
34 words
An improved sputtering cathode as in claim 1 wherein the sputtering cathode has a cylindrical shape, the sputtering target and the intermediate support are tubular and coaxial, and together delimitate said thin, first chamber.
Claim 5
Dependent Claim
18 words
An improved sputtering cathode as in claim 3 wherein the intermediate support is located inside the tubular target.
Claim 6
Dependent Claim
19 words
An improved sputtering cathode as in claim 3 wherein the tubular target is located inside of the intermediate support.
Claim 7
Dependent Claim
33 words
An improved sputtering cathode as in claim 1 wherein the sputtering cathode has a planar shape, whereby the sputtering target and the intermediate support are planar, and together delimitate said thin, first chamber.
Claim 8
Dependent Claim
26 words
An improved sputtering cathode is in claim 1 in which the detecting means comprises: means for detecting a sudden rise of pressure inside the sealed enclosure.
Claim 9
Dependent Claim
27 words
An improved sputtering cathode as in claim 1 in which the detecting means comprises: means for detecting a sudden decrease of pressure inside the first tight chamber.
Claim 10
Dependent Claim
35 words
An improved sputtering cathode as in claim 1 in which the detecting means comprises: spectroscopic means for detecting the characteristic light emitted by the high thermally conductive gas as it escapes into the sealed enclosure.
Claim 11
Dependent Claim
16 words
An improved sputtering cathode as in claim 1 wherein the enhancing means includes magnetic field means.