Patent US4359520A successfully refreshed from Google Patents.
US4359520A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Enhancement of resist development
Assignee: International Business Machines Corp
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Filing: 1979-05-07
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Granted: 1982-11-16
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Expires: 1999-05-07
Abstract
Abstract The present invention is concerned with enhancement of resist development. In particular it is concerned with obtaining high solubility rate ratio between the exposed and the unexposed regions of a resist and also obtaining shorter development time. These objectives are achieved by treating the resist with a liquid trialkylamine having from two to eight carbon atoms in each alkyl group.
Inventors
- 👤 James A. Carothers
- 👤 James Economy
- 👤 Augustus C. Ouano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 10:24
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
77 words
A process for increasing the solubility rate ratio of a quinone-diazo or quinone-triazo sensitized phenolic-aldehyde resist, said process comprising contacting the resist under anhydrous conditions either before or after the resist has been subjected to imagewise exposure to radiation with an anhydrous trialkylamine which is in the liquid state and which contains from two to eight carbon atoms in each alkyl group, and then contacting said resist with an aqueous alkaline developer to dissolve the exposed regions.
Claim 2
Dependent Claim
77 words
A process for increasing the solubility rate ratio of a quinone-diazo or quinone-triazo sensitized phenolic-aldehyde resist, said process comprising contacting the resist under anhydrous conditions either before or after the resist has been subjected to imagewise exposure to radiation with an anhydrous trialkylamine which is in the liquid state and which contains from two to eight carbon atoms in each alkyl group, and then contacting said resist with an aqueous alkaline developer to dissolve the exposed regions.
Claim 3
Dependent Claim
12 words
A process as claimed in claim 1, wherein the amine is tributylamine.
Claim 4
Dependent Claim
12 words
A process as claimed in claim 1, wherein the amine is tripropylamine.
Claim 5
Dependent Claim
25 words
A process as claimed in claim 1, wherein the contacting between the amine of the resist is continued for about one to about 30 minutes.
Claim 6
Dependent Claim
19 words
A process as claimed in claim 1 wherein the contacting is done after exposure of the resist to radiation.
References Cited (Backward Citations)
US3046119A
Cited
US3902906A
Cited
US3950173A
Cited
US4007047A
Cited
US3961100A
Cited
US3961101A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-11-15 | 1986-05-17 | 1986-11-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-11-15 | 1990-05-17 | 1990-11-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-11-15 | 1994-05-17 | 1994-11-16 | $7700.00 | Window Closed / Lapsed |