Process for fabricating photosensitive layers on plastic substrates

Claim 2

A process for fabricating a preholographic element supported on an optically transparent hydrophobic substrate which comprises: (a) forming a layer of a glassy, optically transparent, polar, moisture barrier material about 0.2 to 10 μm thick on the hydrophobic substrate by a process which generates a temperature at the substrate of less than that of its softening point at which it deforms; and (b) forming a layer of a hydrophilic, photosensitive material on at least a portion of the moisture barrier layer, the moisture barrier layer providing a barrier against diffusion of water vapor from the hydrophobic substrate into the hydrophilic, photosensitive layer such that over the lifetime of the pre-holographic element, no more than about 2×10 -6 g H 2 O/cm 2 is transmitted therethrough.

Claim 3

The process of claim 1 in which the hydrophobic substrate includes a plastic material selected from the group consisting of cellulose-acetate, polystyrene, polyester, poly-(methyl methacrylate) and polycarbonate.

Claim 4

The process of claim 2 in which the plastic material is selected from the group consisting of poly-(methyl methacrylate) and polycarbonate.

Claim 5

The process of claim 1 in which the moisture barrier layer comprises a glass having a coefficient of expansion of about 10 -5 /°C.

Claim 6

The process of claim 4 in which the glassy moisture barrier material comprises a glass selected from the group consisting of silicate, borosilicate, alkali silicate, soda-lime and lead glasses.

Claim 7

The process of claim 5 in which the moisture barrier layer consists essentially of glassy SiO 2 .

Claim 8

The process of claim 1 in which the thickness ranges from about 0.2 to 1 μm.

Claim 9

The process of claim 1 in which the moisture barrier layer is deposited by electron beam evaporation or plasma-enhanced deposition.

Claim 10

The process of claim 1 in which the photosensitive material is gelatin-based.

Claim 11

The process of claim 9 in which the photosensitive material comprises an emulsion selected from the group consisting of dichromated gelatin, photographic silver halide emulsion and diazo gelatin.

Claim 12

A process for fabricating a hologram on the pre-holographic element of claim 1 which comprises: (a) exposing the photosensitive layer to an actinic interference pattern to record a latent image thereon; (b) developing the photosensitive layer to obtain the recorded latent image; and (c) forming a protective layer on the photosensitive layer, said protective layer including a layer of a glassy, optically transparent, polar, moisture barrier material about 0.2 to 10 μm thick.

Claim 13

The process of claim 11 in which said protective layer comprises an optically transparent cover material coated with a layer of the moisture barrier material, attached to the photosensitive layer through the moisture barrier layer.

Claim 14

A process for fabricating a hologram which comprises: (a) forming a layer of a glassy, optically transparent, polar, moisture barrier material about 0.2 to 10 μm thick on an optically transparent hydrophobic substrate by a process which generates a temperature at the substrate of less than that of its softening point at which it deforms; (b) forming a layer of a hydrophilic, photosensitive material on at least a portion of the moisture barrier layer, the moisture barrier layer providing a barrier against diffusion of water vapor from the hydrophobic substrate into the hydrophilic, photosensitive layer such that over the lifetime of the hologram, no more than about 2×10 -6 g H 2 O/cm 2 is transmitted therethrough; (c) exposing the photosensitive layer to an actinic interference pattern to record a latent image thereon; (d) developing the photosensitive layer to obtain the recorded latent image; and (e) forming a protective layer on the photosensitive layer, said protective layer including a layer of a glassy, optically transparent, polar, moisture barrier material about 0.2 to 10 μm thick.

Claim 15

A process for fabricating a hologram which comprises: (a) forming a layer of a glassy, optically transparent, polar, moisture barrier material about 0.2 to 10 μm thick on an optically transparent hydrophobic substrate by a process which generates a temperature at the substrate of less than that of its softening point at which it deforms; (b) forming a layer of a hydrophilic, photosensitive material on at least a portion of the moisture barrier layer, the moisture barrier layer providing a barrier against diffusion of water vapor from the hydrophobic substrate into the hydrophilic, photosensitive layer such that over the lifetime of the hologram, no more than about 2×10 -6 g H 2 O/cm 2 is transmitted therethrough; (c) exposing the photosensitive layer to an actinic interference pattern to record a latent image thereon; (d) developing the photosensitive layer to obtain the recorded latent image; and (e) forming a protective layer on the photosensitive layer, said protective layer including a layer of a glassy, optically transparent, polar, moisture barrier material about 0.2 to 10 μm thick.

Claim 16

The process of claim 13 in which the hydrophobic substrate includes a plastic material selected from the group consisting of cellulose-acetate, polystyrene, polyester, poly-(methyl methacrylate) and polycarbonate.

Claim 17

The process of claim 14 in which the plastic material is selected from the group consisting of poly-(methyl methacrylate) and polycarbonate.

Claim 18

The process of claim 13 in which the moisture barrier layer comprises a glass having a high coefficient of expansion.

Claim 19

The process of claim 16 in which the moisture barrier material comprises a glass selected from the group consisting of silicate, borosilicate, alkali silicate, soda-lime and lead glasses.

Claim 20

The process of claim 17 in which the moisture barrier layer consists essentially of glassy SiO 2 .

Claim 21

The process of claim 13 in which the thickness ranges from about 0.2 to 1 μm.

Claim 22

The process of claim 13 in which the moisture barrier layer is deposited by electron beam evaporation or plasma-enhanced deposition.

Claim 23

The process of claim 13 in which the photosensitive material is gelatin-based.

Claim 24

The process of claim 21 in which the photosensitive material comprises an emulsion selected from the group consisting of dichromated gelatin, photographic silver halide emulsion and diazo gelatin.

Claim 25

The process of claim 13 in which the protective layer comprises an optically transparent cover material coated with a layer of the moisture barrier material, attached to the photosensitive layer through the moisture barrier layer.