Patent US4289842A successfully refreshed from Google Patents.
US4289842A
Expired / Lapsed
US
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Negative-working polymers useful as electron beam resists
Assignee: Eastman Kodak Co
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Filing: 1980-06-27
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Granted: 1981-09-15
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Expires: 2000-06-27
Abstract
Abstract Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.
Inventors
- 👤 Zoilo C. H. Tan
- 👤 Constantine C. Petropoulos
- 👤 Frederick J. Rauner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 06:21
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388; C; C08; C08F; C08F220/00; C08F220/02; C08F220/10; C08F220/12; C08F220/16; C08F220/18; C08F220/1803; C08F220/1804; C08F220/1807; C08F220/40
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
80 words
A polymer having a negative-working electron sensitivity of at least 2×10 -7 coulombs/cm 2 when exposed to a 10 keV electron beam, said polymer having recurring units with the sructure ##STR7## wherein R and R 1 are each independently hydrogen or methyl, R 2 is ##STR8## n is 1, 2, or 3; R 3 is alkylene of from 1 to 3 carbon atoms; T is --O-- or --NH--; and x and y are mole percents such that 5≦ x≦95 5≦y≦50.
Claim 2
Dependent Claim
80 words
A polymer having a negative-working electron sensitivity of at least 2×10 -7 coulombs/cm 2 when exposed to a 10 keV electron beam, said polymer having recurring units with the sructure ##STR7## wherein R and R 1 are each independently hydrogen or methyl, R 2 is ##STR8## n is 1, 2, or 3; R 3 is alkylene of from 1 to 3 carbon atoms; T is --O-- or --NH--; and x and y are mole percents such that 5≦ x≦95 5≦y≦50.
Claim 3
Dependent Claim
75 words
A polymer having a negative-working electron sensitivity of at least 2×10 -7 coulombs/cm 2 when exposed to a 10 keV electron beam, said polymer having recurring units with the structure ##STR9## wherein R and R 1 are each independently hydrogen or methyl, R 3 and R 4 are each independently alkylene of from 1 to 3 carbon atoms; T is --O-- or --NH--; and x and y are mole percents such that 5≦ x≦95 5≦y≦50.
Claim 4
Dependent Claim
75 words
A polymer having a negative-working electron sensitivity of at least 2×10 -7 coulombs/cm 2 when exposed to a 10 keV electron beam, said polymer having recurring units with the structure ##STR9## wherein R and R 1 are each independently hydrogen or methyl, R 3 and R 4 are each independently alkylene of from 1 to 3 carbon atoms; T is --O-- or --NH--; and x and y are mole percents such that 5≦ x≦95 5≦y≦50.
Claim 5
Dependent Claim
16 words
Poly[allyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 6
Dependent Claim
16 words
Poly[allyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 7
Dependent Claim
16 words
Poly[4-but-1-enyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 8
Dependent Claim
16 words
Poly[4-but-1-enyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 9
Dependent Claim
15 words
Poly(allyl methacrylate-co-2-hydroxypropylmethacrylamide) x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 10
Dependent Claim
15 words
Poly(allyl methacrylate-co-2-hydroxypropylmethacrylamide) x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 11
Dependent Claim
16 words
Poly[3-norbornenyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 12
Dependent Claim
16 words
Poly[3-norbornenyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 50 and about 95 mole percent.
Claim 13
Dependent Claim
20 words
A polymer as defined in any one of claims 1 through 6, and further including a substrate bearing said polymer.
Claim 14
Dependent Claim
16 words
Poly[allyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 15
Dependent Claim
16 words
Poly[allyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 16
Dependent Claim
16 words
Poly[but-1-enyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 17
Dependent Claim
16 words
Poly[but-1-enyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 18
Dependent Claim
15 words
Poly(allyl methacrylate-co-2-hydroxypropylmethacrylamide) x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 19
Dependent Claim
15 words
Poly(allyl methacrylate-co-2-hydroxypropylmethacrylamide) x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 20
Dependent Claim
16 words
Poly[3-norbornenyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 21
Dependent Claim
16 words
Poly[3-norbornenyl methacrylate-co-(2-hydroxyethyl methacrylate)] x: (100-x) wherein x is between about 70 and about 75 mole percent.
Claim 22
Independent Claim
65 words
A method of imagewise hardening, on a substrate, a layer of a resist comprising a polymer as defined in any one of claims 1 through 11, said method comprising the steps of (a) imagewise exposing said layer to electron beam radiation of an energy no greater than about 10 keV; and (b) developing the layer by washing it with a solvent for the unexposed polymer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-09-14 | 1985-03-16 | 1985-09-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-09-14 | 1989-03-16 | 1989-09-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-09-14 | 1993-03-16 | 1993-09-15 | $7700.00 | Window Closed / Lapsed |