US3556793A
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Novel substituted allyl polymer derivatives useful as photoresists
Assignee: GAF Corp
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Filing: 1968-05-22
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Granted: 1971-01-19
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Expires: 1988-05-22
Abstract
Abstract LIGHT-SENSITIVE, ORGANIC SOLVENT-SOLUBLE, FILM-FORMING SUBSTITUTED ALLYL CONTAINING POLYMERS SUITABLE FOR USE AS PHOTORESISTS.
Inventors
- 👤 Nathan D Field
- 👤 Harlan Benjamin Freyermuth
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 21:29
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388; C; C08; C08F; C08F8/00; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114
Claims Analysis
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-01-18 | 1974-07-20 | 1975-01-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-01-18 | 1978-07-20 | 1979-01-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-01-18 | 1982-07-20 | 1983-01-19 | $7700.00 | Window Closed / Lapsed |