Patent US3412965A successfully refreshed from Google Patents.
Patent US4288513A successfully refreshed from Google Patents.
US4288513A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist of polyvinyl alcohol and ferric dichromate
Assignee: Verizon Laboratories Inc
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Filing: 1978-04-05
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Granted: 1981-09-08
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Expires: 1998-04-05
Abstract
Abstract To accelerate printing of resist materials on a CRT color panel, an additive is incorporated into the resist to enhance cross-linking upon exposure to actinic radiation.
Inventors
- 👤 Kurt B. Kilichowski
- 👤 Peter Cukor
- 👤 Charles Brecher
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 23:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/04; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0076; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/11; Y10S430/114; Y10S430/115; Y10S430/127; Y10S430/128
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
47 words
A method of enhancing the sensitivity of a cross-linkable poly(vinyl alcohol)photoresist to radiation in the visible region of the spectrum comprising incorporating a ferric dichromate into a cross-linkable poly(vinyl alcohol) photoresist-forming composition thereby enhancing the absorptive sensitivity of the photoresist in the visible region of the spectrum.
Claim 2
Independent Claim
47 words
A method of enhancing the sensitivity of a cross-linkable poly(vinyl alcohol)photoresist to radiation in the visible region of the spectrum comprising incorporating a ferric dichromate into a cross-linkable poly(vinyl alcohol) photoresist-forming composition thereby enhancing the absorptive sensitivity of the photoresist in the visible region of the spectrum.
Claim 3
Dependent Claim
22 words
A method as recited in claim 1 wherein the ferric dichromate is pre-formed and subsequently incorporated, per se, into the photoresist-forming composition.
Claim 4
Dependent Claim
45 words
A method as defined in claim 2 wherein the ferric dichromate is pre-formed and subsequently incorporated into the photoresist-forming composition in admixture with an ammonium or alkali metal dichromate salt wherein said complex comprises from about 20 to 100 percent by weight of said admixture.
Claim 5
Dependent Claim
36 words
A method as recited in claim 1 wherein the ferric dichromate is formed in situ in the photoresist-forming composition by reacting an inorganic ferric salt with an ammonium or alkali-metal dichromate salt in the photoresist-forming composition.
Claim 6
Dependent Claim
16 words
A method as recited in claim 1 wherein the photoresist-forming composition additionally contains an anionic surfactant.
Claim 7
Dependent Claim
14 words
A method as recited in claim 5 wherein the surfactant is sodium 2-ethyl hexanoate.
Claim 8
Dependent Claim
65 words
An improved method for selectively imaging a cross-linkable polymeric photoresist supported by a panel for use in a cathode-ray tube comprising: (i) applying the photoresist-forming composition as recited in claim 1 on said panel; (ii) selectively exposing said composition to radiation in the visible portion of the spectrum thereby cross-linking the exposed portions of the photoresist; and (iii) removing the unexposed portions of said photoresist.
Claim 9
Dependent Claim
24 words
An improved photoresist composition enhanced sensitivity to radiation in the visible region of the spectrum comprising a mixture of poly(vinyl alcohol) and ferric dichromate.
Claim 10
Dependent Claim
24 words
An improved photoresist composition enhanced sensitivity to radiation in the visible region of the spectrum comprising a mixture of poly(vinyl alcohol) and ferric dichromate.
Claim 11
Dependent Claim
43 words
An improved photoresist composition as recited in claim 8 wherein the mixture comprises poly(vinyl alcohol), and an admixture of ferric dichromate and an ammonium or alkali metal dichromate, said ferric dichromate comprising from about 20 to 100 percent by weight of said admixture.
Claim 12
Dependent Claim
14 words
An improved photoresist composition as defined in claim 8 additionally containing an anionic surfactant.
Claim 13
Dependent Claim
16 words
An improved photoresist composition as defined in claim 10 wherein the surfactant is sodium 2-ethyl hexanoate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-09-07 | 1985-03-09 | 1985-09-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-09-07 | 1989-03-09 | 1989-09-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-09-07 | 1993-03-09 | 1993-09-08 | $7700.00 | Window Closed / Lapsed |