Patent US3596445A successfully refreshed from Google Patents.
US4279986A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization
Assignee: NEC Corp
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Filing: 1979-07-23
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Granted: 1981-07-21
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Expires: 1999-07-23
Abstract
Abstract A lithographic resist for use in microfabrication comprising a negative-type resist containing a radical scavenger capable of preventing post-irradiation reaction.
Inventors
- 👤 Yoshitake Ohnishi
- 👤 Masaki Itoh
- 👤 Kenji Mizuno
- 👤 Hiroshi Gokan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 11:57
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/118
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
23 words
A radiation sensitive composition comprising a negative resist material having epoxy groups and from about 2.5 to about 10 weight percent of 1,1-diphenyl-2-picrylhydrazyl.
Claim 2
Dependent Claim
23 words
A radiation sensitive composition comprising a negative resist material having epoxy groups and from about 2.5 to about 10 weight percent of 1,1-diphenyl-2-picrylhydrazyl.
Claim 3
Dependent Claim
19 words
A composition as defined in claim 1, wherein said negative resist material contains glycidyl methacrylate as a monomer unit.
Claim 4
Dependent Claim
20 words
A composition as defined in claim 2, wherein said netative resist is a copolymer of glycidyl methacrylate and ethyl acrylate.
Claim 5
Independent Claim
32 words
A method of reducing post-irradiation reaction of a negative resist material having epoxy groups comprising adding to said material prior to irradiation from about 2.5 to about 10 weight percent of 1,1-diphenyl-2-picrylhydrazyl.
Claim 6
Independent Claim
32 words
A method of reducing post-irradiation reaction of a negative resist material having epoxy groups comprising adding to said material prior to irradiation from about 2.5 to about 10 weight percent of 1,1-diphenyl-2-picrylhydrazyl.
Claim 7
Dependent Claim
28 words
A lithographic resist comprising a support having thereon a layer of negative resist material having epoxy groups and from about 2.5 to about 10 weight percent of 1,1-diphenyl-2-picrylhydrazyl.
Claim 8
Dependent Claim
28 words
A lithographic resist comprising a support having thereon a layer of negative resist material having epoxy groups and from about 2.5 to about 10 weight percent of 1,1-diphenyl-2-picrylhydrazyl.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-07-20 | 1985-01-19 | 1985-07-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-07-20 | 1989-01-19 | 1989-07-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-07-20 | 1993-01-19 | 1993-07-21 | $7700.00 | Window Closed / Lapsed |