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US4262073A
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Positive resist medium and method of employing same
Assignee: Intersil Corp
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Filing: 1979-11-23
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Granted: 1981-04-14
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Expires: 1999-11-23
Abstract
Abstract A recording medium is provided which is comprised of a substrate and a film of a polyacetylene sulfone on the surface of the substrate. The recording medium is especially useful in the microlithographic manufacture of electronic circuits using deep ultraviolet exposure.
Inventors
- 👤 Thomas R. Pampalone
- 👤 Emil J. Gavalchin
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 20:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; C; C08; C08G; C08G75/00; C08G75/20; C08G75/205; C08G75/22; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/143; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
66 words
A recorded microlithographic medium comprised of a substrate and a radiation sensitive film applied to a surface of the substrate, said film consisting essentially of an acetylene sulfone polymer consisting of repeating units of the formula ##STR2## wherein R is an organic radical, said polymer having a molecular weight of at least about 50,000 said film having information in the form of a surface relief pattern.
Claim 2
Dependent Claim
66 words
A recorded microlithographic medium comprised of a substrate and a radiation sensitive film applied to a surface of the substrate, said film consisting essentially of an acetylene sulfone polymer consisting of repeating units of the formula ##STR2## wherein R is an organic radical, said polymer having a molecular weight of at least about 50,000 said film having information in the form of a surface relief pattern.
Claim 3
Dependent Claim
24 words
The medium according to claim 1 wherein R is an organic radical selected from the group consisting of alkyl, alicyclic, aryl, aralkyl and heterocyclic.
Claim 4
Dependent Claim
29 words
The medium according to claim 2 wherein R is an organic radical selected from the group consisting of alicyclic, aryl, aralkyl and heterocyclic having up to 20 carbon atoms.
Claim 5
Dependent Claim
16 words
The medium according to claim 1 wherein R is an alkyl group having 1-12 carbon atoms.
Claim 6
Dependent Claim
18 words
The medium according to claim 1 wherein said polymer has a molecular weight of from 50,000 to 200,000.
Claim 7
Dependent Claim
14 words
The medium according to claim 1 wherein said acetylene sulfone polymer is poly(l-hexyne sulfone).
Claim 8
Dependent Claim
14 words
The medium according to claim 1 wherein said acetylene sulfone polymer is poly(1-heptyne sulfone).
Claim 9
Dependent Claim
13 words
The medium according to claim 1 wherein said acetylene polymer is poly(1-pentyne sulfone).
Claim 10
Independent Claim
87 words
The method for recording information which comprises selectively exposing the microlithographic recording medium in predetermined areas thereof which correspond to the information to be recorded with radiation in an amount sufficient to increase the solubility of the exposed portions of the film relative to the unexposed portions of the film in a developer solvent, and thereafter developing the exposed medium with the developer solvent so as to remove the more soluble exposed areas of the film whereby an information-containing surface relief image is recorded in the medium.
Claim 11
Independent Claim
87 words
The method for recording information which comprises selectively exposing the microlithographic recording medium in predetermined areas thereof which correspond to the information to be recorded with radiation in an amount sufficient to increase the solubility of the exposed portions of the film relative to the unexposed portions of the film in a developer solvent, and thereafter developing the exposed medium with the developer solvent so as to remove the more soluble exposed areas of the film whereby an information-containing surface relief image is recorded in the medium.
Claim 12
Dependent Claim
16 words
The method according to claim 9 wherein the recording medium is exposed with deep ultraviolet radiation.
References Cited (Backward Citations)
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Cited
US3898350A
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US3916036A
Cited
US3935332A
Cited
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Cited
US4054454A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-04-13 | 1984-10-13 | 1985-04-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-04-13 | 1988-10-13 | 1989-04-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-04-13 | 1992-10-13 | 1993-04-14 | $7700.00 | Window Closed / Lapsed |