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US4247383A Expired / Lapsed US ⏱️ 0.0 years remaining

Cathodic system with target, for vacuum sputtering apparatus for the application of dielectric or nonmagnetic coatings to substrates

Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1978-08-02
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Granted: 1981-01-27
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Expires: 1998-08-02
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Abstract

Abstract A cathodic system has a planar target for use in an atomizing apparatus for the sputtering of a dielectric or nonmagnetic coating onto a substrate. The cathodic system includes a magnetic field generator disposed on the side of the target opposite from that of the substrate and is constructed in the form of a planar coil which is disposed parallel to the target and has an area which corresponds substantially to the area of the target. The planar coil is insulated from the target and is cooled during use.

Inventors

  • 👤 Walter Greve
  • 👤 Edgar Kaiser
  • 👤 Dieter Grone
  • 👤 Ulrich Patz

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 16:12
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 127 words
In a cathodic system having a planar target for use in an atomizing apparatus for the sputtering of a dielectric or nonmagnetic coating onto a circular substrate, the cathodic system including a magnetic field generator disposed on the side of the target opposite from that of the substrate, the improvement wherein the magnetic field generator comprises a single Archimedean circular spiral pancake coil electrically connected at both ends thereof to a source of current and disposed parallel to the target and having an area which corresponds substantially to the area of the target for developing a magnetic field wherein field lines are produced which are parallel to the planar surface of the target, means insulating the coil from the target and cooling means for cooling the coil.
Claim 2
Dependent Claim 127 words
In a cathodic system having a planar target for use in an atomizing apparatus for the sputtering of a dielectric or nonmagnetic coating onto a circular substrate, the cathodic system including a magnetic field generator disposed on the side of the target opposite from that of the substrate, the improvement wherein the magnetic field generator comprises a single Archimedean circular spiral pancake coil electrically connected at both ends thereof to a source of current and disposed parallel to the target and having an area which corresponds substantially to the area of the target for developing a magnetic field wherein field lines are produced which are parallel to the planar surface of the target, means insulating the coil from the target and cooling means for cooling the coil.
Claim 3
Dependent Claim 26 words
Cathodic system according to claim 1, wherein the insulating means comprises an insulating plate on which the target is disposed and which lies upon the coil.
Claim 4
Dependent Claim 22 words
Cathodic system according to claim 1, wherein the insulating means comprises an envelope of insulating materials around the turns of the coil.
Claim 5
Dependent Claim 23 words
Cathodic system according to claim 1, wherein the insulating means comprises a continuous body of insulating material in which the coil is embedded.
Claim 6
Dependent Claim 36 words
Cathodic system according to claim 1, wherein the cooling means comprises a housing having coolant connections and in which the coil is disposed and wherein the wall of the housing facing the substrate comprises the target.
Claim 7
Dependent Claim 22 words
Cathodic system according to claim 5, wherein the coil comprises a solid elongated member having one of a rectangular or circular cross-section.
Claim 8
Dependent Claim 37 words
Cathodic system according to claim 1, wherein the coil comprises a hollow tubular member having one of a rectangular or circular cross-section and wherein the cooling means comprises means for circulating coolant through the hollow tubular member.
Claim 9
Dependent Claim 127 words
In a cathodic system having a planar target for use in an atomizing apparatus for the sputtering of a dielectric or nonmagnetic coating onto a rectangular substrate, the cathodic system including a magnetic field generator disposed on the side of the target opposite from that of the substrate, the improvement wherein the magnetic field generator comprises a single Archimedean rectangular spiral pancake coil electrically connected at both ends thereof to a source of current and disposed parallel to the target and having an area which corresponds substantially to the area of the target for developing a magnetic field wherein field lines are produced which are parallel to the planar surface of the target, means insulating the coil from the target and cooling means for cooling the coil.
Claim 10
Dependent Claim 127 words
In a cathodic system having a planar target for use in an atomizing apparatus for the sputtering of a dielectric or nonmagnetic coating onto a rectangular substrate, the cathodic system including a magnetic field generator disposed on the side of the target opposite from that of the substrate, the improvement wherein the magnetic field generator comprises a single Archimedean rectangular spiral pancake coil electrically connected at both ends thereof to a source of current and disposed parallel to the target and having an area which corresponds substantially to the area of the target for developing a magnetic field wherein field lines are produced which are parallel to the planar surface of the target, means insulating the coil from the target and cooling means for cooling the coil.
Claim 11
Dependent Claim 26 words
Cathodic system according to claim 8, wherein the insulating means comprises an insulating plate on which the target is disposed and which lies upon the coil.
Claim 12
Dependent Claim 22 words
Cathodic system according to claim 8, wherein the insulating means comprises an envelope of insulating materials around the turns of the coil.
Claim 13
Dependent Claim 23 words
Cathodic system according to claim 8, wherein the insulating means comprises a continuous body of insulating material in which the coil is embedded.
Claim 14
Dependent Claim 36 words
Cathodic system according to claim 8, wherein the cooling means comprises a housing having coolant connections and in which the coil is disposed and wherein the wall of the housing facing the substrate comprises the target.
Claim 15
Dependent Claim 22 words
Cathodic system according to claim 12, wherein the coil comprises a solid elongated member having one of a rectangular or circular cross-section.
Claim 16
Dependent Claim 37 words
Cathodic system according to claim 8, wherein the coil comprises a hollow tubular member having one of a rectangular or circular cross-section and wherein the cooling means comprises means for circulating coolant through the hollow tubular member.

References Cited (Backward Citations)

US3540993A Cited
US3887451A Cited
US3878085A Cited
US4022947A Cited
US4116791A Cited
US4116806A Cited
US4162954A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-01-27 1984-07-28 1985-01-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-01-27 1988-07-28 1989-01-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-01-27 1992-07-28 1993-01-27 $7700.00 Window Closed / Lapsed

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