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US4242307A Expired / Lapsed US ⏱️ 0.0 years remaining

Device for producing polycrystalline silicon

Assignee: Alcatel Lucent SAS
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Filing: 1979-06-13
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Granted: 1980-12-30
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Expires: 1999-06-13
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Abstract

Abstract The invention relates to a method and device for producing polycrystalline silicon. The method consists in particular in purifying a bath of molten silicon which contains impurities by bubbling a mixture of chlorine and oxygen and in progressively crystallizing the purified silicon in a receptacle (22) which is moved vertically downwards in a vertical gradient of temperatures which increase towards the top. Application to manufacturing solar photocells.

Inventors

  • 👤 Jacques Fally

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 03:47
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/02; C01B33/037; Y; Y10; Y10T; Y10T117/00; Y10T117/10; Y10T117/1016; Y10T117/1024; Y10T117/1092

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 257 words
A device for producing polycrystalline silicon by purifying silicon which contains impurities and solidifying a liquid molten mass of purified silicon by subjecting the liquid mass to a vertical temperature gradient, said device comprising: a chamber, a first crucible within said chamber for containing a mixture of carbon and silica, means for heating said first crucible, and means for tilting said crucible about a horizontal axle, a second crucible positioned within said chamber below said first crucible and positioned to receive the liquid bath of molten silicon which contains impurities upon tilting of said first crucible about said horizontal axle, said second crucible having a drainage orifice within a lower part thereof, movable means for stopping said drainage orifice, a pipe passing through the wall of said chamber and leading to the inside of said second crucible, means for connecting said pipe to a source of gas for bubbling through the molten silicon, means for heating said second crucible to maintain the temperature of said bath above the melting point of silicon, a vertical receptacle disposed beneath said second crucible and positioned relative to said orifice so as to receive the purified liquid silicon flowing from said orifice when said orifice is not stopped, a heating sleeve surrounding said receptacle and means for maintaining the temperatures at the top and bottom of said sleeve respectively higher and lower than the melting point of silicon, means for vertically moving said receptacle along the axis of said sleeve, and pumping means for pumping the gases out of said chamber.
Claim 2
Independent Claim 257 words
A device for producing polycrystalline silicon by purifying silicon which contains impurities and solidifying a liquid molten mass of purified silicon by subjecting the liquid mass to a vertical temperature gradient, said device comprising: a chamber, a first crucible within said chamber for containing a mixture of carbon and silica, means for heating said first crucible, and means for tilting said crucible about a horizontal axle, a second crucible positioned within said chamber below said first crucible and positioned to receive the liquid bath of molten silicon which contains impurities upon tilting of said first crucible about said horizontal axle, said second crucible having a drainage orifice within a lower part thereof, movable means for stopping said drainage orifice, a pipe passing through the wall of said chamber and leading to the inside of said second crucible, means for connecting said pipe to a source of gas for bubbling through the molten silicon, means for heating said second crucible to maintain the temperature of said bath above the melting point of silicon, a vertical receptacle disposed beneath said second crucible and positioned relative to said orifice so as to receive the purified liquid silicon flowing from said orifice when said orifice is not stopped, a heating sleeve surrounding said receptacle and means for maintaining the temperatures at the top and bottom of said sleeve respectively higher and lower than the melting point of silicon, means for vertically moving said receptacle along the axis of said sleeve, and pumping means for pumping the gases out of said chamber.
Claim 3
Dependent Claim 17 words
A device according to claim 1, wherein said receptacle includes a lower part having a tapering cross-section.
Claim 4
Dependent Claim 16 words
A device according to claim 1, wherein said heating sleeve comprises two vertically superposed cylindrical ovens.
Claim 5
Dependent Claim 41 words
A device according to claim 1, wherein said pumping means comprises a vacuum pump connected to said chamber via a pumping circuit, and said device further comprising a condenser disposed in the pumping circuit between said chamber and said vacuum pump.
Claim 6
Dependent Claim 17 words
A device according to claim 1, further comprising means for circulating a neutral gas within said chamber.
Claim 7
Dependent Claim 33 words
A device according to claim 1, further comprising a condensation tank for collecting the product of condensation on the inner wall of said chamber from vapour escaping from said bath during silicon purification.
Claim 8
Dependent Claim 37 words
A device according to claim 1, wherein said chamber comprises spaced inner and outer walls, and wherein said device further comprises means for circulating a heating fluid between said spaced inner and outer walls of said chamber.
Claim 9
Dependent Claim 29 words
A device according to claim 1, wherein said first crucible is of the self-crucible type and wherein said means for heating said first crucible comprise an electric induction winding.
Claim 10
Dependent Claim 26 words
A device according to claim 1, further comprising means for introducing a doping material into the mass of purified liquid silicon contained in said second crucible.

References Cited (Backward Citations)

US2901325A Cited
US3022144A Cited
US3119778A Cited
US3370927A Cited
GB1173690A Cited
US4040894A Cited
US3960501A Cited
US3998686A Cited
US4054641A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1983-12-30 1984-06-30 1984-12-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1987-12-30 1988-06-30 1988-12-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1991-12-30 1992-06-30 1992-12-30 $7700.00 Window Closed / Lapsed

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